Inventor · disambiguated record
Kotaro Tsurusaki
Also filed as: TSURUSAKI KOTARO
11 granted patents·3 pending applications·189 citations·filing 1998–2024
86Inventor score
Technology areasH10P
Top patents by PatentIndex Score
14 records- 0193US6247479B1Washing/drying process apparatus and washing/drying process methodTOKYO ELECTRON LTD·Filed 1998·Granted Jun 19, 2001·165 cites·14 claims
- 0292US11978644B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Granted May 7, 2024·2 cites·8 claims
- 0387US7581335B2Substrate drying processing apparatus, method, and program recording mediumTOKYO ELECTRON LTD·Filed 2006·Granted Sep 1, 2009·18 cites·16 claims
- 0481US12183613B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Dec 31, 2024·1 cites·19 claims
- 0573US2025087515A1Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0665US11469114B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Oct 11, 2022·0 cites·9 claims
- 0762US8652344B2Liquid treatment method and storage systemTSURUSAKI KOTARO·Filed 2009·Granted Feb 18, 2014·2 cites·2 claims
- 0862US7836900B2Substrate processing system, substrate processing method, recording medium and softwareTOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·1 cites·6 claims
- 0954US11404294B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2020·Granted Aug 2, 2022·0 cites·18 claims
- 1050US12042815B2Substrate processing apparatus for supplying gas of water repellent agent and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 23, 2024·0 cites·5 claims
- 1147US11476130B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·16 claims
- 1246US11615971B2Substrate processing apparatus and processing liquid concentration methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 28, 2023·0 cites·16 claims
- 1346US2006060232A1Liquid treatment device and liquid treatment methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1446US2011011425A1Substrate processing system, substrate processing method, recording medium and softwareTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →