Inventor · disambiguated record
Kazumasa Wakiya
Also filed as: WAKIYA KAZUMASA
42 granted patents·51 pending applications·1,136 citations·filing 1988–2023
98Inventor score
Top patents by PatentIndex Score
93 records- 0197US7371510B2Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 13, 2008·44 cites·10 claims
- 0296US5795702APhotoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 18, 1998·165 cites·18 claims
- 0395US5792274ARemover solution composition for resist and method for removing resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 11, 1998·121 cites·7 claims
- 0494US7846637B2Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective filmTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 7, 2010·40 cites·10 claims
- 0592US6638899B1Photoresist stripping solution and a method of stripping photoresists with the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 28, 2003·62 cites·16 claims
- 0692US5905063ARemover solution composition for resist and method for removing resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted May 18, 1999·81 cites·7 claims
- 0789US7741260B2Rinsing fluid for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 22, 2010·12 cites·4 claims
- 0889US5968848AProcess for treating a lithographic substrate and a rinse solution for the treatmentTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 19, 1999·97 cites·12 claims
- 0987US7795197B2Cleaning liquid for lithography and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 14, 2010·10 cites·13 claims
- 1085US6261745B1Post-ashing treating liquid compositions and a process for treatment therewithTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 17, 2001·71 cites·11 claims
- 1185US5863710ADeveloper solution for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jan 26, 1999·56 cites·6 claims
- 1283US9244358B2Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrateKOSHIYAMA JUN·Filed 2009·Granted Jan 26, 2016·9 cites·8 claims
- 1383US8697345B2Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2010·Granted Apr 15, 2014·6 cites·10 claims
- 1483US6218087B1Photoresist stripping liquid composition and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Apr 17, 2001·23 cites·10 claims
- 1582US8124312B2Method for forming pattern, and material for forming coating filmISHIKAWA KIYOSHI·Filed 2007·Granted Feb 28, 2012·11 cites·5 claims
- 1682US6291142B1Photoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 18, 2001·17 cites·3 claims
- 1782US6068000ASubstrate treatment methodTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted May 30, 2000·62 cites·20 claims
- 1880US8367312B2Detergent for lithography and method of forming resist pattern with the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Feb 5, 2013·5 cites·8 claims
- 1978US5631314ALiquid coating composition for use in forming photoresist coating films and photoresist material using said compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted May 20, 1997·36 cites·18 claims
- 2077US6815151B2Rinsing solution for lithography and method for processing substrate with the use of the sameTOKYO OHIKA KOGYO CO LTD·Filed 2001·Granted Nov 9, 2004·19 cites·6 claims
- 2177US6689535B2Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming patternTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Feb 10, 2004·14 cites·8 claims
- 2275US8192923B2Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2007·Granted Jun 5, 2012·3 cites·12 claims
- 2374US8158568B2Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2010·Granted Apr 17, 2012·1 cites·9 claims
- 2473US8354215B2Method for stripping photoresistTOKYO OHKA KOGYO CO LTD·Filed 2010·Granted Jan 15, 2013·1 cites·5 claims
- 2572US8685910B2Cleaning liquid used in photolithography and a method for treating substrate therewithYOKOI SHIGERU·Filed 2010·Granted Apr 1, 2014·1 cites·10 claims
- 2672US5783362ALiquid coating composition for use in forming photoresist coating films and a photoresist material using said compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 21, 1998·27 cites·18 claims
- 2772US4944893ARemover solution for resistTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jul 31, 1990·32 cites·7 claims
- 2871US11441101B2Cleaning composition, cleaning method, and method for manufacturing semiconductorTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Sep 13, 2022·1 cites·13 claims
- 2971US7897325B2Lithographic rinse solution and method for forming patterned resist layer using the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 1, 2011·2 cites·8 claims
- 3068US7442675B2Cleaning composition and method of cleaning semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Oct 28, 2008·12 cites·6 claims
- 3167US7811748B2Resist pattern forming method and composite rinse agentTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 12, 2010·2 cites·12 claims
- 3265US6225034B1Photoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted May 1, 2001·20 cites·8 claims
- 3365US6136505ALiquid coating composition for use in forming antireflective film and photoresist material using said antireflective filmTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Oct 24, 2000·21 cites·7 claims
- 3464US6225030B1Post-ashing treating method for substratesTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 1, 2001·22 cites·2 claims
- 3563US6734258B2Protective coating composition for dual damascene processTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted May 11, 2004·5 cites·4 claims
- 3660US2023265362A1Rinsing solution, method of treating substrate, and method of manufacturing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 3759US2010112495A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 3859US2010051582A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 3958US2009156005A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 4058US2010056411A1Treating liquid for photoresist removal and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2009·Application pending·0 cites
- 4158US2009291565A1Method for stripping photoresistYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 4257US6416930B2Composition for lithographic anti-reflection coating, and resist laminate using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jul 9, 2002·4 cites·7 claims
- 4357US2008280452A1Method for stripping photoresistYOKOI SHIGERU·Filed 2008·Application pending·0 cites
- 4457US2009176677A1Treating liquid for photoresist removal, and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2009·Application pending·0 cites
- 4557US2008241758A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2008·Application pending·0 cites
- 4657US2023203409A1Cleaning liquid and method for cleaning substrateTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 4756US2008242575A1Treating liquid for photoresist removal, and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2008·Application pending·0 cites
- 4855US6132928ACoating solution for forming antireflective coating filmTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 17, 2000·14 cites·6 claims
- 4955US2009011601A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 5055US2007298619A1Method for stripping photoresistYOKOI SHIGERU·Filed 2007·Application pending·0 cites
Showing the top 50 of 93 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →