Inventor · disambiguated record
Lee Chen
Also filed as: CHEN LEE · CHEN LEE YEH
92 granted patents·20 pending applications·1,637 citations·filing 2000–2022
99Inventor score
Top patents by PatentIndex Score
112 records- 0198US9799494B2Energetic negative ion impact ionization plasmaTOKYO ELECTRON LTD·Filed 2016·Granted Oct 24, 2017·42 cites·28 claims
- 0298US8747610B2Plasma source pumping and gas injection baffleCHEN LEE·Filed 2012·Granted Jun 10, 2014·75 cites·20 claims
- 0398US8415884B2Stable surface wave plasma sourceCHEN LEE·Filed 2009·Granted Apr 9, 2013·240 cites·20 claims
- 0497US9209032B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2014·Granted Dec 8, 2015·42 cites·10 claims
- 0597US8083961B2Method and system for controlling the uniformity of a ballistic electron beam by RF modulationCHEN LEE·Filed 2006·Granted Dec 27, 2011·59 cites·17 claims
- 0697US8038834B2Method and system for controlling radical distributionTOKYO ELECTRON LTD·Filed 2010·Granted Oct 18, 2011·18 cites·15 claims
- 0797US7138767B2Surface wave plasma processing system and method of usingTOKYO ELECTRON LTD·Filed 2004·Granted Nov 21, 2006·342 cites·26 claims
- 0896US7777179B2Two-grid ion energy analyzer and methods of manufacturing and operatingTOKYO ELECTRON LTD·Filed 2008·Granted Aug 17, 2010·52 cites·18 claims
- 0995US8460567B2Method and system for etching a MEM deviceCHEN LEE·Filed 2008·Granted Jun 11, 2013·42 cites·16 claims
- 1095US7993937B2DC and RF hybrid processing systemTOKYO ELECTRON LTD·Filed 2010·Granted Aug 9, 2011·21 cites·19 claims
- 1195US6852584B1Method of trimming a gate electrode structureTOKYO ELECTRON LTD·Filed 2004·Granted Feb 8, 2005·134 cites·34 claims
- 1294US7875859B2Ion energy analyzer and methods of manufacturing and operatingTOKYO ELECTRON LTD·Filed 2008·Granted Jan 25, 2011·28 cites·11 claims
- 1394US7718030B2Method and system for controlling radical distributionTOKYO ELECTRON LTD·Filed 2005·Granted May 18, 2010·20 cites·17 claims
- 1492US8883024B2Using vacuum ultra-violet (VUV) data in radio frequency (RF) sourcesCHEN LEE·Filed 2011·Granted Nov 11, 2014·11 cites·19 claims
- 1591US8877080B2Using vacuum ultra-violet (VUV) data in microwave sourcesCHEN LEE·Filed 2011·Granted Nov 4, 2014·10 cites·17 claims
- 1690US8968588B2Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatusZHAO JIANPING·Filed 2012·Granted Mar 3, 2015·23 cites·13 claims
- 1789US8816281B2Ion energy analyzer and methods of manufacturing the sameFUNK MERRITT·Filed 2012·Granted Aug 26, 2014·16 cites·20 claims
- 1889US8343371B2Apparatus and method for improving photoresist properties using a quasi-neutral beamTOKYO ELECTRON LTD·Filed 2010·Granted Jan 1, 2013·10 cites·2 claims
- 1989US7998307B2Electron beam enhanced surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2006·Granted Aug 16, 2011·14 cites·19 claims
- 2089US7829469B2Method and system for uniformity control in ballistic electron beam enhanced plasma processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Nov 9, 2010·13 cites·16 claims
- 2189US7781340B2Method and system for etching high-k dielectric materialsTOKYO ELECTRON LTD·Filed 2007·Granted Aug 24, 2010·12 cites·23 claims
- 2289US7713758B2Method and apparatus for optimizing a gate channelTOKYO ELECTON LTD·Filed 2007·Granted May 11, 2010·22 cites·20 claims
- 2388US9087677B2Methods of electrical signaling in an ion energy analyzerFUNK MERRITT·Filed 2012·Granted Jul 21, 2015·8 cites·20 claims
- 2488US7939450B2Method and apparatus for spacer-optimization (S-O)TOKYO ELECTRON LTD·Filed 2007·Granted May 10, 2011·13 cites·20 claims
- 2588US7938081B2Radial line slot antenna having a conductive layerTOKYO ELECTRON LTD·Filed 2006·Granted May 10, 2011·12 cites·19 claims
- 2688US7732759B2Multi-plasma neutral beam source and method of operatingTOKYO ELECTRON LTD·Filed 2008·Granted Jun 8, 2010·28 cites·25 claims
- 2788US7396431B2Plasma processing system for treating a substrateTOKYO ELECTRON LTD·Filed 2004·Granted Jul 8, 2008·50 cites·60 claims
- 2887US8847159B2Ion energy analyzerCHEN LEE·Filed 2012·Granted Sep 30, 2014·6 cites·25 claims
- 2985US9396900B2Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma propertiesTOKYO ELECTRON LTD·Filed 2012·Granted Jul 19, 2016·10 cites·18 claims
- 3085US7899637B2Method and apparatus for creating a gate optimization evaluation libraryTOKYO ELECTRON LTD·Filed 2007·Granted Mar 1, 2011·11 cites·15 claims
- 3185US7765077B2Method and apparatus for creating a Spacer-Optimization (S-O) libraryTOKYO ELECTRON LTD·Filed 2007·Granted Jul 27, 2010·13 cites·16 claims
- 3285US6809310B2Accelerated ion beam generatorFiled 2003·Granted Oct 26, 2004·42 cites·15 claims
- 3384US8486798B1Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted Jul 16, 2013·6 cites·20 claims
- 3483US10002744B2System and method for controlling plasma densityTOKYO ELECTRON LTD·Filed 2014·Granted Jun 19, 2018·5 cites·10 claims
- 3583US9431218B2Scalable and uniformity controllable diffusion plasma sourceTOKYO ELECTRON LTD·Filed 2014·Granted Aug 30, 2016·5 cites·15 claims
- 3681US7449414B2Method of treating a mask layer prior to performing an etching processTOKYO ELECTRON LTD·Filed 2006·Granted Nov 11, 2008·7 cites·21 claims
- 3780US8721833B2Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted May 13, 2014·4 cites·15 claims
- 3880US8323521B2Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniquesZHAO JIANPING·Filed 2010·Granted Dec 4, 2012·5 cites·20 claims
- 3979US10734200B2Mono-energetic neutral beam activated chemical processing system and method of usingTOKYO ELECTRON LTD·Filed 2016·Granted Aug 4, 2020·2 cites·20 claims
- 4079US9288890B1Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasmaTOKYO ELECTRON LTD·Filed 2014·Granted Mar 15, 2016·5 cites·20 claims
- 4178US11728135B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2015·Granted Aug 15, 2023·2 cites·19 claims
- 4278US7988813B2Dynamic control of process chemistry for improved within-substrate process uniformityTOKYO ELECTRON LTD·Filed 2007·Granted Aug 2, 2011·9 cites·8 claims
- 4378US6512333B2RF-powered plasma accelerator/homogenizerFiled 2001·Granted Jan 28, 2003·31 cites·11 claims
- 4477US8669705B2Stable surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2013·Granted Mar 11, 2014·3 cites·17 claims
- 4577US7744720B2Suppressor of hollow cathode discharge in a shower head fluid distribution systemTOKYO ELECTRON LTD·Filed 2007·Granted Jun 29, 2010·4 cites·6 claims
- 4677US7674636B2Dynamic temperature backside gas control for improved within-substrate process uniformityTOKYO ELECTRON LTD·Filed 2007·Granted Mar 9, 2010·5 cites·24 claims
- 4776US8409459B2Hollow cathode device and method for using the device to control the uniformity of a plasma processDENPOH KAZUKI·Filed 2008·Granted Apr 2, 2013·6 cites·4 claims
- 4875US9520275B2Mono-energetic neutral beam activated chemical processing system and method of usingCHEN LEE·Filed 2008·Granted Dec 13, 2016·4 cites·8 claims
- 4975US7202169B2Method and system for etching high-k dielectric materialsTOKYO ELECTRON LTD·Filed 2003·Granted Apr 10, 2007·14 cites·30 claims
- 5074US7754615B2Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC currentTOKYO ELECTRON LTD·Filed 2006·Granted Jul 13, 2010·4 cites·12 claims
Showing the top 50 of 112 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →