Inventor · disambiguated record
Kohei Kawamura
Also filed as: KAWAMURA KOHEI
44 granted patents·21 pending applications·1,166 citations·filing 1987–2023
98Inventor score
Top patents by PatentIndex Score
65 records- 0197US5522934APlasma processing apparatus using vertical gas inlets one on top of anotherTOKYO ELECTRON LTD·Filed 1995·Granted Jun 4, 1996·322 cites·14 claims
- 0292US5531834APlasma film forming method and apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 2, 1996·161 cites·10 claims
- 0391US8711265B2Image processing apparatus, control method for the same, and storage mediumKAWAMURA KOHEI·Filed 2009·Granted Apr 29, 2014·18 cites·25 claims
- 0491US5083061AElectron beam excited ion sourceTOKYO ELECTRON LTD·Filed 1990·Granted Jan 21, 1992·67 cites·15 claims
- 0590US5476182AEtching apparatus and method thereforTOKYO ELECTRON LTD·Filed 1993·Granted Dec 19, 1995·66 cites·32 claims
- 0689US5290609AMethod of forming dielectric film for semiconductor devicesTOKYO ELECTRON LTD·Filed 1992·Granted Mar 1, 1994·123 cites·12 claims
- 0788US7717061B2Gas switching mechanism for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted May 18, 2010·20 cites·9 claims
- 0886USD900760SIon shield plate for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 3, 2020·26 cites·1 claims
- 0986US4749912AIon-producing apparatusRIKAGAKU KENKYUSHO·Filed 1987·Granted Jun 7, 1988·40 cites·13 claims
- 1084US5028791AElectron beam excitation ion sourceTOKYO ELECTRON LTD·Filed 1990·Granted Jul 2, 1991·44 cites·5 claims
- 1181US7897205B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Mar 1, 2011·7 cites·5 claims
- 1280US7776736B2Substrate for electronic device capable of suppressing fluorine atoms exposed at the surface of insulating film from reacting with water and method for processing sameTOKYO ELECTRON LTD·Filed 2005·Granted Aug 17, 2010·3 cites·22 claims
- 1379US11217454B2Plasma processing method and etching apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 4, 2022·2 cites·4 claims
- 1479US5101110AIon generatorTOKYO ELECTRON LTD·Filed 1990·Granted Mar 31, 1992·33 cites·19 claims
- 1578US6949829B2Semiconductor device and fabrication method thereforTOKYO ELECTRON LTD·Filed 2001·Granted Sep 27, 2005·22 cites·40 claims
- 1677US9177846B2Placing bed structure, treating apparatus using the structure, and method for using the apparatusKAWAMURA KOHEI·Filed 2008·Granted Nov 3, 2015·5 cites·9 claims
- 1777US5252892APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Oct 12, 1993·30 cites·12 claims
- 1875US6155200AECR plasma generator and an ECR system using the generatorTOKYO ELECTRON LTD·Filed 1998·Granted Dec 5, 2000·45 cites·10 claims
- 1972US11515167B2Plasma etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 29, 2022·1 cites·14 claims
- 2072US6311908B1Crushing method for waste containing materials unfit for crushing and apparatus for its practiceTAKUMA KK·Filed 1999·Granted Nov 6, 2001·31 cites·22 claims
- 2170US5089747AElectron beam excitation ion sourceTOKYO ELECTRON LTD·Filed 1990·Granted Feb 18, 1992·22 cites·9 claims
- 2269US10872779B2Plasma etching method and plasma etching apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 22, 2020·1 cites·13 claims
- 2368US10388557B2Placing bed structure, treating apparatus using the structure, and method for using the apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 20, 2019·1 cites·12 claims
- 2467US8394231B2Plasma process device and plasma process methodTAKATSUKI KOICHI·Filed 2007·Granted Mar 12, 2013·3 cites·18 claims
- 2567US8197913B2Film forming method for a semiconductorMATSUOKA TAKAAKI·Filed 2008·Granted Jun 12, 2012·2 cites·22 claims
- 2667US2025347049A1Modified regenerated collagen fiber, production method therefor, and headdress product containing sameKAO CORP·Filed 2023·Application pending·0 cites
- 2767US2025188676A1Modified regenerated collagen fibers, production method therefor, and headdress product including sameKAO CORP·Filed 2023·Application pending·0 cites
- 2866US2022346421A1Agent for forming crispy wings on gyoza dumplingsAJINOMOTO KK·Filed 2022·Application pending·0 cites
- 2965US2021112817A1Frozen gyoza and method for producing sameAJINOMOTO KK·Filed 2020·Application pending·0 cites
- 3064USD901407SIntegrated type ion shield for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 10, 2020·9 cites·1 claims
- 3163US8435882B2Film forming method for a semiconductorMATSUOKA TAKAAKI·Filed 2008·Granted May 7, 2013·1 cites·13 claims
- 3263US7186806B2Process for producing regenerated collagen fiber and process for setting the sameHOKUYO CO LTD·Filed 2001·Granted Mar 6, 2007·4 cites·13 claims
- 3363US5958258APlasma processing method in semiconductor processing systemTEL YAMANISHI KK·Filed 1998·Granted Sep 28, 1999·28 cites·15 claims
- 3461US7923819B2Interlayer insulating film, wiring structure and electronic device and methods of manufacturing the sameUNIV TOHOKU NAT UNIV CORP·Filed 2007·Granted Apr 12, 2011·1 cites·16 claims
- 3561US2007160757A1Processing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3660US2019183157A1Soup baseAJINOMOTO KK·Filed 2019·Application pending·0 cites
- 3759US12102151B2Fiber for artificial hair and hair ornament product including sameKANEKA CORP·Filed 2018·Granted Oct 1, 2024·0 cites·20 claims
- 3859US7612000B2Modacrylic shrinkable fiber and method for manufacturing the sameKANEKA CORP·Filed 2005·Granted Nov 3, 2009·1 cites·12 claims
- 3958US7765466B2Information processing apparatus that stores a plurality of image data items having different data-formats and communicates with an external apparatus via a network, and method thereforCANON KK·Filed 2004·Granted Jul 27, 2010·3 cites·5 claims
- 4058US2016088888A1Fiber for artificial hair and hair ornament product including sameKANEKA CORP·Filed 2014·Application pending·0 cites
- 4154US2025169089A1Method for manufacturing semiconductor device and plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 4251US5308791AMethod and apparatus for processing surface of semiconductor layerTOKYO ELECTRON LTD·Filed 1992·Granted May 3, 1994·21 cites·7 claims
- 4349US7601402B2Method for forming insulation film and apparatus for forming insulation filmTOKYO ELECTRON LTD·Filed 2003·Granted Oct 13, 2009·2 cites·13 claims
- 4448US10418254B2Etching method and etching apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 17, 2019·0 cites·17 claims
- 4548US8021975B2Plasma processing method for forming a film and an electronic component manufactured by the methodTOKYO ELECTRON LTD·Filed 2007·Granted Sep 20, 2011·0 cites·19 claims
- 4648US2004250765A1Processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 4747US2010032838A1Amorphous carbon film, semiconductor device, film forming method, film forming apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 4846US2006238819A1Processing manipulation utilizing graphical user interfaceCANON KK·Filed 2006·Application pending·0 cites
- 4945US9560891B2Polyester-based fiber for artificial hair and hair ornament product including the same, and method for producing the sameKANEKA CORP·Filed 2013·Granted Feb 7, 2017·0 cites·12 claims
- 5045US2010101834A1Interlayer insulation film, interconnect structure, and methods of manufacturing themUNIV TOHOKU NAT UNIV CORP·Filed 2008·Application pending·0 cites
Showing the top 50 of 65 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →