Inventor · disambiguated record
Masatoshi Echigo
Also filed as: ECHIGO MASATOSHI
63 granted patents·79 pending applications·189 citations·filing 2003–2023
98Inventor score
Files withMITSUBISHI GAS CHEMICAL CO113ECHIGO MASATOSHI11THE SCHOOL CORPORATION KANSAI UNIV5HAYASHI HIROMI3A SCHOOL CORP KANSAI UNIV2
Top patents by PatentIndex Score
142 records- 0196US10303055B2Resist composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted May 28, 2019·8 cites·8 claims
- 0296US9908831B2Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefromMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Mar 6, 2018·11 cites·24 claims
- 0396US9540339B2Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefromMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Jan 10, 2017·10 cites·3 claims
- 0495US9122153B2Cyclic compound, method for producing same, composition, and method for forming resist patternECHIGO MASATOSHI·Filed 2012·Granted Sep 1, 2015·18 cites·27 claims
- 0593US7871751B2Resist compositionMITSUBISHI GAS CHEMICAL CO·Filed 2005·Granted Jan 18, 2011·15 cites·34 claims
- 0692US9316913B2Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation methodECHIGO MASATOSHI·Filed 2012·Granted Apr 19, 2016·15 cites·9 claims
- 0792US8883937B2Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist patternECHIGO MASATOSHI·Filed 2010·Granted Nov 11, 2014·8 cites·20 claims
- 0890US10377734B2Resist composition, method for forming resist pattern, polyphenol derivative for use in the compositionMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Aug 13, 2019·7 cites·19 claims
- 0989US8748078B2Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist patternHAYASHI HIROMI·Filed 2010·Granted Jun 10, 2014·6 cites·18 claims
- 1086US10642156B2Resist base material, resist composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted May 5, 2020·2 cites·14 claims
- 1186US7414097B2Curing epoxy resin with aliphatic diamine-styrene product and carboxyl- and hydroxyl-containing acceleratorMITSUBISHI GAS CHEMICAL CO·Filed 2007·Granted Aug 19, 2008·5 cites·3 claims
- 1284US9182666B2Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation methodMITSUBISHI GAS CHEMICAL CO·Filed 2012·Granted Nov 10, 2015·3 cites·15 claims
- 1383US11572430B2Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2020·Granted Feb 7, 2023·1 cites·1 claims
- 1483US8846292B2Radiation-sensitive compositionECHIGO MASATOSHI·Filed 2011·Granted Sep 30, 2014·2 cites·11 claims
- 1582US11243467B2Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 8, 2022·2 cites·13 claims
- 1682US8889919B2Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist patternECHIGO MASATOSHI·Filed 2010·Granted Nov 18, 2014·4 cites·20 claims
- 1782US7919223B2Compound for resist and radiation-sensitive compositionMITSUBISHI GAS CHEMICAL CO·Filed 2005·Granted Apr 5, 2011·3 cites·37 claims
- 1879US8110334B2Radiation-sensitive compositionECHIGO MASATOSHI·Filed 2007·Granted Feb 7, 2012·13 cites·4 claims
- 1978US11256170B2Compound, resist composition, and method for forming resist pattern using itMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 22, 2022·2 cites·20 claims
- 2077US8969629B2Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation methodTAKASUKA MASAAKI·Filed 2010·Granted Mar 3, 2015·3 cites·6 claims
- 2177US8350096B2Compound for resist and radiation-sensitive compositionMITSUBISHI GAS CHEMICAL CO·Filed 2011·Granted Jan 8, 2013·1 cites·25 claims
- 2276US11480877B2Resist composition, method for forming resist pattern, and polyphenol compound used thereinMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 25, 2022·1 cites·21 claims
- 2376US10577323B2Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resinMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Mar 3, 2020·1 cites·12 claims
- 2476US10294183B2Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resinMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted May 21, 2019·1 cites·25 claims
- 2576US8829247B2Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist patternHAYASHI HIROMI·Filed 2010·Granted Sep 9, 2014·3 cites·7 claims
- 2676US6908982B2Amino composition and process for producing the sameMITSUBISHI GAS CHEMICAL CO·Filed 2003·Granted Jun 21, 2005·8 cites·18 claims
- 2775US11137686B2Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 5, 2021·2 cites·10 claims
- 2875US10747112B2Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Aug 18, 2020·2 cites·22 claims
- 2975US7572877B2Modified cyclic aliphatic polyamineMITSUBISHI GASCHEMICAL COMPANY·Filed 2007·Granted Aug 11, 2009·3 cites·10 claims
- 3072US10364314B2Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Jul 30, 2019·2 cites·21 claims
- 3172US9920024B2Method for purifying compound or resinMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Mar 20, 2018·1 cites·13 claims
- 3271US10723690B2(Meth)acryloyl compound and method for producing sameMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Jul 28, 2020·1 cites·10 claims
- 3371US8802353B2Compound for resist and radiation-sensitive composition specificationECHIGO MASATOSHI·Filed 2012·Granted Aug 12, 2014·1 cites·2 claims
- 3470US11143962B2Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 12, 2021·1 cites·17 claims
- 3570US11130724B2Compound, resin, composition, resist pattern formation method, and circuit pattern formation methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Sep 28, 2021·1 cites·18 claims
- 3668US10550068B2Compound and method for producing sameMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 4, 2020·1 cites·26 claims
- 3767US8741553B2Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist patternHIGASHIHARA GO·Filed 2011·Granted Jun 3, 2014·3 cites·12 claims
- 3867US2017183279A1Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefromMITSUBISHI GAS CHEMICAL CO·Filed 2017·Application pending·0 cites
- 3966US2025250216A1Cyclic compound having iodine atomMITSUBISHI GAS CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4065US10437148B2Resist material, resist composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted Oct 8, 2019·1 cites·17 claims
- 4165US7157606B2Process for producing an amino compositionMITSUBISHI GAS CHEMICAL CO·Filed 2004·Granted Jan 2, 2007·3 cites·20 claims
- 4263US9598392B2Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefromECHIGO MASATOSHI·Filed 2012·Granted Mar 21, 2017·0 cites·14 claims
- 4363US7301053B2Modified cyclic aliphatic polyamineMITSUBISHI GAS CHEMICAL CO·Filed 2003·Granted Nov 27, 2007·2 cites·4 claims
- 4462US9809601B2Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Nov 7, 2017·1 cites·16 claims
- 4561US7364668B2Process for producing an amino compositionMITSUBISHI GAS CHEMICAL CO·Filed 2004·Granted Apr 29, 2008·3 cites·8 claims
- 4660US7473806B2Modified chain aliphatic polyamineMITSUBISHI GAS CHEMICAL CO·Filed 2003·Granted Jan 6, 2009·2 cites·9 claims
- 4760US2023348351A1Compound, polymer, composition, composition for film formation, pattern formation method, insulating film formation method, and method for producing compoundMITSUBISHI GAS CHEMICAL CO·Filed 2021·Application pending·0 cites
- 4859US7109289B2Modified polyoxyalkylene polyamineMITSUBISHI GAS CHEMICAL CO·Filed 2004·Granted Sep 19, 2006·3 cites·16 claims
- 4959US2025346723A1Tellurium-containing polymer and compoundTHE SCHOOL CORPORATION KANSAI UNIV·Filed 2023·Application pending·0 cites
- 5058US9464068B2Allyl compound and method for producing the sameMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Oct 11, 2016·0 cites·8 claims
Showing the top 50 of 142 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →