Inventor · disambiguated record
Kenji Sekiguchi
Also filed as: SEKIGUCHI KENJI
37 granted patents·18 pending applications·732 citations·filing 1990–2025
97Inventor score
Top patents by PatentIndex Score
55 records- 0195US5695817AMethod of forming a coating filmTOKYO ELECTRON LTD·Filed 1995·Granted Dec 9, 1997·92 cites·28 claims
- 0295US5608943AApparatus for removing process liquidTOKYO ELECTRON LTD·Filed 1994·Granted Mar 11, 1997·241 cites·24 claims
- 0394US5803970AMethod of forming a coating film and coating apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Sep 8, 1998·82 cites·38 claims
- 0493US7806989B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Oct 5, 2010·24 cites·28 claims
- 0589US10734255B2Substrate cleaning method, substrate cleaning system and memory mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·6 cites·20 claims
- 0687US6432212B1Substrate washing methodTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·35 cites·5 claims
- 0786US8651121B2Substrate processing apparatus, substrate processing method, and storage mediumORII TAKEHIKO·Filed 2009·Granted Feb 18, 2014·13 cites·9 claims
- 0884US8337659B2Substrate processing method and substrate processing apparatusORII TAKEHIKO·Filed 2005·Granted Dec 25, 2012·10 cites·13 claims
- 0984US8056257B2Substrate processing apparatus and substrate processing methodOHNO HIROKI·Filed 2007·Granted Nov 15, 2011·11 cites·17 claims
- 1084US7837804B2Substrate cleaning method, substrate cleaning equipment, computer program, and program recording mediumTOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·10 cites·19 claims
- 1182US8475668B2Substrate liquid processing apparatus, substrate liquid processing method, and storage medium having substrate liquid processing program stored thereinTANAKA HIROSHI·Filed 2010·Granted Jul 2, 2013·6 cites·6 claims
- 1281US7364626B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Apr 29, 2008·26 cites·17 claims
- 1380US8147617B2Substrate cleaning method and computer readable storage mediumSEKIGUCHI KENJI·Filed 2005·Granted Apr 3, 2012·8 cites·8 claims
- 1478US11306249B2Substrate processing method, substrate processing device and etching liquidTOKYO ELECTRON LTD·Filed 2019·Granted Apr 19, 2022·2 cites·12 claims
- 1578US6385805B2Scrubbing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted May 14, 2002·55 cites·5 claims
- 1677US11049723B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 29, 2021·1 cites·10 claims
- 1777US8794250B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Aug 5, 2014·3 cites·7 claims
- 1877US6554010B1Substrate cleaning tool, having permeable cleaning headTOKYO ELECTRON LTD·Filed 2000·Granted Apr 29, 2003·23 cites·21 claims
- 1976US8037891B2Two-fluid nozzle for cleaning substrate and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Oct 18, 2011·8 cites·11 claims
- 2075US7803230B2Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 28, 2010·5 cites·10 claims
- 2171US12406862B2Vacuum processing apparatus and oxidizing gas removal methodTOKYO ELECTRON LTD·Filed 2023·Granted Sep 2, 2025·0 cites·3 claims
- 2271US6175983B1Substrate washing apparatus and methodTOKYO ELECTRON LTD·Filed 1998·Granted Jan 23, 2001·34 cites·14 claims
- 2369US8197606B2Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage mediumWATANABE TSUKASA·Filed 2010·Granted Jun 12, 2012·2 cites·14 claims
- 2469US6745533B2Building and construction method thereforTOKYO ELECTRIC POWER CO·Filed 2002·Granted Jun 8, 2004·11 cites·11 claims
- 2568US11865590B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·0 cites·4 claims
- 2667US2024222157A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2766US9111967B2Liquid processing method, liquid processing apparatus and storage mediumSEKIGUCHI KENJI·Filed 2012·Granted Aug 18, 2015·2 cites·20 claims
- 2863US12203021B2Substrate processing device and etching liquidTOKYO ELECTRON LTD·Filed 2022·Granted Jan 21, 2025·0 cites·2 claims
- 2961US2022403509A1Vacuum processing apparatus and oxidizing gas removal methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3060US9352653B2Circuit breaking unit and railcar including the sameKAWASAKI HIROYUKI·Filed 2011·Granted May 31, 2016·3 cites·12 claims
- 3158US11504751B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2019·Granted Nov 22, 2022·0 cites·4 claims
- 3258US2022127458A1Tube, and polyamide resin compositionKURARAY CO·Filed 2020·Application pending·0 cites
- 3357US2022275173A1Polyamide compositionKURARAY CO·Filed 2019·Application pending·0 cites
- 3455US11211281B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 28, 2021·0 cites·17 claims
- 3555US2021305066A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3655US2023111710A1Purification processing apparatus, substrate processing system, and processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3753US5119598AMethod of construction of top slab for a nuclear containment buildingHITACHI LTD·Filed 1990·Granted Jun 9, 1992·11 cites·7 claims
- 3851US2021179778A1Polyamide and polyamide compositionKURARAY CO·Filed 2019·Application pending·0 cites
- 3951US2024420970A1Liquid circulation system, substrate processing apparatus, and liquid circulation methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4049US11201050B2Substrate processing method, recording medium and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 14, 2021·0 cites·14 claims
- 4149US7010826B2Substrate cleaning tool and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 14, 2006·2 cites·13 claims
- 4249US2025144892A1Bonding method and bonding apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4348US7691210B2Resist film removing methodTOKYO ELECTRON LTD·Filed 2006·Granted Apr 6, 2010·0 cites·12 claims
- 4448US2023223251A1Method of manufacturing semiconductor device, semiconductor manufacturing device, and systemTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4548US2025149355A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4648US2022068642A1Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4748US2010108095A1Substrate processing apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 4847US2024128307A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4946US2022316059A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 5045US8137478B2Substrate processing method and substrate processing apparatusSEKIGUCHI KENJI·Filed 2010·Granted Mar 20, 2012·0 cites·14 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →