Inventor · disambiguated record
Kanto Nakamura
Also filed as: NAKAMURA KANTO
10 granted patents·9 pending applications·22 citations·filing 2010–2023
82Inventor score
Top patents by PatentIndex Score
19 records- 0192US9551060B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Jan 24, 2017·6 cites·12 claims
- 0290US9790590B2Vacuum-processing apparatus, vacuum-processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Oct 17, 2017·6 cites·8 claims
- 0388US9017535B2High-frequency sputtering deviceNAGAMINE YOSHINORI·Filed 2010·Granted Apr 28, 2015·7 cites·5 claims
- 0485US10309005B2Deposition device and deposition methodTOKYO ELECTRON LTD·Filed 2014·Granted Jun 4, 2019·3 cites·19 claims
- 0559US12180580B2Film forming position misalignment correction method and film forming systemTOKYO ELECTRON LTD·Filed 2023·Granted Dec 31, 2024·0 cites·13 claims
- 0659US12018928B2Film thickness measurement method, film thickness measurement device, and film formation systemTOKYO ELECTRON LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 0758US11894222B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Granted Feb 6, 2024·0 cites·14 claims
- 0853US11901166B2Magnetron sputtering apparatus and magnetron sputtering methodTOKYO ELECTRON LTD·Filed 2021·Granted Feb 13, 2024·0 cites·8 claims
- 0952US12077848B2Vacuum processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·4 claims
- 1052US2023005989A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1152US2020123649A1Oxidation processing module, substrate processing system, and oxidation processing methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1249US2017317273A1Method for Forming Perpendicular Magnetization Type Magnetic Tunnel Junction Element and Apparatus for Producing Perpendicular Magnetization Type Magnetic Tunnel Junction ElementTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1348US10566525B2Method for manufacturing magnetoresistive elementTOKYO ELECTRON LTD·Filed 2018·Granted Feb 18, 2020·0 cites·9 claims
- 1444US2015114835A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1542US2015136596A1Magnetron sputtering device, magnetron sputtering method, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1642US2015187549A1Magnetron sputtering apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1738US2020232090A1Substrate processing device and processing systemTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1837US2010200394A1Vacuum thin film forming apparatusCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 1930US2016071707A1Processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →