Inventor · disambiguated record
Kazuyuki Tezuka
Also filed as: TEZUKA KAZUYUKI
7 granted patents·6 pending applications·479 citations·filing 2003–2020
84Inventor score
Top patents by PatentIndex Score
13 records- 0197USD494552SExhaust ring for manufacturing semiconductorsTOKYO ELECTRON LTD·Filed 2003·Granted Aug 17, 2004·432 cites·1 claims
- 0289US7472581B2Vacuum apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jan 6, 2009·18 cites·11 claims
- 0380US7299104B2Substrate processing apparatus and substrate transferring methodTOKYO ELECTRON LTD·Filed 2004·Granted Nov 20, 2007·24 cites·10 claims
- 0471US9169558B2Fluid control apparatusHIROSE JUN·Filed 2009·Granted Oct 27, 2015·5 cites·6 claims
- 0556US10665431B2Processing methodTOKYO ELECTRON LTD·Filed 2018·Granted May 26, 2020·0 cites·19 claims
- 0652US11532467B2Maintenance deviceTOKYO ELECTRON LTD·Filed 2020·Granted Dec 20, 2022·0 cites·8 claims
- 0748US2013189847A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 0846US2011232846A1Magnetic field generator for magnetron plasmaSHINETSU CHEMICAL CO·Filed 2011·Application pending·0 cites
- 0944US2012132367A1Processing apparatusTEZUKA KAZUYUKI·Filed 2011·Application pending·0 cites
- 1043US8394230B2Plasma processing apparatusTEZUKA KAZUYUKI·Filed 2007·Granted Mar 12, 2013·0 cites·9 claims
- 1140US2005211383A1Magnetron plasma-use magnetic field generation deviceMIYATA KOJI·Filed 2003·Application pending·0 cites
- 1238US2007160447A1Semiconductor treating deviceTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1338US2004129218A1Exhaust ring mechanism and plasma processing apparatus using the sameFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →