Inventor · disambiguated record
Koji Hasegawa
Also filed as: HASEGAWA KOJI
257 granted patents·41 pending applications·2,566 citations·filing 1985–2024
99Inventor score
Top patents by PatentIndex Score
298 records- 0199US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0299US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0398US10303056B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 28, 2019·11 cites·2 claims
- 0498US7670750B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 2, 2010·65 cites·25 claims
- 0598US7537880B2Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 26, 2009·258 cites·10 claims
- 0698US6280898B1Lactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Aug 28, 2001·229 cites·21 claims
- 0797US7084303B2Tertiary amine compounds having an ester structure and processes for preparing sameSHINETSU CHEMICAL CO·Filed 2002·Granted Aug 1, 2006·79 cites·8 claims
- 0897US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
- 0996US10915021B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Feb 9, 2021·8 cites·15 claims
- 1096US8440386B2Patterning process, resist composition, and acetal compoundHATAKEYAMA JUN·Filed 2011·Granted May 14, 2013·10 cites·14 claims
- 1196US7981589B2Fluorinated monomer, fluorinated polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Jul 19, 2011·22 cites·5 claims
- 1296US6284429B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 4, 2001·50 cites·19 claims
- 1395US8501386B2Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning processOGIHARA TSUTOMU·Filed 2011·Granted Aug 6, 2013·14 cites·14 claims
- 1495US7622242B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Nov 24, 2009·25 cites·12 claims
- 1595US7531289B2Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted May 12, 2009·16 cites·13 claims
- 1695US6746818B2(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Jun 8, 2004·48 cites·20 claims
- 1795US6466163B2GPS receiver and portable communication apparatusSONY CORP·Filed 2001·Granted Oct 15, 2002·87 cites·20 claims
- 1894US9335632B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted May 10, 2016·9 cites·18 claims
- 1994US8114570B2Photoacid generator, resist composition, and patterning processOHSAWA YOUICHI·Filed 2009·Granted Feb 14, 2012·15 cites·16 claims
- 2094US7642034B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jan 5, 2010·22 cites·8 claims
- 2193US9017918B2Monomer, polymer, chemically amplified positive resist composition, and patterning processHATAKEYAMA JUN·Filed 2011·Granted Apr 28, 2015·8 cites·9 claims
- 2293US8597869B2Sulfonium salt, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Dec 3, 2013·10 cites·7 claims
- 2392US10126649B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 13, 2018·4 cites·20 claims
- 2492US9969829B2Polymer compound, negative resist composition, laminate, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2017·Granted May 15, 2018·3 cites·20 claims
- 2592US8268528B2Resist composition and patterning processHARADA YUJI·Filed 2009·Granted Sep 18, 2012·14 cites·19 claims
- 2692USRE41580ELactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 24, 2010·8 cites·48 claims
- 2792US6470726B1Method for manufacturing an extruded article changing in cross-section and an apparatus for extruding said extruded articleSHOWA DENKO KK·Filed 2000·Granted Oct 29, 2002·23 cites·19 claims
- 2892US4757007AProcess for preparing hydrolyzed products of soy proteinNISSHIN OIL MILLS LTD·Filed 1985·Granted Jul 12, 1988·105 cites·18 claims
- 2991US10457779B2Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured filmSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 29, 2019·4 cites·18 claims
- 3091US9587137B2Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Mar 7, 2017·3 cites·20 claims
- 3191US8101335B2Resist composition and patterning processHARADA YUJI·Filed 2009·Granted Jan 24, 2012·15 cites·12 claims
- 3291US7833694B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 16, 2010·9 cites·8 claims
- 3391US7527912B2Photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 5, 2009·38 cites·15 claims
- 3490US11160480B2Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrodeSHINETSU CHEMICAL CO·Filed 2019·Granted Nov 2, 2021·2 cites·21 claims
- 3590US11009793B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 18, 2021·4 cites·17 claims
- 3690US8431323B2Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning processWATANABE TAKERU·Filed 2009·Granted Apr 30, 2013·7 cites·28 claims
- 3790US7875417B2Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning methodSHINETSU CHEMICAL CO·Filed 2008·Granted Jan 25, 2011·12 cites·17 claims
- 3889US10816900B2Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured filmSHINETSU CHEMICAL CO·Filed 2018·Granted Oct 27, 2020·3 cites·8 claims
- 3989US9081290B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 14, 2015·6 cites·15 claims
- 4089US8900793B2Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist compositionSAGEHASHI MASAYOSHI·Filed 2012·Granted Dec 2, 2014·7 cites·8 claims
- 4189US8313886B2Resist composition and patterning processHARADA YUJI·Filed 2010·Granted Nov 20, 2012·9 cites·14 claims
- 4289US7871752B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jan 18, 2011·11 cites·5 claims
- 4388US7868199B2Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning processEUDYNA DEVICES INC·Filed 2007·Granted Jan 11, 2011·7 cites·9 claims
- 4488US7678530B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 16, 2010·9 cites·20 claims
- 4588US7109828B2Surface acoustic wave device, and mobile communication device and sensor both using sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Sep 19, 2006·36 cites·51 claims
- 4687US10023674B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 17, 2018·3 cites·11 claims
- 4787US10020089B2Conductive polymer composite and substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Jul 10, 2018·2 cites·7 claims
- 4887US9377689B2Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting filmSHINETSU CHEMICAL CO·Filed 2015·Granted Jun 28, 2016·5 cites·15 claims
- 4987US8652750B2Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning methodOGIHARA TSUTOMU·Filed 2008·Granted Feb 18, 2014·9 cites·15 claims
- 5087US8574817B2Positive resist composition and patterning processHATAKEYAMA JUN·Filed 2012·Granted Nov 5, 2013·5 cites·11 claims
Showing the top 50 of 298 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →