Substrate processing system, substrate processing method, recording medium and software

Abstract

A substrate processing system 1 comprises: a processing tank 3 for processing substrates W with a processing liquid; a drying unit 6 disposed above the processing tank 3; and a carrying mechanism 8 for carrying the substrates W between the processing tank 3 and the drying unit 6. A processing gas supply line 21 for supplying a processing gas into the drying unit 6 and inert gas supply lines 24 and 25 for supplying an inert gas into the drying unit 6 are connected to the drying unit 6. A first discharge line for discharging an atmosphere purged from the drying unit 6 and a second discharge line 27 for forcibly exhausting the drying unit 6 are connected to the drying unit 6.

1 . A substrate processing method to be carried out by a substrate processing system including a processing tank for processing substrates and a drying unit disposed above the processing tank, said substrate processing method comprising:
 a chemical processing step of chemically processing substrates with a chemical contained in the processing tank;   a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid; and   a drying step of drying the substrates by the drying unit;   wherein fresh air is supplied into the drying unit and the drying unit is exhausted of gases during the chemical processing step, and   an inert gas is supplied into the drying unit and the drying unit is exhausted at a discharge rate lower than that at which the drying unit is exhausted during the chemical processing step after the chemical contained in the processing tank has been replaced with the rinsing liquid.   
     
     
         2 . A substrate processing method to be carried out by a substrate processing system including a processing tank for processing substrates, a drying unit disposed above the processing tank, having an open end, and a top cover for covering the open end, said substrate processing method comprising:
 a loading step of opening the top cover and carrying substrates through the open end of the drying unit into the processing tank;   a chemical processing step of chemically processing the substrates with a chemical contained in the processing tank;   a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid; and   a drying step of drying the substrate by the drying unit with the open end closed by the top cover;   wherein the top cover is removed to open the open end of the drying unit and the drying unit is exhausted of gases during the chemical processing step, and   the open end of the drying unit is covered with the top cover, an inert gas is supplied into the drying unit and the drying unit is exhausted after the chemical contained in the processing tank has been replaced with the rinsing liquid.   
     
     
         3 . The substrate processing method according to  claim 2 , wherein
 a gap between the top cover and the open end during the chemical processing step is narrower than a gap between the top cover and the open end during the loading step.   
     
     
         4 . The substrate processing method according to  claim 2 , wherein
 after the chemical contained in the processing tank has been replaced with the rinsing liquid, the drying unit is exhausted at a discharge rate lower than that at which the drying unit is exhausted during the chemical processing step.   
     
     
         5 . A recording medium storing software to be executed by a control computer for controlling a substrate processing system, including a processing tank for processing substrates and a drying unit disposed above the processing tank, to make the substrate processing system carry out a substrate processing method comprising:
 a chemical processing step of chemically processing substrates with a chemical contained in the processing tank;   a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid; and   a drying step of drying the substrates by the drying unit;   wherein fresh air is supplied into the drying unit and the drying unit is exhausted of gases during the chemical processing step, and   after the chemical contained in the processing tank has been replaced with the rinsing liquid, an inert gas is supplied into the drying unit and the drying unit is exhausted at a discharge rate lower than that at which the drying unit is exhausted during the chemical processing step.   
     
     
         6 . A recording medium storing software to be executed by a control computer for controlling a substrate processing system, including a processing tank for processing substrates, and a drying unit disposed above the processing tank, having an open end, and provided with a top cover covering the open end, to make the substrate processing system carry out a substrate processing method comprising:
 a loading step of opening the top cover and carrying substrates through the open end of the drying unit into the processing tank;   a chemical processing step of chemically processing the substrates with a chemical contained in the processing tank;   a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid; and   a drying step of drying the substrates by the drying unit with the open end closed by the top cover;   wherein the top cover is removed to open the open end of the drying unit and the drying unit is exhausted of gases during the chemical processing step, and   after the chemical contained in the processing tank has been replaced with the rinsing liquid, the open end of the drying unit is covered with the top cover, an inert gas is supplied into the drying unit and the drying unit is exhausted.