Inventor · disambiguated record
Kazunobu Miki
Also filed as: MIKI KAZUNOBU
12 granted patents·235 citations·filing 1998–2010
92Inventor score
Files withMITSUBISHI ELECTRIC CORP5RENESAS TECH CORP3KANZAKI TERUAKI1KASAOKA TATSUO1MITSUBISHI DENKI KABSUHIKI KAI1
Top patents by PatentIndex Score
12 records- 0189US6633176B2Semiconductor device test probe having improved tip portion and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Oct 14, 2003·47 cites·7 claims
- 0286US7276923B2Semiconductor device test probeMITSUBISHI ELECTRIC CORP·Filed 2005·Granted Oct 2, 2007·12 cites·4 claims
- 0383US6646455B2Test probe for semiconductor devices, method of manufacturing of the same, and member for removing foreign matterMITSUBISHI DENKI KABSUHIKI KAI·Filed 1998·Granted Nov 11, 2003·52 cites·14 claims
- 0482US7274195B2Semiconductor device test probeMITSUBISHI ELECTRIC CORP·Filed 2003·Granted Sep 25, 2007·26 cites·4 claims
- 0582US6888344B2Test probe for semiconductor devices, method of manufacturing of the same, and member for removing foreign matterMITSUBISHI ELECTRIC CORP·Filed 2002·Granted May 3, 2005·24 cites·5 claims
- 0681US8084279B2Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patternsKASAOKA TATSUO·Filed 2010·Granted Dec 27, 2011·8 cites·4 claims
- 0776US8178981B2Semiconductor deviceKANZAKI TERUAKI·Filed 2010·Granted May 15, 2012·5 cites·11 claims
- 0873US7701063B2Semiconductor deviceRENESAS TECH CORP·Filed 2005·Granted Apr 20, 2010·5 cites·3 claims
- 0970US6339257B1Semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jan 15, 2002·38 cites·4 claims
- 1066US6710615B2Semiconductor element test apparatus, and method of testing semiconductor element using the apparatusRENESAS TECH CORP·Filed 2001·Granted Mar 23, 2004·13 cites·9 claims
- 1164US7956473B2Semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2008·Granted Jun 7, 2011·5 cites·30 claims
- 1250US7696081B2Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patternsRENESAS TECH CORP·Filed 2008·Granted Apr 13, 2010·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →