Inventor · disambiguated record
Kazuo Tawarayama
Also filed as: TAWARAYAMA KAZUO
6 granted patents·7 pending applications·16 citations·filing 2000–2015
73Inventor score
Top patents by PatentIndex Score
13 records- 0169US8023759B2Focus monitoring methodTOSHIBA KK·Filed 2007·Granted Sep 20, 2011·3 cites·20 claims
- 0268US6558852B1Exposure method, reticle, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2000·Granted May 6, 2003·12 cites·20 claims
- 0365US7985958B2Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing programTOSHIBA KK·Filed 2005·Granted Jul 26, 2011·1 cites·5 claims
- 0452US2008293169A1Lithography evaluating method, semiconductor device manufacturing method and program mediumTOSHIBA KK·Filed 2008·Application pending·0 cites
- 0550US2009095711A1Microfabrication apparatus and device manufacturing methodKOSHIBA TAKESHI·Filed 2008·Application pending·0 cites
- 0645US9772566B2Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of deviceTOSHIBA MEMORY CORP·Filed 2015·Granted Sep 26, 2017·0 cites·20 claims
- 0744US9885960B2Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording mediumTOSHIBA MEMORY CORP·Filed 2014·Granted Feb 6, 2018·0 cites·10 claims
- 0840US2015227054A1Extreme ultraviolet radiation exposure apparatus and method of lithography therebyTOSHIBA KK·Filed 2014·Application pending·0 cites
- 0940US2005167661A1Lithography evaluating method, semiconductor device manufacturing method and program mediumFiled 2004·Application pending·0 cites
- 1039US2009141378A1Optical element and optical apparatusTAWARAYAMA KAZUO·Filed 2008·Application pending·0 cites
- 1137US2014061969A1Patterning method and templateOKAMOTO YOSUKE·Filed 2012·Application pending·0 cites
- 1230US8067757B2Extreme ultraviolet light source apparatus and method of adjusting the sameTAWARAYAMA KAZUO·Filed 2010·Granted Nov 29, 2011·0 cites·14 claims
- 1327US2011285975A1Method of managing euv exposure mask and exposure methodTAWARAYAMA KAZUO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →