Inventor · disambiguated record
Linda Marquez
Also filed as: MARQUEZ LINDA · MARQUEZ LINDA N · MARQUEZ LINDA NANCY
10 granted patents·2 pending applications·118 citations·filing 1996–2018
89Inventor score
Top patents by PatentIndex Score
12 records- 0189US10825659B2Substrate processing chamber including multiple gas injection points and dual injectorLAM RES CORP·Filed 2017·Granted Nov 3, 2020·8 cites·13 claims
- 0285US9558928B2Contact clean in high-aspect ratio structuresLAM RES CORP·Filed 2014·Granted Jan 31, 2017·7 cites·20 claims
- 0382US9911620B2Method for achieving ultra-high selectivity while etching silicon nitrideLAM RES CORP·Filed 2015·Granted Mar 6, 2018·3 cites·20 claims
- 0472US8801947B2Methods for forming microlensesMATTSON TECH INC·Filed 2013·Granted Aug 12, 2014·4 cites·20 claims
- 0570US8033922B1Manually pushed swingMARQUEZ LINDA·Filed 2009·Granted Oct 11, 2011·11 cites·6 claims
- 0664US5783496AMethods and apparatus for etching self-aligned contactsLAM RES CORP·Filed 1996·Granted Jul 21, 1998·33 cites·21 claims
- 0755US6165910ASelf-aligned contacts for semiconductor deviceLAM RES CORP·Filed 1997·Granted Dec 26, 2000·20 cites·26 claims
- 0851US2018158692A1Apparatus for achieving ultra-high selectivity while etching silicon nitrideLAM RES CORP·Filed 2018·Application pending·0 cites
- 0948US6133153ASelf-aligned contacts for semiconductor deviceLAM RES CORP·Filed 1998·Granted Oct 17, 2000·15 cites·24 claims
- 1045US7153780B2Method and apparatus for self-aligned MOS patterningINTEL CORP·Filed 2004·Granted Dec 26, 2006·4 cites·27 claims
- 1145US6228774B1High aspect ratio sub-micron contact etch process in an inductively-coupled plasma processing systemLAM RES CORP·Filed 1998·Granted May 8, 2001·13 cites·68 claims
- 1244US2016181116A1Selective nitride etchLAM RES CORP·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →