Inventor · disambiguated record
Kazuo Kibi
Also filed as: KIBI KAZUO
13 granted patents·5 pending applications·672 citations·filing 2005–2021
92Inventor score
Top patents by PatentIndex Score
18 records- 0198US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0297US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0397US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0495US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 0593US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 0689US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 0787US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 0883US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 0980US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 1074US2021082669A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1159US2014326409A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1258US2016358753A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1356US11501998B2Method for manufacturing three-dimensional semiconductor memory deviceTOKYO ELECTRON LTD·Filed 2020·Granted Nov 15, 2022·0 cites·11 claims
- 1456US10529539B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 7, 2020·0 cites·8 claims
- 1552US12100616B2Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2021·Granted Sep 24, 2024·0 cites·7 claims
- 1652US11282753B2Method of simultaneously forming contacts to a power rail and the source and drain regions of a FinFETTOKYO ELECTRON LTD·Filed 2019·Granted Mar 22, 2022·0 cites·6 claims
- 1749US2011214815A1Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Application pending·0 cites
- 1844US2022013404A1Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →