Inventor · disambiguated record
Lior Huli
Also filed as: HULI LIOR
21 granted patents·8 pending applications·28 citations·filing 2013–2023
91Inventor score
Files withTOKYO ELECTRON LTD29
Top patents by PatentIndex Score
29 records- 0190US10770294B2Selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistanceTOKYO ELECTRON LTD·Filed 2019·Granted Sep 8, 2020·6 cites·21 claims
- 0289US11482454B2Methods for forming self-aligned contacts using spin-on silicon carbideTOKYO ELECTRON LTD·Filed 2021·Granted Oct 25, 2022·2 cites·20 claims
- 0380US10403501B2High-purity dispense systemTOKYO ELECTRON LTD·Filed 2017·Granted Sep 3, 2019·3 cites·18 claims
- 0480US9711419B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·3 cites·16 claims
- 0579US9281251B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2014·Granted Mar 8, 2016·3 cites·19 claims
- 0678US9991133B2Method for etch-based planarization of a substrateTOKYO ELECTRON LTD·Filed 2017·Granted Jun 5, 2018·3 cites·20 claims
- 0778US9791779B2EUV resist etch durability improvement and pattern collapse mitigationTOKYO ELECTRON LTD·Filed 2015·Granted Oct 17, 2017·3 cites·21 claims
- 0874US8975009B2Track processing to remove organic films in directed self-assembly chemo-epitaxy applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Mar 10, 2015·3 cites·16 claims
- 0973US12393121B2Point-of-use blending of rinse solutions for EUV processing to mitigate pattern collapseTOKYO ELECTRON LTD·Filed 2023·Granted Aug 19, 2025·0 cites·13 claims
- 1068US12080599B2Methods for forming self-aligned contacts using spin-on silicon carbideTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·20 claims
- 1167US10141183B2Methods of spin-on deposition of metal oxidesTOKYO ELECTRON LTD·Filed 2017·Granted Nov 27, 2018·1 cites·16 claims
- 1264US9086631B2EUV resist sensitivity reductionTOKYO ELECTRON LTD·Filed 2013·Granted Jul 21, 2015·1 cites·19 claims
- 1364US2025093778A1Method for area selective deposition on extreme ultra-violet (euv) photoresistsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1463US12216400B2Directed self-assemblyTOKYO ELECTRON LTD·Filed 2021·Granted Feb 4, 2025·0 cites·20 claims
- 1559US12406887B2Selective film formation using a self-assembled monolayerTOKYO ELECTRON LTD·Filed 2022·Granted Sep 2, 2025·0 cites·20 claims
- 1658US11762297B2Point-of-use blending of rinse solutions to mitigate pattern collapseTOKYO ELECTRON LTD·Filed 2019·Granted Sep 19, 2023·0 cites·10 claims
- 1758US11383211B2Point-of-use dynamic concentration delivery system with high flow and high uniformityTOKYO ELECTRON LTD·Filed 2019·Granted Jul 12, 2022·0 cites·20 claims
- 1858US2025149335A1Method to pattern a semiconductor substrate using a multilayer photoresist film stackTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1956US12193231B2Fabricating three-dimensional semiconductor structuresTOKYO ELECTRON LTD·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 2056US2025013153A1Method of preventing pattern collapseTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2153US10685857B2Dispense nozzle with a shielding deviceTOKYO ELECTRON LTD·Filed 2018·Granted Jun 16, 2020·0 cites·8 claims
- 2252US2023259030A1Providing a barrier layer for photoresist processingTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2349US2022334485A1Point of Use Solvent Mixing for Film RemovalTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2448US2023078946A1Hybrid Development of EUV ResistsTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2547US2017110345A1Dispense nozzle with a shielding deviceTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2647US2016141169A1Substrate backside texturingTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2745US11243465B2Plasma treatment method to enhance surface adhesion for lithographyTOKYO ELECTRON LTD·Filed 2018·Granted Feb 8, 2022·0 cites·20 claims
- 2843US10935889B2Extreme ultra-violet sensitivity reduction using shrink and growth methodTOKYO ELECTRON LTD·Filed 2016·Granted Mar 2, 2021·0 cites·20 claims
- 2938US10354872B2High-precision dispense system with meniscus controlTOKYO ELECTRON LTD·Filed 2017·Granted Jul 16, 2019·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →