Inventor · disambiguated record

Lai Zhao

Also filed as: ZHAO LAI

26 granted patents·15 pending applications·12 citations·filing 2013–2024

92Inventor score

Technology areasH10P C23C H10D H01J B24B

Files withAPPLIED MATERIALS INC41

Top patents by PatentIndex Score

41 records

0196US11742362B2Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2021·Granted Aug 29, 2023·2 cites·14 claims
0286US2024347551A1Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
0385US12080725B2Hybrid high-K dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2023·Granted Sep 3, 2024·0 cites·20 claims
0482US12148766B2High-K dielectric materials comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
0582US12021152B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2023·Granted Jun 25, 2024·0 cites·20 claims
0680US9818606B2Amorphous silicon thickness uniformity improved by process diluted with hydrogen and argon gas mixtureAPPLIED MATERIALS INC·Filed 2014·Granted Nov 14, 2017·4 cites·18 claims
0778US11670722B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2022·Granted Jun 6, 2023·0 cites·20 claims
0877US10883174B2Gas diffuser mounting plate for reduced particle generationAPPLIED MATERIALS INC·Filed 2018·Granted Jan 5, 2021·2 cites·20 claims
0977US9299558B2Run-to-run stability of film depositionAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·3 cites·17 claims
1076US11145683B2Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2017·Granted Oct 12, 2021·1 cites·11 claims
1174US11894396B2High-K dielectric materials comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·20 claims
1272US2025046578A1Deposition chamber system diffuser with increased power efficiencyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
1371US11380801B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2020·Granted Jul 5, 2022·0 cites·12 claims
1469US10927461B2Gas diffuser support structure for reduced particle generationAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·0 cites·20 claims
1567US11600642B2Layer stack for display applicationsAPPLIED MATERIALS INC·Filed 2021·Granted Mar 7, 2023·0 cites·20 claims
1666US2025113718A1Cyclic peald/pecvd thin film encapsulation barrierAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
1764US11895872B2Thin film transistor with small storage capacitor with metal oxide switchAPPLIED MATERIALS INC·Filed 2021·Granted Feb 6, 2024·0 cites·12 claims
1863US2024344198A1Backing plate and diffuser plate assemblyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
1962US10804408B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2018·Granted Oct 13, 2020·0 cites·13 claims
2062US2025008823A1Barrier encapsulation for organic light-emitting diodesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
2161US12136538B2Deposition chamber system diffuser with increased power efficiencyAPPLIED MATERIALS INC·Filed 2021·Granted Nov 5, 2024·0 cites·15 claims
2261US11123837B2Method of removal of sharp corners from diffuser plateAPPLIED MATERIALS INC·Filed 2017·Granted Sep 21, 2021·0 cites·23 claims
2360US11101338B2Thin film transistor with small storage capacitor with metal oxide switchAPPLIED MATERIALS INC·Filed 2019·Granted Aug 24, 2021·0 cites·16 claims
2459US2018026055A1Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
2558US11239258B2High-k dielectric materials comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2017·Granted Feb 1, 2022·0 cites·9 claims
2657US10923327B2Chamber linerAPPLIED MATERIALS INC·Filed 2018·Granted Feb 16, 2021·0 cites·20 claims
2757US2020083052A1High-k gate insulator for a thin-film transistorAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
2855US11049887B2Layer stack for display applicationsAPPLIED MATERIALS INC·Filed 2018·Granted Jun 29, 2021·0 cites·20 claims
2952US10748759B2Methods for improved silicon nitride passivation filmsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 18, 2020·0 cites·13 claims
3051US2019206691A1High-k gate insulator for a thin-film transistorAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
3150US10697063B2Corner spoiler for improving profile uniformityAPPLIED MATERIALS INC·Filed 2015·Granted Jun 30, 2020·0 cites·10 claims
3249US2018340257A1Diffuser for uniformity improvement in display pecvd applicationsAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
3347US9048099B2Multi-layer amorphous silicon structure with improved poly-silicon quality after excimer laser annealAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2015·0 cites·20 claims
3447US2018090300A1Diffuser With Corner HCGAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
3544US12076763B2Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursorAPPLIED MATERIALS INC·Filed 2018·Granted Sep 3, 2024·0 cites·20 claims
3644US11773489B2Gas confiner assembly for eliminating shadow frameAPPLIED MATERIALS INC·Filed 2015·Granted Oct 3, 2023·0 cites·19 claims
3741US2024194479A1Methods and applications of novel amorphous high-k metal-oxide dielectrics by super-cycle atomic layer depositionAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
3839US2020098549A1Heat conductive spacer for plasma processing chamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
3938US2018347037A1Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursorAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
4038US2018350571A1Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursorAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
4135US2017092492A1Methods for forming a silicon containing dielectric film using a gas mixture with ar gas dilusionAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →