Inventor · disambiguated record
Naoki Shindo
Also filed as: SHINDO NAOKI
50 granted patents·8 pending applications·682 citations·filing 1995–2025
98Inventor score
Top patents by PatentIndex Score
58 records- 0188US6729041B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted May 4, 2004·35 cites·12 claims
- 0287US7581335B2Substrate drying processing apparatus, method, and program recording mediumTOKYO ELECTRON LTD·Filed 2006·Granted Sep 1, 2009·18 cites·16 claims
- 0385US5845660ASubstrate washing and drying apparatus, substrate washing method, and substrate washing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Dec 8, 1998·84 cites·20 claims
- 0484US6001191ASubstrate washing method, substrate washing-drying method, substrate washing apparatus and substrate washing-drying apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Dec 14, 1999·76 cites·8 claims
- 0584US5730162AApparatus and method for washing substratesTOKYO ELECTRON LTD·Filed 1996·Granted Mar 24, 1998·67 cites·4 claims
- 0679US5817185AMethod for washing substratesTOKYO ELECTRON LTD·Filed 1997·Granted Oct 6, 1998·48 cites·7 claims
- 0778US10700166B2Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jun 30, 2020·4 cites·10 claims
- 0878US6869499B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Mar 22, 2005·15 cites·13 claims
- 0977US9768010B2Liquid treatment apparatusITO NORIHIRO·Filed 2012·Granted Sep 19, 2017·4 cites·13 claims
- 1077US6817368B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Nov 16, 2004·17 cites·4 claims
- 1177US2025343058A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1276US6158447ACleaning method and cleaning equipmentTOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·44 cites·16 claims
- 1375US8152928B2Substrate cleaning method, substrate cleaning system and program storage mediumWATANABE TSUKASA·Filed 2007·Granted Apr 10, 2012·5 cites·8 claims
- 1473US6318386B1Treatment apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 20, 2001·14 cites·4 claims
- 1573US5922138ALiquid treatment method and apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jul 13, 1999·36 cites·17 claims
- 1671US8303724B2Substrate processing method and non-transitory storage medium for carrying out such methodHIROSHIRO KOUKICHI·Filed 2011·Granted Nov 6, 2012·2 cites·10 claims
- 1771US6592678B1Cleaning method and cleaning equipmentTOKYO ELECTRON LTD·Filed 2000·Granted Jul 15, 2003·12 cites·4 claims
- 1870US6109278ALiquid treatment method and apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Aug 29, 2000·32 cites·23 claims
- 1969US8197606B2Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage mediumWATANABE TSUKASA·Filed 2010·Granted Jun 12, 2012·2 cites·14 claims
- 2067US6322761B1PCB decomposition reactorMITSUBISHI HEAVY IND INC·Filed 1999·Granted Nov 27, 2001·40 cites·7 claims
- 2166US9202731B2Liquid processing apparatus, liquid processing method, and recording medium having program for executing liquid processing method recorded thereinKASAI SHIGERU·Filed 2011·Granted Dec 1, 2015·2 cites·9 claims
- 2266US8083857B2Substrate cleaning method and substrate cleaning apparatusWATANABE TSUKASA·Filed 2008·Granted Dec 27, 2011·2 cites·12 claims
- 2365US12381094B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Aug 5, 2025·0 cites·7 claims
- 2465US6082381ATreatment apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jul 4, 2000·25 cites·11 claims
- 2564US8868370B2Sample analyzing system, sample analyzer and management apparatusSHINDO NAOKI·Filed 2011·Granted Oct 21, 2014·1 cites·18 claims
- 2663US9190311B2Liquid arm cleaning unit for substrate processing apparatusHIGASHIJIMA JIRO·Filed 2012·Granted Nov 17, 2015·1 cites·12 claims
- 2763US8015984B2Substrate processing apparatus including a drying mechanism using a fluid mixture of purified water and a volatile organic solventTOKYO ELECTRON LTD·Filed 2006·Granted Sep 13, 2011·1 cites·9 claims
- 2862US7836900B2Substrate processing system, substrate processing method, recording medium and softwareTOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·1 cites·6 claims
- 2962US5862823ASubstrate cleaning method and a substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jan 26, 1999·26 cites·11 claims
- 3061US8449684B2Substrate cleaning method, substrate cleaning system and program storage mediumWATANABE TSUKASA·Filed 2007·Granted May 28, 2013·1 cites·6 claims
- 3161US6293288B2Cleaning method and apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Sep 25, 2001·7 cites·12 claims
- 3260US12272541B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 3360US5823008ACold air supply unitKAJIMA CORP·Filed 1995·Granted Oct 20, 1998·26 cites·12 claims
- 3456US6203627B1Cleaning methodTOKYO ELECTRON LTD·Filed 1999·Granted Mar 20, 2001·18 cites·13 claims
- 3554US12283489B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 3654US9280642B2Method of managing clinical testing apparatus, clinical testing system, and maintenance management apparatusSUGA YUSUKE·Filed 2012·Granted Mar 8, 2016·1 cites·17 claims
- 3752US11764070B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Sep 19, 2023·0 cites·19 claims
- 3852US11335567B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 17, 2022·0 cites·16 claims
- 3952US9358588B2Substrate cleaning method, substrate cleaning system and program storage mediumTOKYO ELECTRON LTD·Filed 2012·Granted Jun 7, 2016·0 cites·13 claims
- 4052US8347901B2Substrate cleaning method, substrate cleaning system and program storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Jan 8, 2013·0 cites·3 claims
- 4151US7896973B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Mar 1, 2011·2 cites·7 claims
- 4251US7410543B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Aug 12, 2008·2 cites·6 claims
- 4350US2025183047A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4447US10535528B2Method of forming titanium oxide film and method of forming hard maskTOKYO ELECTRON LTD·Filed 2017·Granted Jan 14, 2020·0 cites·13 claims
- 4546US2011011425A1Substrate processing system, substrate processing method, recording medium and softwareTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 4644US7897498B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·0 cites·9 claims
- 4744US2021090912A1Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 4844US2014261570A1Substrate liquid processing method, substrate liquid processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 4943US9177838B2Liquid process apparatus and liquid process methodITO NORIHIRO·Filed 2012·Granted Nov 3, 2015·0 cites·13 claims
- 5042US6949231B2PCB decomposition reactorMITSUBISHI HEAVY IND LTD·Filed 2001·Granted Sep 27, 2005·0 cites·3 claims
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →