Inventor · disambiguated record
Ki Ho Baik
Also filed as: BAIK KI-HO
90 granted patents·6 pending applications·4,088 citations·filing 1995–2004
99Inventor score
Files withHYUNDAI ELECTRONICS IND71HYNIX SEMICONDUCTOR INC19APPLIED MATERIALS INC1HYUNDAI ELECTRONICS CO LTD1
Top patents by PatentIndex Score
96 records- 0199US6811960B2Partially crosslinked polymer for bilayer photoresistHYUNDAI ELECTRONICS IND·Filed 2003·Granted Nov 2, 2004·467 cites·16 claims
- 0299US6589707B2Partially crosslinked polymer for bilayer photoresistHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jul 8, 2003·485 cites·23 claims
- 0399US6455225B1Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·465 cites·22 claims
- 0499US6225020B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 1, 2001·508 cites·20 claims
- 0598US6368773B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Apr 9, 2002·473 cites·10 claims
- 0698US6316162B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 13, 2001·482 cites·7 claims
- 0797US6866984B2ArF photoresist copolymersHYUNDAI ELECTRONICS IND·Filed 2003·Granted Mar 15, 2005·88 cites·10 claims
- 0894US6632903B2Polymer-containing photoresist, and process for manufacturing the sameHYUNDAI ELECTRONICS IND·Filed 2001·Granted Oct 14, 2003·31 cites·7 claims
- 0993US6368768B1Organic anti-reflective coating material and its preparationHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 9, 2002·26 cites·41 claims
- 1091US6132926AArF photoresist copolymersHYUNDAI ELECTRONICS IND·Filed 1997·Granted Oct 17, 2000·79 cites·40 claims
- 1190US6395451B1Photoresist composition containing photo base generator with photo acid generatorHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 28, 2002·48 cites·17 claims
- 1290US6235447B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·38 cites·35 claims
- 1388US6388039B1Organic anti-reflective polymer and method for manufacturing thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 14, 2002·23 cites·34 claims
- 1488US6309790B1Organic anti-reflective coating material and its preparationHYUNDAI ELECTRONICS IND·Filed 2000·Granted Oct 30, 2001·40 cites·44 claims
- 1587US6489432B2Organic anti-reflective coating polymer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Dec 3, 2002·25 cites·21 claims
- 1686US6692891B2Photoresist composition containing photo radical generator with photoacid generatorHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Feb 17, 2004·60 cites·13 claims
- 1786US6426171B1Photoresist monomer, polymer thereof and photoresist composition containing itHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 30, 2002·16 cites·26 claims
- 1886US6395397B2Organic anti-reflective coating polymer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 28, 2002·23 cites·35 claims
- 1986US6312865B1Semiconductor device using polymer-containing photoresist, and process for manufacturing the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Nov 6, 2001·24 cites·12 claims
- 2084US6150069AOxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 21, 2000·50 cites·18 claims
- 2181US6492441B2Anti reflective coating polymers and the preparation method thereofHYUNDAI ELECTRONICS IND·Filed 2001·Granted Dec 10, 2002·15 cites·11 claims
- 2280US6403281B1Cross-linker monomer comprising double bond and photoresist copolymer containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 11, 2002·17 cites·21 claims
- 2379US6569599B2Partially crosslinked polymer for bilayer photoresistHYNIX SEMICONDUCTOR INC·Filed 2001·Granted May 27, 2003·17 cites·33 claims
- 2479US6265130B1Photoresist polymers of carboxyl-containing alicyclic compoundsHYUNDAI ELECTRONICS IND·Filed 1999·Granted Jul 24, 2001·16 cites·15 claims
- 2578US6489423B2Organic anti-reflective polymer and method for manufacturing thereofHYUNDAI ELECTRONICS IND·Filed 2002·Granted Dec 3, 2002·6 cites·11 claims
- 2677US6322948B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 27, 2001·15 cites·10 claims
- 2777US6312868B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 6, 2001·14 cites·19 claims
- 2876US6764806B2Over-coating composition for photoresist, and processes for forming photoresist patterns using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 20, 2004·17 cites·20 claims
- 2975US6291131B1Monomers for photoresist, polymers thereof, and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Sep 18, 2001·18 cites·32 claims
- 3075US6248847B1Copolymer resin, preparation thereof, and photoresist using the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Jun 19, 2001·12 cites·6 claims
- 3175US6235448B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·32 cites·23 claims
- 3275US5830624AMethod for forming resist patterns comprising two photoresist layers and an intermediate layerHYUNDAI ELECTRONICS IND·Filed 1995·Granted Nov 3, 1998·42 cites·4 claims
- 3374US6368770B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 9, 2002·12 cites·31 claims
- 3473US6399272B1Phenylenediamine derivative-type additive useful for a chemically amplified photoresistHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 4, 2002·11 cites·24 claims
- 3573US6387589B1Photoresist polymers and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 14, 2002·11 cites·24 claims
- 3672US6486283B2Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereofHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Nov 26, 2002·11 cites·11 claims
- 3771US6455226B1Photoresist polymers and photoresist composition containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·9 cites·20 claims
- 3871US6200731B1Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Mar 13, 2001·11 cites·19 claims
- 3969US6548613B2Organic anti-reflective coating polymer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 15, 2003·8 cites·30 claims
- 4067US6537724B1Photoresist composition for resist flow process, and process for forming contact hole using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Mar 25, 2003·9 cites·18 claims
- 4167US6448352B1Photoresist monomer, polymer thereof and photoresist composition containing itHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 10, 2002·6 cites·20 claims
- 4267US6416926B1Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 9, 2002·8 cites·20 claims
- 4367US6319654B1Process for forming a photoresist pattern by top surface imaging processHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 20, 2001·23 cites·17 claims
- 4466US6984482B2Top-coating composition for photoresist and process for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 10, 2006·6 cites·8 claims
- 4566US6770414B2Additive for photoresist composition for resist flow processHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 3, 2004·3 cites·2 claims
- 4666US6482565B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 19, 2002·11 cites·16 claims
- 4766US6350818B1Anti reflective coating polymers and the preparation method thereofHYUNDAI ELECTRONICS IND·Filed 1999·Granted Feb 26, 2002·16 cites·9 claims
- 4865US6818376B2Cross-linker monomer comprising double bond and photoresist copolymer containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Nov 16, 2004·7 cites·23 claims
- 4965US6538090B2Organic anti-reflective polymer and method for manufacturing thereofHYUNDAI ELECTRONICS IND·Filed 2002·Granted Mar 25, 2003·2 cites·12 claims
- 5065US6391518B1Polymers and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 21, 2002·17 cites·29 claims
Showing the top 50 of 96 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →