Inventor · disambiguated record
Leonid Dorf
Also filed as: DORF LEONID · DORF LEONID A
56 granted patents·19 pending applications·914 citations·filing 2009–2024
99Inventor score
Top patents by PatentIndex Score
75 records- 0199US10312048B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·48 cites·19 claims
- 0298US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 0398US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 0498US11728124B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·5 cites·13 claims
- 0598US11699572B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·8 cites·30 claims
- 0698US11587766B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·4 cites·15 claims
- 0798US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 0898US11284500B2Method of controlling ion energy distribution using a pulse generatorAPPLIED MATERIALS INC·Filed 2020·Granted Mar 22, 2022·21 cites·20 claims
- 0998US11069504B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2020·Granted Jul 20, 2021·7 cites·21 claims
- 1098US10923321B2Apparatus and method of generating a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 16, 2021·52 cites·25 claims
- 1198US10916408B2Apparatus and method of forming plasma using a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 9, 2021·54 cites·26 claims
- 1298US10791617B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2020·Granted Sep 29, 2020·62 cites·20 claims
- 1398US10685807B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2019·Granted Jun 16, 2020·38 cites·16 claims
- 1498US10555412B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2018·Granted Feb 4, 2020·67 cites·32 claims
- 1598US10448495B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·63 cites·15 claims
- 1698US10448494B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·68 cites·30 claims
- 1798US10103010B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Oct 16, 2018·34 cites·10 claims
- 1898US9947517B1Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·48 cites·20 claims
- 1997US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 2097US11948780B2Automatic electrostatic chuck bias compensation during plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Apr 2, 2024·7 cites·15 claims
- 2197US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 2297US10923320B2System for tunable workpiece biasing in a plasma reactorAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·33 cites·20 claims
- 2397US10373804B2System for tunable workpiece biasing in a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·87 cites·18 claims
- 2496US11791138B2Automatic electrostatic chuck bias compensation during plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 17, 2023·4 cites·26 claims
- 2596US10991556B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·11 cites·20 claims
- 2696US10553404B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 4, 2020·13 cites·20 claims
- 2796US10504702B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·14 cites·20 claims
- 2896US10475626B2Ion-ion plasma atomic layer etch process and reactorAPPLIED MATERIALS INC·Filed 2015·Granted Nov 12, 2019·12 cites·14 claims
- 2996US8313664B2Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamberCHEN ZHIGANG·Filed 2009·Granted Nov 20, 2012·44 cites·8 claims
- 3094US11476145B2Automatic ESC bias compensation when using pulsed DC biasAPPLIED MATERIALS INC·Filed 2018·Granted Oct 18, 2022·10 cites·20 claims
- 3194US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 3290US8920597B2Symmetric VHF source for a plasma reactorRAMASWAMY KARTIK·Filed 2011·Granted Dec 30, 2014·9 cites·8 claims
- 3388US11043361B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·3 cites·20 claims
- 3487US2024395502A1Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3586US11508554B2High voltage filter assemblyAPPLIED MATERIALS INC·Filed 2019·Granted Nov 22, 2022·4 cites·16 claims
- 3686US10131994B2Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flowAPPLIED MATERIALS INC·Filed 2012·Granted Nov 20, 2018·4 cites·13 claims
- 3786US9896769B2Inductively coupled plasma source with multiple dielectric windows and window-supporting structureAPPLIED MATERIALS INC·Filed 2012·Granted Feb 20, 2018·4 cites·15 claims
- 3886US9824862B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Nov 21, 2017·4 cites·6 claims
- 3985US11101113B2Ion-ion plasma atomic layer etch processAPPLIED MATERIALS INC·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 4085US9564297B2Electron beam plasma source with remote radical sourceAPPLIED MATERIALS INC·Filed 2014·Granted Feb 7, 2017·6 cites·20 claims
- 4185US9443700B2Electron beam plasma source with segmented suppression electrode for uniform plasma generationAPPLIED MATERIALS INC·Filed 2014·Granted Sep 13, 2016·6 cites·14 claims
- 4284US12057292B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2023·Granted Aug 6, 2024·0 cites·20 claims
- 4384US11935724B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2023·Granted Mar 19, 2024·0 cites·15 claims
- 4484US9111722B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Aug 18, 2015·6 cites·20 claims
- 4580US9082591B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·4 cites·20 claims
- 4679US9799491B2Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etchingAPPLIED MATERIALS INC·Filed 2016·Granted Oct 24, 2017·2 cites·7 claims
- 4774US12435963B2Apparatus and method for controlling edge ring variationAPPLIED MATERIALS INC·Filed 2023·Granted Oct 7, 2025·0 cites·8 claims
- 4874US9378941B2Interface treatment of semiconductor surfaces with high density low energy plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Jun 28, 2016·3 cites·11 claims
- 4971US9269546B2Plasma reactor with electron beam plasma source having a uniform magnetic fieldAPPLIED MATERIALS INC·Filed 2013·Granted Feb 23, 2016·2 cites·17 claims
- 5066US11668553B2Apparatus and method for controlling edge ring variationAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·0 cites·16 claims
Showing the top 50 of 75 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →