Inventor · disambiguated record
Kunihiko Hinata
Also filed as: HINATA KUNIHIKO
13 granted patents·4 pending applications·811 citations·filing 1998–2020
94Inventor score
Technology areasH10P
Top patents by PatentIndex Score
17 records- 0198US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0297US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0397US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0495US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 0593US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 0689US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 0787US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 0887US6159862ASemiconductor processing method and system using C5 F8TOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·86 cites·12 claims
- 0984US7882800B2Ring mechanism, and plasma processing device using the ring mechanismTOKYO ELECTRON LTD·Filed 2002·Granted Feb 8, 2011·31 cites·32 claims
- 1083US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 1180US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 1274US2021082669A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1361US6465359B2Etchant for use in a semiconductor processing method and systemTOKYO ELECTRON LTD·Filed 1999·Granted Oct 15, 2002·22 cites·5 claims
- 1459US2014326409A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1558US2016358753A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1656US10529539B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 7, 2020·0 cites·8 claims
- 1749US2011214815A1Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →