Inventor · disambiguated record
Konstantin Nikolaevich Koshelev
Also filed as: KOSHELEV KONSTANTIN NIKOLAEVICH
16 granted patents·6 pending applications·61 citations·filing 2006–2023
90Inventor score
Files withASML NETHERLANDS BV8ISTEQ B V6IVANOV VLADIMIR VITALEVICH2ANTSIFEROV PAVEL STANISLAVOVICH1EUV LABS LTD1
Top patents by PatentIndex Score
22 records- 0195US10887973B2High brightness laser-produced plasma light sourceISTEQ B V·Filed 2020·Granted Jan 5, 2021·7 cites·19 claims
- 0294US10588210B1High brightness short-wavelength radiation source (variants)ISTEQ B V·Filed 2019·Granted Mar 10, 2020·13 cites·20 claims
- 0394US9476841B1High-brightness LPP EUV light sourceISTEQ B V·Filed 2016·Granted Oct 25, 2016·22 cites·17 claims
- 0492US10638588B2High-brightness laser produced plasma source and methods for generating radiation and mitigating debrisISTEQ B V·Filed 2018·Granted Apr 28, 2020·7 cites·19 claims
- 0586US11252810B2Short-wavelength radiation source with multisectional collector module and method of collecting radiationISTEQ B V·Filed 2020·Granted Feb 15, 2022·2 cites·19 claims
- 0672US11869742B2X-ray source with rotating liquid-metal targetEUV LABS LTD·Filed 2020·Granted Jan 9, 2024·1 cites·13 claims
- 0765US9357627B2Light source with laser pumping and method for generating radiationANTSIFEROV PAVEL STANISLAVOVICH·Filed 2014·Granted May 31, 2016·2 cites·20 claims
- 0862US9368337B2Light source with laser pumping and method for generating radiationRND IS AN LTD·Filed 2013·Granted Jun 14, 2016·2 cites·18 claims
- 0961US8493548B2Lithographic apparatus and device manufacturing methodIVANOV VLADIMIR VITALEVICH·Filed 2007·Granted Jul 23, 2013·3 cites·39 claims
- 1049US7825390B2Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 2, 2010·0 cites·20 claims
- 1149US7772570B2Assembly for blocking a beam of radiation and method of blocking a beam of radiationASML NETHERLANDS BV·Filed 2006·Granted Aug 10, 2010·0 cites·22 claims
- 1249US7518135B2Reducing fast ions in a plasma radiation sourceASML NETHERLANDS BV·Filed 2006·Granted Apr 14, 2009·2 cites·20 claims
- 1349US2024121878A1High brightness lpp euv light source with fast rotating target and method of cooling thereofISTEQ GROUP HOLDING B V·Filed 2023·Application pending·0 cites
- 1447US12028958B2High-brightness laser produced plasma source and method of generation and collection radiationISTEQ B V·Filed 2022·Granted Jul 2, 2024·0 cites·20 claims
- 1547US2011037960A1Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning deviceASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 1644US2008266654A1Extreme ultraviolet microscopeASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 1744US2013287968A1Lithographic apparatus and device manufacturing methodIVANOV VLADIMIR VITALEVICH·Filed 2013·Application pending·0 cites
- 1843US8294128B2Apparatus with plasma radiation source and method of forming a beam of radiationKRIVTSUN VLADIMIR MIHAILOVITCH·Filed 2010·Granted Oct 23, 2012·0 cites·17 claims
- 1936US2013015373A1EUV Radiation Source and EUV Radiation Generation MethodASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 2036US2011020752A1Extreme ultraviolet radiation source and method for producing extreme ultraviolet radiationASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 2135US7872244B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jan 18, 2011·0 cites·36 claims
- 2233US9307624B2Lithographic apparatusGLUSHKOV DENIS ALEXANDROVICH·Filed 2009·Granted Apr 5, 2016·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →