Inventor · disambiguated record
Mark Fodor
Also filed as: FODOR MARK · FODOR MARK A · FODOR MARK ANTHONY
26 granted patents·7 pending applications·2,513 citations·filing 1993–2019
98Inventor score
Top patents by PatentIndex Score
33 records- 0199US5531835APatterned susceptor to reduce electrostatic force in a CVD chamberAPPLIED MATERIALS INC·Filed 1994·Granted Jul 2, 1996·852 cites·6 claims
- 0298US10774423B2Tunable ground planes in plasma chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2020·41 cites·20 claims
- 0397US6358573B1Mixed frequency CVD processAPPLIED MATERIALS INC·Filed 2000·Granted Mar 19, 2002·130 cites·20 claims
- 0497US5680013ACeramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfacesAPPLIED MATERIALS INC·Filed 1994·Granted Oct 21, 1997·177 cites·30 claims
- 0596US6193802B1Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipmentAPPLIED MATERIALS INC·Filed 1996·Granted Feb 27, 2001·191 cites·34 claims
- 0696US6194628B1Method and apparatus for cleaning a vacuum line in a CVD systemAPPLIED MATERIALS INC·Filed 1995·Granted Feb 27, 2001·170 cites·40 claims
- 0796US6187072B1Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissionsAPPLIED MATERIALS INC·Filed 1996·Granted Feb 13, 2001·154 cites·29 claims
- 0895US6098568AMixed frequency CVD apparatusAPPLIED MATERIALS INC·Filed 1997·Granted Aug 8, 2000·106 cites·5 claims
- 0994US8197636B2Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2008·Granted Jun 12, 2012·30 cites·11 claims
- 1093US6680420B2Apparatus for cleaning an exhaust line in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Jan 20, 2004·45 cites·13 claims
- 1193US5959409ACeramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfacesAPPLIED MATERIALS INC·Filed 1997·Granted Sep 28, 1999·81 cites·33 claims
- 1291US8444926B2Processing chamber with heated chamber linerFODOR MARK A·Filed 2007·Granted May 21, 2013·25 cites·16 claims
- 1391US6689930B1Method and apparatus for cleaning an exhaust line in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Feb 10, 2004·51 cites·23 claims
- 1490US7024105B2Substrate heater assemblyAPPLIED MATERIALS INC·Filed 2003·Granted Apr 4, 2006·56 cites·23 claims
- 1590US6517913B1Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissionsAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·65 cites·22 claims
- 1690US5496142ASlotted conical spring washerAPPLIED MATERIALS INC·Filed 1993·Granted Mar 5, 1996·75 cites·23 claims
- 1784US5633073ACeramic susceptor with embedded metal electrode and eutectic connectionAPPLIED MATERIALS INC·Filed 1995·Granted May 27, 1997·81 cites·5 claims
- 1880US5817406ACeramic susceptor with embedded metal electrode and brazing material connectionAPPLIED MATERIALS INC·Filed 1996·Granted Oct 6, 1998·61 cites·22 claims
- 1979US7922440B2Apparatus and method for centering a substrate in a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 12, 2011·6 cites·20 claims
- 2078US6506994B2Low profile thick film heaters in multi-slot bake chamberAPPLIED MATERIALS INC·Filed 2001·Granted Jan 14, 2003·22 cites·36 claims
- 2178US6354241B1Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processingAPPLIED MATERIALS INC·Filed 1999·Granted Mar 12, 2002·48 cites·25 claims
- 2278US5705225AMethod of filling pores in anodized aluminum partsAPPLIED MATERIALS INC·Filed 1996·Granted Jan 6, 1998·33 cites·2 claims
- 2376US8778813B2Confined process volume PECVD chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2011·Granted Jul 15, 2014·4 cites·17 claims
- 2474US10227695B2Shadow ring for modifying wafer edge and bevel depositionDU BOIS DALE R·Filed 2010·Granted Mar 12, 2019·4 cites·13 claims
- 2572US11136665B2Shadow ring for modifying wafer edge and bevel depositionAPPLIED MATERIALS INC·Filed 2019·Granted Oct 5, 2021·1 cites·13 claims
- 2670US7354288B2Substrate support with clamping electrical connectorAPPLIED MATERIALS INC·Filed 2005·Granted Apr 8, 2008·4 cites·23 claims
- 2765US2009236214A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2008·Application pending·0 cites
- 2860US2008152838A1Hardware development to reduce bevel depositionAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2955US2012205046A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2012·Application pending·0 cites
- 3054US2005196971A1Hardware development to reduce bevel depositionAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 3149US2009314211A1Big foot lift pinAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3248US2012211164A1Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2012·Application pending·0 cites
- 3341US2005150452A1Process kit design for deposition chamberFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →