Inventor · disambiguated record
Krishna Nittala
Also filed as: NITTALA KRISHNA
20 granted patents·2 pending applications·31 citations·filing 2014–2024
90Inventor score
Top patents by PatentIndex Score
22 records- 0194US10490436B2Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide filmsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 26, 2019·10 cites·16 claims
- 0292US11694902B2Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layersAPPLIED MATERIALS INC·Filed 2021·Granted Jul 4, 2023·2 cites·18 claims
- 0392US11618949B2Methods to reduce material surface roughnessAPPLIED MATERIALS INC·Filed 2020·Granted Apr 4, 2023·2 cites·20 claims
- 0491US9245739B2Low-K oxide deposition by hydrolysis and condensationLAM RES CORP·Filed 2014·Granted Jan 26, 2016·14 cites·20 claims
- 0590US11721545B2Method of using dual frequency RF power in a process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Aug 8, 2023·2 cites·16 claims
- 0682US12205818B2Boron concentration tunability in boron-silicon filmsAPPLIED MATERIALS INC·Filed 2024·Granted Jan 21, 2025·0 cites·18 claims
- 0782US11939674B2Methods to reduce material surface roughnessAPPLIED MATERIALS INC·Filed 2023·Granted Mar 26, 2024·0 cites·20 claims
- 0879US2025112046A1Boron concentration tunability in boron-silicon filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0977US12131913B2Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layersAPPLIED MATERIALS INC·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 1077US12106958B2Method of using dual frequency RF power in a process chamberAPPLIED MATERIALS INC·Filed 2023·Granted Oct 1, 2024·0 cites·20 claims
- 1175US11508611B2Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide filmsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 22, 2022·1 cites·20 claims
- 1269US11961739B2Boron concentration tunability in boron-silicon filmsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 16, 2024·0 cites·8 claims
- 1364US2023146981A1Hydrogen management in plasma deposited filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1460US11562902B2Hydrogen management in plasma deposited filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·17 claims
- 1557US12469700B2Ion implantation for reduced hydrogen incorporation in amorphous siliconAPPLIED MATERIALS INC·Filed 2021·Granted Nov 11, 2025·0 cites·20 claims
- 1656US12334358B2Integration processes utilizing boron-doped silicon materialsAPPLIED MATERIALS INC·Filed 2021·Granted Jun 17, 2025·0 cites·20 claims
- 1754US11443919B2Film formation via pulsed RF plasmaAPPLIED MATERIALS INC·Filed 2020·Granted Sep 13, 2022·0 cites·16 claims
- 1854US11170990B2Polysilicon linersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·11 claims
- 1952US11676813B2Doping semiconductor filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 13, 2023·0 cites·18 claims
- 2052US11532525B2Controlling concentration profiles for deposited films using machine learningAPPLIED MATERIALS INC·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 2150US11827514B2Amorphous silicon-based films resistant to crystallizationAPPLIED MATERIALS INC·Filed 2020·Granted Nov 28, 2023·0 cites·14 claims
- 2250US11421324B2Hardmasks and processes for forming hardmasks by plasma-enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Aug 23, 2022·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →