Inventor · disambiguated record
Kurt E. Wampler
Also filed as: WAMPLER KURT · WAMPLER KURT E
27 granted patents·1,610 citations·filing 1995–2019
97Inventor score
Top patents by PatentIndex Score
27 records- 0198US7175940B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2002·Granted Feb 13, 2007·365 cites·20 claims
- 0298US5821014AOptical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a maskMICROUNITY SYSTEMS ENG·Filed 1997·Granted Oct 13, 1998·291 cites·25 claims
- 0398US5663893AMethod for generating proximity correction features for a lithographic mask patternMICROUNITY SYSTEMS ENG·Filed 1995·Granted Sep 2, 1997·257 cites·15 claims
- 0496US6114071AMethod of fine feature edge tuning with optically-halftoned maskASML MASKTOOLS BV·Filed 1998·Granted Sep 5, 2000·285 cites·9 claims
- 0594US6670081B2Optical proximity correction method utilizing serifs having variable dimensionsASML MASKTOOLS BV·Filed 2001·Granted Dec 30, 2003·61 cites·13 claims
- 0693US7247574B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jul 24, 2007·47 cites·22 claims
- 0792US6623895B2Hybrid phase-shift maskASML MASKTOOLS BV·Filed 2001·Granted Sep 23, 2003·38 cites·23 claims
- 0890US7820341B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2007·Granted Oct 26, 2010·12 cites·24 claims
- 0990US7138212B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2003·Granted Nov 21, 2006·39 cites·21 claims
- 1089US6851103B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2003·Granted Feb 1, 2005·44 cites·18 claims
- 1188US7666554B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2006·Granted Feb 23, 2010·11 cites·18 claims
- 1287US7774736B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2007·Granted Aug 10, 2010·8 cites·20 claims
- 1386US7550235B2Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jun 23, 2009·25 cites·12 claims
- 1483US7892707B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2009·Granted Feb 22, 2011·4 cites·26 claims
- 1583US6482555B2Method of patterning sub-0.25λ line features with high transmission, “attenuated” phase shift masksASML MASKTOOLS BV·Filed 2001·Granted Nov 19, 2002·21 cites·28 claims
- 1682US7485396B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2008·Granted Feb 3, 2009·4 cites·12 claims
- 1782US7434195B2Method for performing full-chip manufacturing reliability checking and correctionASML MASKTOOLS BV·Filed 2005·Granted Oct 7, 2008·13 cites·11 claims
- 1882US6312854B1Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masksASML MASKTOOLS BV·Filed 1999·Granted Nov 6, 2001·44 cites·32 claims
- 1979US7354681B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2004·Granted Apr 8, 2008·11 cites·15 claims
- 2078US7549140B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2005·Granted Jun 16, 2009·5 cites·13 claims
- 2175US8039180B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2011·Granted Oct 18, 2011·1 cites·24 claims
- 2275US7376930B2Method, program product and apparatus for generating assist features utilizing an image field mapASML MASKTOOLS BV·Filed 2004·Granted May 20, 2008·13 cites·16 claims
- 2375US6835510B2Hybrid phase-shift maskASML MASKTOOLS BV·Filed 2003·Granted Dec 28, 2004·11 cites·33 claims
- 2464US11022894B2Rule-based deployment of assist featuresASML NETHERLANDS BV·Filed 2019·Granted Jun 1, 2021·0 cites·22 claims
- 2559US7985515B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2009·Granted Jul 26, 2011·0 cites·20 claims
- 2655US10331039B2Rule-based deployment of assist featuresASML NETHERLANDS BV·Filed 2015·Granted Jun 25, 2019·0 cites·20 claims
- 2747US7998355B2CPL mask and a method and program product for generating the sameASML MASKTOOLS BV·Filed 2007·Granted Aug 16, 2011·0 cites·16 claims
Join the waitlist — get patent alerts
Get an alert when Kurt E. Wampler files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →