Inventor · disambiguated record
Kedarnath Sangam
Also filed as: SANGAM KEDARNATH · SANGAM KEDARNATH S
18 granted patents·3 pending applications·570 citations·filing 2005–2014
95Inventor score
Files withAPPLIED MATERIALS INC8KOELMEL BLAKE3Crystal Solar Incorporated2SIVARAMAKRISHNAN VISWESWAREN2TSENG MING-KUEI MICHAEL2
Top patents by PatentIndex Score
21 records- 0197US9920451B2High throughput multi-wafer epitaxial reactorCrystal Solar Incorporated·Filed 2014·Granted Mar 20, 2018·339 cites·16 claims
- 0297US8057602B2Apparatus and method for supporting, positioning and rotating a substrate in a processing chamberKOELMEL BLAKE·Filed 2008·Granted Nov 15, 2011·63 cites·30 claims
- 0395US8673081B2High throughput multi-wafer epitaxial reactorSIVARAMAKRISHNAN VISWESWAREN·Filed 2010·Granted Mar 18, 2014·11 cites·26 claims
- 0495US8382897B2Process gas delivery for semiconductor process chambersAPPLIED MATERIALS INC·Filed 2012·Granted Feb 26, 2013·21 cites·18 claims
- 0595US7794544B2Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD systemAPPLIED MATERIALS INC·Filed 2007·Granted Sep 14, 2010·49 cites·14 claims
- 0692US8294068B2Rapid thermal processing lamphead with improved coolingRANISH JOSEPH M·Filed 2008·Granted Oct 23, 2012·17 cites·21 claims
- 0790US8056500B2Thermal reactor with improved gas flow distributionTSENG MING-KUEI MICHAEL·Filed 2008·Granted Nov 15, 2011·17 cites·20 claims
- 0889US8608853B2Thermal reactor with improved gas flow distributionTSENG MING-KUEI MICHAEL·Filed 2011·Granted Dec 17, 2013·10 cites·15 claims
- 0988US8057601B2Apparatus and method for supporting, positioning and rotating a substrate in a processing chamberKOELMEL BLAKE·Filed 2007·Granted Nov 15, 2011·11 cites·49 claims
- 1087US8888916B2Thermal reactor with improved gas flow distributionAPPLIED MATERIALS INC·Filed 2013·Granted Nov 18, 2014·6 cites·20 claims
- 1187US8698049B2Rapid thermal processing lamphead with improved coolingAPPLIED MATERIALS INC·Filed 2012·Granted Apr 15, 2014·6 cites·20 claims
- 1286US8298629B2High throughput multi-wafer epitaxial reactorSIVARAMAKRISHNAN VISWESWAREN·Filed 2009·Granted Oct 30, 2012·5 cites·48 claims
- 1380US8187381B2Process gas delivery for semiconductor process chamberSANGAM KEDARNATH·Filed 2008·Granted May 29, 2012·8 cites·20 claims
- 1478US8490660B2Apparatus and method for supporting, positioning and rotating a substrate in a processing chamberKOELMEL BLAKE·Filed 2011·Granted Jul 23, 2013·3 cites·14 claims
- 1573US8377213B2Slit valve having increased flow uniformityAPPLIED MATERIALS INC·Filed 2008·Granted Feb 19, 2013·4 cites·15 claims
- 1670US9556522B2High throughput multi-wafer epitaxial reactorCrystal Solar Incorporated·Filed 2014·Granted Jan 31, 2017·0 cites·17 claims
- 1762US8663753B2High throughput multi-wafer epitaxial reactorCRYSTAL SOLAR INC·Filed 2012·Granted Mar 4, 2014·0 cites·22 claims
- 1858US2010116208A1Ampoule and delivery system for solid precursorsAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 1958US2010116206A1Gas delivery system having reduced pressure variationAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2056US2005252449A1Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD systemNGUYEN SON T·Filed 2005·Application pending·0 cites
- 2150US9423042B2Slit valve having increased flow uniformityAPPLIED MATERIALS INC·Filed 2013·Granted Aug 23, 2016·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →