Inventor · disambiguated record
Kosuke Imafuku
Also filed as: IMAFUKU KOSUKE
13 granted patents·5 pending applications·1,860 citations·filing 1995–2016
94Inventor score
Top patents by PatentIndex Score
18 records- 0198USD411516SGas diffusion plate for electrode of semiconductor wafer processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jun 29, 1999·469 cites·1 claims
- 0297US6544380B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 8, 2003·104 cites·3 claims
- 0397US6074518APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 13, 2000·276 cites·3 claims
- 0496US5716534APlasma processing method and plasma etching methodTOKYO ELECTRON LTD·Filed 1995·Granted Feb 10, 1998·145 cites·12 claims
- 0596US5698062APlasma treatment apparatus and methodTOKYO ELECTRON LTD·Filed 1995·Granted Dec 16, 1997·161 cites·3 claims
- 0693US6723202B2Worktable device and plasma processing apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2001·Granted Apr 20, 2004·124 cites·16 claims
- 0791US8991214B2Method of refurbishing a quartz glass componentHOSHINO KATSUTOSHI·Filed 2010·Granted Mar 31, 2015·463 cites·20 claims
- 0891US6391147B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 21, 2002·49 cites·5 claims
- 0988US6106737APlasma treatment method utilizing an amplitude-modulated high frequency powerTOKYO ELECTRON LTD·Filed 1998·Granted Aug 22, 2000·66 cites·4 claims
- 1084US8785214B2Method of recycling silicon component for plasma etching apparatus and silicon component for plasma etching apparatusIMAFUKU KOSUKE·Filed 2010·Granted Jul 22, 2014·3 cites·5 claims
- 1175US9290391B2Silicon component for plasma etching apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Mar 22, 2016·0 cites·8 claims
- 1268US9399584B2Silicon focus ringTOKYO ELECTRON LTD·Filed 2016·Granted Jul 26, 2016·0 cites·8 claims
- 1352US2008156441A1Plasma processing apparatus and electrode plate, electrode supporting body, and shield ring thereofTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1440US2004081746A1Method for regenerating container for plasma treatment, member inside container for plasma treatment, method for preparing member inside container for plasma treatment, and apparatus for plasma treatmentFiled 2001·Application pending·0 cites
- 1540US2003155078A1Plasma processing apparatus, and electrode plate, electrode supporting body, and shield ring thereofTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 1636US2004200804A1Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereonFiled 2002·Application pending·0 cites
- 1734US7207340B2Method and system for removal of gas and plasma processing apparatusTOKYO ELECTRIC LTD·Filed 2001·Granted Apr 24, 2007·0 cites·8 claims
- 1833US2004083970A1Vacuum processing deviceFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →