Inventor · disambiguated record
Kenji Takeshita
Also filed as: KOHSAKA JUN · TAKESHITA KENJI
45 granted patents·15 pending applications·799 citations·filing 1993–2024
98Inventor score
Files withLAM RES CORP18APPLIED MATERIALS INC13MINOLTA CO LTD13TAKESHITA KENJI3KONICA MINOLTA BUSINESS TECH2
Top patents by PatentIndex Score
60 records- 0197US6461974B1High temperature tungsten etching processLAM RES CORP·Filed 2000·Granted Oct 8, 2002·226 cites·32 claims
- 0291US7892445B1Wafer electrical discharge control using argon free dechucking gasLAM RES CORP·Filed 2007·Granted Feb 22, 2011·23 cites·20 claims
- 0391US7169231B2Gas distribution system with tuning gasLAM RES CORP·Filed 2002·Granted Jan 30, 2007·47 cites·13 claims
- 0491US5808775ALaser beam scanning optical apparatusMINOLTA CO LTD·Filed 1997·Granted Sep 15, 1998·108 cites·10 claims
- 0587US11495470B1Method of enhancing etching selectivity using a pulsed plasmaAPPLIED MATERIALS INC·Filed 2021·Granted Nov 8, 2022·2 cites·17 claims
- 0686US7371332B2Uniform etch systemLAM RES CORP·Filed 2003·Granted May 13, 2008·29 cites·11 claims
- 0785US6514378B1Method for improving uniformity and reducing etch rate variation of etching polysiliconLAM RES CORP·Filed 2000·Granted Feb 4, 2003·36 cites·20 claims
- 0881US6709547B1Moveable barrier for multiple etch processesLAM RES CORP·Filed 1999·Granted Mar 23, 2004·50 cites·4 claims
- 0981US6531029B1Vacuum plasma processor apparatus and methodLAM RES CORP·Filed 2000·Granted Mar 11, 2003·15 cites·33 claims
- 1081US6400488B1Light beam scannerMINOLTA CO LTD·Filed 2000·Granted Jun 4, 2002·25 cites·20 claims
- 1172US6323955B1Image forming apparatusMINOLTA CO LTD·Filed 1997·Granted Nov 27, 2001·21 cites·21 claims
- 1271US7081407B2Method of preventing damage to porous low-k materials during resist strippingLAM RES CORP·Filed 2003·Granted Jul 25, 2006·11 cites·16 claims
- 1370US7773641B2Optically pumped disk-type solid state laser oscillator and optically pumped disk-type solid state laser systemMITSUBISHI HEAVY IND LTD·Filed 2007·Granted Aug 10, 2010·3 cites·6 claims
- 1468US6157478AMultibeam scanning optical apparatus and laser light source apparatusMINOLTA CO LTD·Filed 1996·Granted Dec 5, 2000·25 cites·15 claims
- 1567US8236188B2Method for low-K dielectric etch with reduced damageJI BING·Filed 2010·Granted Aug 7, 2012·2 cites·18 claims
- 1667US5450211AImage forming apparatus and method for maintaining set magnification not withstanding changes in optical system due to temperature changeMINOLTA CAMERA KK·Filed 1994·Granted Sep 12, 1995·23 cites·19 claims
- 1765US8259763B2Laser gain medium and laser oscillator using the sameTAKESHITA KENJI·Filed 2011·Granted Sep 4, 2012·2 cites·9 claims
- 1863US8801892B2Uniform etch systemLARSON DEAN J·Filed 2008·Granted Aug 12, 2014·1 cites·7 claims
- 1963US8222155B2Selectivity control in a plasma processing systemTAKESHITA KENJI·Filed 2008·Granted Jul 17, 2012·2 cites·20 claims
- 2063US7090782B1Etch with uniformity controlLAM RES CORP·Filed 2004·Granted Aug 15, 2006·8 cites·20 claims
- 2163US2025149337A1High selectivity cryogenic tungsten-boron-carbide etchAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2262US12315732B2Method and apparatus for etching a semiconductor substrate in a plasma etch chamberAPPLIED MATERIALS INC·Filed 2022·Granted May 27, 2025·0 cites·20 claims
- 2362US8911590B2Integrated capacitive and inductive power sources for a plasma etching chamberDHINDSA RAJINDER·Filed 2006·Granted Dec 16, 2014·1 cites·17 claims
- 2461US8068523B2Laser gain medium and laser oscillator using the sameTAKESHITA KENJI·Filed 2009·Granted Nov 29, 2011·2 cites·6 claims
- 2561US7517801B1Method for selectivity control in a plasma processing systemLAM RES CORP·Filed 2004·Granted Apr 14, 2009·7 cites·20 claims
- 2660US9443716B2Precise critical dimension control using bilayer ALDAPPLIED MATERIALS INC·Filed 2015·Granted Sep 13, 2016·1 cites·20 claims
- 2760US6341030B1Light beam optical scanner and image forming apparatusMINOLTA CO LTD·Filed 2000·Granted Jan 22, 2002·7 cites·13 claims
- 2859US5561743ADigital method image forming apparatus and image forming method thereofMINOLTA CAMERA KK·Filed 1995·Granted Oct 1, 1996·20 cites·8 claims
- 2959US2025118557A1Selective hardmask etch for semiconductor processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3059US2025118570A1Bow mitigation in high aspect ratio oxide and nitride etchesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3158US8936855B2Wood fiber board and manufacturing method thereofKIMURO MAKOTO·Filed 2011·Granted Jan 20, 2015·2 cites·4 claims
- 3258US6313906B1Multibeam scanning deviceMINOLTA CO LTD·Filed 1998·Granted Nov 6, 2001·21 cites·39 claims
- 3358US2024429062A1Increased etch rates of silicon-containing materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3458US2025069895A1Methods of etching silicon-and-oxygen-containing features at low temperaturesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3557US8946091B2Prevention of line bending and tilting for etch with tri-layer maskOH YOUN-JIN·Filed 2011·Granted Feb 3, 2015·1 cites·18 claims
- 3657US2025095984A1In-situ sidewall passivation toward the bottom of high aspect ratio featuresAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3756US2025022714A1Cyclic etch of silicon oxide and silicon nitrideAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3854US2023057145A1Plasma chamber with a multiphase rotating cross-flow with uniformity tuningAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3953US12278110B2Bias voltage modulation approach for SiO/SiN layer alternating etch processAPPLIED MATERIALS INC·Filed 2022·Granted Apr 15, 2025·0 cites·21 claims
- 4052US6038353ALight beam scanning optical apparatusMINOLTA CO LTD·Filed 1998·Granted Mar 14, 2000·16 cites·20 claims
- 4150US6897156B2Vacuum plasma processor methodLAM RES CORP·Filed 2003·Granted May 24, 2005·1 cites·24 claims
- 4250US5969346ALaser beam scanning optical apparatusMINOLTA CO LTD·Filed 1997·Granted Oct 19, 1999·15 cites·18 claims
- 4350US2006240661A1Method of preventing damage to porous low-K materials during resist strippingANNAPRAGADA RAO·Filed 2006·Application pending·0 cites
- 4449US7534363B2Method for providing uniform removal of organic materialLAM RES CORP·Filed 2004·Granted May 19, 2009·3 cites·13 claims
- 4549US6088146AScanning optical system and a scanning optical apparatusMINOLTA CO LTD·Filed 1998·Granted Jul 11, 2000·14 cites·7 claims
- 4648US2011097904A1Method for repairing low-k dielectric damageLAM RES CORP·Filed 2009·Application pending·0 cites
- 4746US7521362B2Methods for the optimization of ion energy control in a plasma processing systemLAM RES CORP·Filed 2003·Granted Apr 21, 2009·1 cites·38 claims
- 4845US8114780B2Method for dielectric material removal between conductive linesBLOCK MAYUMI·Filed 2009·Granted Feb 14, 2012·0 cites·19 claims
- 4945US2017076917A1Plasma Module With Slotted Ground PlateAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 5044US6097421AScanning optical systemMINOLTA CO LTD·Filed 1996·Granted Aug 1, 2000·11 cites·37 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →