Inventor · disambiguated record
Kazumi Kubo
Also filed as: KUBO KAZUMI
16 granted patents·4 pending applications·48 citations·filing 1991–2024
89Inventor score
Files withTOKYO ELECTRON LTD14FUJI PHOTO FILM CO LTD3ENDO ATSUSHI1KAKIMOTO AKINOBU1SHOWA PHARM CHEM IND1
Top patents by PatentIndex Score
20 records- 0178US7696106B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2008·Granted Apr 13, 2010·6 cites·6 claims
- 0272US10636648B2Film deposition method of depositing film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 28, 2020·1 cites·14 claims
- 0371US6953731B2Fabrication process of a semiconductor deviceTOKYO ELECTRON LTD·Filed 2003·Granted Oct 11, 2005·14 cites·11 claims
- 0469US12371785B2Method for forming film on substrate surface having convex portionTOKYO ELECTRON LTD·Filed 2023·Granted Jul 29, 2025·0 cites·8 claims
- 0568US2025043414A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0664US6907059B1Optical component fixing method and optical component supportFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jun 14, 2005·7 cites·9 claims
- 0758US7105362B2Method of forming dielectric filmTOKYO ELECTRON LTD·Filed 2003·Granted Sep 12, 2006·6 cites·20 claims
- 0855US2008193897A1Mouthpiece for Flattening WrinklesSHOWA PHARM CHEM IND·Filed 2005·Application pending·0 cites
- 0953US11404265B2Film deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 2, 2022·0 cites·17 claims
- 1051US10748758B2Method for depositing a silicon nitride film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Aug 18, 2020·0 cites·17 claims
- 1151US7637268B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2006·Granted Dec 29, 2009·0 cites·10 claims
- 1250US5310918A1-aryl-substituted azole, non-linear optical material and novel molecular crystal containing same and method and module for the conversion of light wavelength using sameFUJI PHOTO FILM CO LTD·Filed 1991·Granted May 10, 1994·3 cites·2 claims
- 1348US11170999B2Deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 9, 2021·0 cites·13 claims
- 1445US10643837B2Method for depositing a silicon nitride film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 5, 2020·0 cites·12 claims
- 1544US11952661B2Deposition methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 9, 2024·0 cites·20 claims
- 1644US5703900ALaser-diode-pumped solid state laser and method of manufacturing the sameFUJI PHOTO FILM CO LTD·Filed 1995·Granted Dec 30, 1997·11 cites·3 claims
- 1743US8518834B2Method and apparatus for forming oxide film on carbon filmKAKIMOTO AKINOBU·Filed 2011·Granted Aug 27, 2013·0 cites·6 claims
- 1842US11075074B2Method for depositing a silicon nitride film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jul 27, 2021·0 cites·19 claims
- 1936US2012015525A1Method of cleaning a thin film forming apparatus, thin film forming method, and thin film forming apparatusENDO ATSUSHI·Filed 2011·Application pending·0 cites
- 2036US2017278699A1Control device, substrate processing system, substrate processing method, and programTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →