Inventor · disambiguated record
Kyoko Ikeda
Also filed as: IKEDA KYOKO
18 granted patents·9 pending applications·80 citations·filing 2000–2025
92Inventor score
Files withTOKYO ELECTRON LTD20FUJI PHOTO FILM CO LTD2OTSUKI HAYASHI2FUJIFILM CORP1UNIV CORPORATION FOR ATMOSPHERIC RESEARCH1
Top patents by PatentIndex Score
27 records- 0191US7511814B2Particle-measuring system and particle-measuring methodTOKYO ELECTRON LTD·Filed 2007·Granted Mar 31, 2009·10 cites·29 claims
- 0289US7667840B2Particle-measuring system and particle-measuring methodTOKYO ELECTRON LTD·Filed 2007·Granted Feb 23, 2010·9 cites·36 claims
- 0388US7931945B2Film forming methodTOKYO ELECTRON LTD·Filed 2007·Granted Apr 26, 2011·8 cites·10 claims
- 0485US7894059B2Film formation processing apparatus and method for determining an end-point of a cleaning processTOKYO ELECTRON LTD·Filed 2007·Granted Feb 22, 2011·6 cites·16 claims
- 0580US10786837B2Method for cleaning chamber of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 29, 2020·3 cites·12 claims
- 0680US6532069B1Particle-measuring system and particle-measuring methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 11, 2003·25 cites·9 claims
- 0776US8100147B2Particle-measuring system and particle-measuring methodOTSUKI HAYASHI·Filed 2007·Granted Jan 24, 2012·4 cites·13 claims
- 0873US7515264B2Particle-measuring system and particle-measuring methodTOKYO ELECTRON LTD·Filed 2002·Granted Apr 7, 2009·9 cites·20 claims
- 0970US10870916B2Gas supply member and gas processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Dec 22, 2020·1 cites·7 claims
- 1068US11865590B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·0 cites·4 claims
- 1164US9343295B2Vaporizing unit, film forming apparatus, film forming method, computer program and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted May 17, 2016·1 cites·6 claims
- 1258US11504751B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2019·Granted Nov 22, 2022·0 cites·4 claims
- 1356US7290042B2Server apparatus and systemFUJIFILM CORP·Filed 2003·Granted Oct 30, 2007·4 cites·16 claims
- 1456US2025223700A1Cooling device, substrate processing apparatus, and cooling methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1554US11281116B2Substrate stage and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Mar 22, 2022·0 cites·6 claims
- 1652US11517943B2Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 6, 2022·0 cites·16 claims
- 1751US2010297346A1Vaporizing unit, film forming apparatus, film forming method, computer program and storage mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1848US2010139565A1Particle-measuring system and particle-measuring methodOTSUKI HAYASHI·Filed 2010·Application pending·0 cites
- 1944US10302816B2Method for lightning forecasting and alert systemUNIV CORPORATION FOR ATMOSPHERIC RESEARCH·Filed 2014·Granted May 28, 2019·0 cites·21 claims
- 2044US2006238827A1Image processing apparatus, image processing system, and image processing program storage mediumFUJI PHOTO FILM CO LTD·Filed 2006·Application pending·0 cites
- 2144US2020126818A1Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2242US2007022954A1Gas treatment device and heat readiting methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2342US2005190388A1Color conversion system, color conversion apparatus and color conversion program storage mediumFUJI PHOTO FILM CO LTD·Filed 2005·Application pending·0 cites
- 2438US11761075B2Substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 19, 2023·0 cites·32 claims
- 2537US2017153172A1Particle concentration mechanism, particle measuring device, and substrate processing apparatus including particle measuring deviceTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2636US9939200B2Substrate transfer system and heat treatment apparatus using sameTOKYO ELECTRON LTD·Filed 2015·Granted Apr 10, 2018·0 cites·14 claims
- 2736US2002062790A1Processing apparatus and processing systemFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →