Inventor · disambiguated record
Kin Pong Lo
Also filed as: LO KIN PONG
24 granted patents·9 pending applications·115 citations·filing 2006–2025
95Inventor score
Files withAPPLIED MATERIALS INC28CARDUCCI JAMES D2BEIJING E TOWN SEMICONDUCTOR TECH CO LTD1KAWAGUCHI MARK NAOSHI1LO KIN PONG1
Top patents by PatentIndex Score
33 records- 0193US10062598B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2015·Granted Aug 28, 2018·7 cites·12 claims
- 0293US2025364306A1Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0392US9845550B2Upper dome with injection assemblyAPPLIED MATERIALS INC·Filed 2015·Granted Dec 19, 2017·7 cites·20 claims
- 0491USD1034491SEdge ringAPPLIED MATERIALS INC·Filed 2020·Granted Jul 9, 2024·17 cites·1 claims
- 0591US8313578B2Etching chamber having flow equalizer and lower linerCARDUCCI JAMES D·Filed 2009·Granted Nov 20, 2012·13 cites·13 claims
- 0690US11380575B2Film thickness uniformity improvement using edge ring and bias electrode geometryAPPLIED MATERIALS INC·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 0790US10930543B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·4 cites·17 claims
- 0889US11164737B2Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2018·Granted Nov 2, 2021·4 cites·20 claims
- 0986US12400904B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2023·Granted Aug 26, 2025·0 cites·20 claims
- 1084US7655571B2Integrated method and apparatus for efficient removal of halogen residues from etched substratesAPPLIED MATERIALS INC·Filed 2006·Granted Feb 2, 2010·11 cites·26 claims
- 1183US9735002B2Integrated apparatus for efficient removal of halogen residues from etched substratesKAWAGUCHI MARK NAOSHI·Filed 2008·Granted Aug 15, 2017·12 cites·16 claims
- 1282US11049719B2Epitaxy system integrated with high selectivity oxide removal and high temperature contaminant removalAPPLIED MATERIALS INC·Filed 2018·Granted Jun 29, 2021·3 cites·17 claims
- 1381US10727093B2Light pipe window structure for low pressure thermal processesAPPLIED MATERIALS INC·Filed 2015·Granted Jul 28, 2020·3 cites·16 claims
- 1480USD858192SGas distribution plateAPPLIED MATERIALS INC·Filed 2018·Granted Sep 3, 2019·18 cites·1 claims
- 1580US10269614B2Susceptor design to reduce edge thermal peakAPPLIED MATERIALS INC·Filed 2015·Granted Apr 23, 2019·3 cites·15 claims
- 1679US2025046596A1Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1776US9109466B2Diffuser with backward facing step having varying step heightLO KIN PONG·Filed 2012·Granted Aug 18, 2015·8 cites·9 claims
- 1875US11848226B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·0 cites·7 claims
- 1974US12487121B2Methods for calibrating an optical emission spectrometerAPPLIED MATERIALS INC·Filed 2024·Granted Dec 2, 2025·0 cites·20 claims
- 2074US10458040B2Upper dome with injection assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Oct 29, 2019·1 cites·20 claims
- 2173US12125698B2Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 22, 2024·0 cites·9 claims
- 2271US12266560B2Film thickness uniformity improvement using edge ring and bias electrode geometryAPPLIED MATERIALS INC·Filed 2022·Granted Apr 1, 2025·0 cites·20 claims
- 2371US9832816B2Absorbing reflector for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Nov 28, 2017·2 cites·11 claims
- 2460US11927482B2Methods for calibrating an optical emission spectrometerAPPLIED MATERIALS INC·Filed 2020·Granted Mar 12, 2024·0 cites·20 claims
- 2558US2009188625A1Etching chamber having flow equalizer and lower linerCARDUCCI JAMES D·Filed 2008·Application pending·0 cites
- 2652US10306708B2Absorbing reflector for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2017·Granted May 28, 2019·0 cites·20 claims
- 2752US2023142778A1Storage Cassette for Replaceable Parts for Plasma Processing ApparatusBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2022·Application pending·0 cites
- 2850US10971357B2Thin film treatment processAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·20 claims
- 2946US2016033070A1Recursive pumping memberAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3041US2016068955A1Honeycomb multi-zone gas distribution plateAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3141US2015368830A1One-piece injector assembly and one-piece exhaust linerAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3240US2019062904A1Integrated epitaxy system high temperature contaminant removalAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 3338US2017350038A1Vacuum platform with process chambers for removing carbon contaminants and surface oxide from semiconductor substratesAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →