Inventor · disambiguated record
Katsumi Setoguchi
Also filed as: SETOGUCHI KATSUMI
8 granted patents·2 pending applications·24 citations·filing 2002–2019
82Inventor score
Top patents by PatentIndex Score
10 records- 0176US7381951B2Charged particle beam adjustment method and apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 3, 2008·4 cites·9 claims
- 0275US9702695B2Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereofKAWADA HIROKI·Filed 2011·Granted Jul 11, 2017·5 cites·7 claims
- 0370US7611993B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 3, 2009·2 cites·2 claims
- 0470US6700090B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 2, 2004·9 cites·14 claims
- 0556US9275829B2Image forming device and computer programSETOGUCHI KATSUMI·Filed 2011·Granted Mar 1, 2016·1 cites·10 claims
- 0656US6888094B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted May 3, 2005·3 cites·1 claims
- 0752US11170969B2Electron beam observation device, electron beam observation system, and control method of electron beam observation deviceHITACHI HIGH TECH CORP·Filed 2018·Granted Nov 9, 2021·0 cites·16 claims
- 0850US2005183822A1Plasma processing method and plasma processing apparatusFiled 2005·Application pending·0 cites
- 0948US11791130B2Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 17, 2023·0 cites·28 claims
- 1035US2012138796A1Signal Processing Method for Charged Particle Beam Device, and Signal Processing DeviceSASAJIMA FUMIHIRO·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Katsumi Setoguchi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →