Inventor · disambiguated record
Laksheswar Kalita
Also filed as: KALITA LAKSHESWAR
15 granted patents·10 pending applications·129 citations·filing 2014–2025
89Inventor score
Files withAPPLIED MATERIALS INC25
Top patents by PatentIndex Score
25 records- 0196US11515195B2Semiconductor chamber components with high-performance coatingAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·6 cites·20 claims
- 0296US9903020B2Generation of compact alumina passivation layers on aluminum plasma equipment componentsAPPLIED MATERIALS INC·Filed 2014·Granted Feb 27, 2018·108 cites·5 claims
- 0395US11834744B2Ceramic showerheads with conductive electrodesAPPLIED MATERIALS INC·Filed 2023·Granted Dec 5, 2023·2 cites·20 claims
- 0494US10755900B2Multi-layer plasma erosion protection for chamber componentsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 25, 2020·7 cites·18 claims
- 0593US11562890B2Corrosion resistant ground shield of processing chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jan 24, 2023·4 cites·20 claims
- 0680US2024352589A1ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PROCESS CHAMBER COMPONENTSAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0777US2025299930A1Semiconductor chamber components with advanced coating techniquesAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0875US10920319B2Ceramic showerheads with conductive electrodesAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·1 cites·14 claims
- 0974US12406832B2Semiconductor chamber components with advanced dual layer nickel-containing coatingsAPPLIED MATERIALS INC·Filed 2023·Granted Sep 2, 2025·0 cites·20 claims
- 1074US12362150B2Semiconductor chamber components with advanced coating techniquesAPPLIED MATERIALS INC·Filed 2023·Granted Jul 15, 2025·0 cites·15 claims
- 1171US12512361B2Semiconductor chamber components with high-performance coatingAPPLIED MATERIALS INC·Filed 2022·Granted Dec 30, 2025·0 cites·18 claims
- 1271US11591693B2Ceramic showerheads with conductive electrodesAPPLIED MATERIALS INC·Filed 2021·Granted Feb 28, 2023·0 cites·6 claims
- 1370US2023103643A1ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PROCESS CHAMBER COMPONENTSAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1468US10233554B2Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·1 cites·19 claims
- 1568US2023116437A1Semiconductor chamber coatings and processesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1663US2025361594A1Method of coating a substrate including a multi-layer coatingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1760US11557464B2Semiconductor chamber coatings and processesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 17, 2023·0 cites·5 claims
- 1854US10253406B2Method for forming yttrium oxide on semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·0 cites·19 claims
- 1952US10407789B2Uniform crack-free aluminum deposition by two step aluminum electroplating processAPPLIED MATERIALS INC·Filed 2017·Granted Sep 10, 2019·0 cites·14 claims
- 2051US2023290616A1Semiconductor chamber components with multi-layer coatingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2151US2019323127A1Texturing and plating nickel on aluminum process chamber componentsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2248US2021005435A1Methods, apparatus, and systems for processing a substrateAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2345US11715625B2Semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Aug 1, 2023·0 cites·18 claims
- 2443US2019304756A1Semiconductor chamber coatings and processesAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2540US2016258064A1Barrier anodization methods to develop aluminum oxide layer for plasma equipment componentsAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →