Inventor · disambiguated record
Kevin Peterlinz
Also filed as: PETERLINZ KEVIN · PETERLINZ KEVIN A
22 granted patents·3 pending applications·266 citations·filing 2012–2024
95Inventor score
Top patents by PatentIndex Score
25 records- 0197US10101676B2Spectroscopic beam profile overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Oct 16, 2018·15 cites·20 claims
- 0297US10072921B2Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive elementKLA TENCOR CORP·Filed 2015·Granted Sep 11, 2018·17 cites·19 claims
- 0397US9778213B2Metrology tool with combined XRF and SAXS capabilitiesKLA TENCOR CORP·Filed 2014·Granted Oct 3, 2017·39 cites·20 claims
- 0496US9291554B2Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspectionKUZNETSOV ALEXANDER·Filed 2014·Granted Mar 22, 2016·67 cites·23 claims
- 0596US9243886B1Optical metrology of periodic targets in presence of multiple diffraction ordersKLA TENCOR CORP·Filed 2013·Granted Jan 26, 2016·34 cites·25 claims
- 0696US9228943B2Dynamically adjustable semiconductor metrology systemKLA TENCOR CORP·Filed 2012·Granted Jan 5, 2016·31 cites·41 claims
- 0795US9816810B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2016·Granted Nov 14, 2017·11 cites·14 claims
- 0894US9490182B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2014·Granted Nov 8, 2016·12 cites·19 claims
- 0992US10438825B2Spectral reflectometry for in-situ process monitoring and controlKLA TENCOR CORP·Filed 2017·Granted Oct 8, 2019·8 cites·20 claims
- 1089US10612916B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2017·Granted Apr 7, 2020·4 cites·5 claims
- 1188US9400246B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2012·Granted Jul 26, 2016·5 cites·24 claims
- 1287US9574992B1Single wavelength ellipsometry with improved spot size capabilityKLA TENCOR CORP·Filed 2016·Granted Feb 21, 2017·5 cites·20 claims
- 1386US9915524B2Optical metrology with small illumination spot sizeKLA TENCOR CORP·Filed 2015·Granted Mar 13, 2018·3 cites·20 claims
- 1486US9535018B2Combined x-ray and optical metrologyKLA TENCOR CORP·Filed 2013·Granted Jan 3, 2017·7 cites·20 claims
- 1584US10648796B2Optical metrology with small illumination spot sizeKLA TENCOR CORP·Filed 2018·Granted May 12, 2020·3 cites·13 claims
- 1683US10690602B2Methods and systems for measurement of thick films and high aspect ratio structuresKLA TENCOR CORP·Filed 2018·Granted Jun 23, 2020·3 cites·22 claims
- 1773US11913874B2Optical metrology tool equipped with modulated illumination sourcesKLA CORP·Filed 2021·Granted Feb 27, 2024·0 cites·12 claims
- 1868US8982358B2Apparatus and method of measuring roughness and other parameters of a structureKLA TENCOR CORP·Filed 2013·Granted Mar 17, 2015·2 cites·34 claims
- 1966US10234271B2Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detectorKLA TENCOR CORP·Filed 2018·Granted Mar 19, 2019·0 cites·20 claims
- 2064US10215688B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2016·Granted Feb 26, 2019·0 cites·19 claims
- 2163US10969328B2Optical metrology tool equipped with modulated illumination sourcesKLA TENCOR CORP·Filed 2019·Granted Apr 6, 2021·0 cites·10 claims
- 2262US11119050B2Methods and systems for measurement of thick films and high aspect ratio structuresKLA CORP·Filed 2020·Granted Sep 14, 2021·0 cites·20 claims
- 2361US2025237496A1Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor StructuresKLA CORP·Filed 2024·Application pending·0 cites
- 2459US2025146893A1Transistor channel stress and mobility metrology using multipass spectroscopic ellipsometry and raman joint measurementKLA CORP·Filed 2024·Application pending·0 cites
- 2559US2024280484A1Angle resolved reflectometry for thick films and high aspect ratio structuresKLA CORP·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →