Inventor · disambiguated record
Kenji Sugishima
Also filed as: SUGISHIMA KENJI
35 granted patents·2 pending applications·969 citations·filing 1980–2014
98Inventor score
Top patents by PatentIndex Score
37 records- 0197US8396582B2Method and apparatus for self-learning and self-improving a semiconductor manufacturing toolKAUSHAL SANJEEV·Filed 2010·Granted Mar 12, 2013·61 cites·21 claims
- 0296US5557105APattern inspection apparatus and electron beam apparatusFUJITSU LTD·Filed 1994·Granted Sep 17, 1996·150 cites·7 claims
- 0396US5430292APattern inspection apparatus and electron beam apparatusFUJITSU LTD·Filed 1993·Granted Jul 4, 1995·152 cites·47 claims
- 0492US8744607B2Method and apparatus for self-learning and self-improving a semiconductor manufacturing toolTOKYO ELECTRON LTD·Filed 2013·Granted Jun 3, 2014·12 cites·20 claims
- 0590US4352724AMethod of manufacturing a semiconductor deviceFUJITSU LTD·Filed 1980·Granted Oct 5, 1982·89 cites·36 claims
- 0689US7452793B2Wafer curvature estimation, monitoring, and compensationTOKYO ELECTRON LTD·Filed 2005·Granted Nov 18, 2008·15 cites·24 claims
- 0788US7025280B2Adaptive real time control of a reticle/mask systemTOKYO ELECTRON LTD·Filed 2004·Granted Apr 11, 2006·41 cites·29 claims
- 0888US5384463APattern inspection apparatus and electron beam apparatusFUJISU LIMITED·Filed 1994·Granted Jan 24, 1995·70 cites·7 claims
- 0986US8954184B2Tool performance by linking spectroscopic information with tool operational parameters and material measurement informationKAUSHAL SANJEEV·Filed 2011·Granted Feb 10, 2015·8 cites·19 claims
- 1086US8725667B2Method and system for detection of tool performance degradation and mismatchKAUSHAL SANJEEV·Filed 2009·Granted May 13, 2014·30 cites·50 claims
- 1186US8078552B2Autonomous adaptive system and method for improving semiconductor manufacturing qualityKAUSHAL SANJEEV·Filed 2008·Granted Dec 13, 2011·16 cites·30 claims
- 1286US8026113B2Method of monitoring a semiconductor processing system using a wireless sensor networkTOKYO ELECTRON LTD·Filed 2006·Granted Sep 27, 2011·17 cites·35 claims
- 1385US7838072B2Method and apparatus for monolayer deposition (MLD)TOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·7 cites·38 claims
- 1485US7101816B2Methods for adaptive real time control of a thermal processing systemTOKYO ELECTRON LTD·Filed 2003·Granted Sep 5, 2006·33 cites·26 claims
- 1585US4684315AFrictionless supporting apparatusFUJITSU LTD·Filed 1986·Granted Aug 4, 1987·72 cites·3 claims
- 1684US9424528B2Method and apparatus for self-learning and self-improving a semiconductor manufacturing toolTOKYO ELECTRON LTD·Filed 2014·Granted Aug 23, 2016·11 cites·20 claims
- 1783US7165011B1Built-in self test for a thermal processing systemTOKYO ELECTRON LTD·Filed 2005·Granted Jan 16, 2007·11 cites·49 claims
- 1882US8723869B2Biologically based chamber matchingKAUSHAL SANJEEV·Filed 2011·Granted May 13, 2014·8 cites·32 claims
- 1982US7342244B2Spintronic transistorTOKYO ELECTRON LTD·Filed 2006·Granted Mar 11, 2008·13 cites·19 claims
- 2081US9275335B2Autonomous biologically based learning toolKAUSHAL SANJEEV·Filed 2012·Granted Mar 1, 2016·11 cites·20 claims
- 2181US8190543B2Autonomous biologically based learning toolKAUSHAL SANJEEV·Filed 2008·Granted May 29, 2012·17 cites·13 claims
- 2280US7561269B2Optical measurement system with systematic error correctionTOKYO ELECTRON LTD·Filed 2007·Granted Jul 14, 2009·8 cites·30 claims
- 2376US7340377B2Monitoring a single-wafer processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Mar 4, 2008·2 cites·33 claims
- 2475US7459175B2Method for monolayer depositionTOKYO ELECTRON LTD·Filed 2005·Granted Dec 2, 2008·2 cites·34 claims
- 2573US7519885B2Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) tableTOKYO ELECTRON LTD·Filed 2006·Granted Apr 14, 2009·7 cites·49 claims
- 2673US7444572B2Built-in self test for a thermal processing systemTOKYO ELECTRON LTD·Filed 2005·Granted Oct 28, 2008·4 cites·29 claims
- 2773US7406644B2Monitoring a thermal processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Jul 29, 2008·4 cites·25 claims
- 2871US7302363B2Monitoring a system during low-pressure processesTOKYO ELECTRON LTD·Filed 2006·Granted Nov 27, 2007·6 cites·55 claims
- 2970US7710565B2Method of correcting systematic error in a metrology systemTOKYO ELECTRON LTD·Filed 2007·Granted May 4, 2010·7 cites·25 claims
- 3070US5126220AReticle for photolithographic patterningFUJITSU LTD·Filed 1991·Granted Jun 30, 1992·26 cites·6 claims
- 3169US7526699B2Method for creating a built-in self test (BIST) table for monitoring a monolayer deposition (MLD) systemTOKYO ELECTRON LTD·Filed 2006·Granted Apr 28, 2009·5 cites·35 claims
- 3266US4748646AX-ray lithography systemFUJITSU LTD·Filed 1987·Granted May 31, 1988·17 cites·4 claims
- 3356US5541023AX-ray mask, method of manufacturing the x-ray mask and exposure method using the x-ray maskFUJITSU LTD·Filed 1993·Granted Jul 30, 1996·12 cites·13 claims
- 3451US4377031AMethod of making Schottky barrier diode by selective beam-crystallized polycrystalline/amorphous layerFUJITSU LTD·Filed 1981·Granted Mar 22, 1983·16 cites·7 claims
- 3549US2014304196A1Biologically based chamber matchingTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3640US4678919AElectron beam exposure method and apparatusFUJITSU LTD·Filed 1986·Granted Jul 7, 1987·9 cites·10 claims
- 3738US2007221125A1Semiconductor processing system with wireless sensor network monitoring system incorporated therewithTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →