Inventor · disambiguated record
Martin Glodde
Also filed as: GLODDE MARTIN
33 granted patents·2 pending applications·138 citations·filing 2008–2019
96Inventor score
Top patents by PatentIndex Score
35 records- 0195US9671694B1Wet strippable gap fill materialsIBM·Filed 2016·Granted Jun 6, 2017·12 cites·17 claims
- 0295US8816328B2Patterning contacts in carbon nanotube devicesCHANG JOSEPHINE B·Filed 2012·Granted Aug 26, 2014·13 cites·14 claims
- 0395US8759220B1Patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 24, 2014·13 cites·46 claims
- 0494US10096477B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2017·Granted Oct 9, 2018·7 cites·15 claims
- 0594US9337033B1Dielectric tone inversion materialsIBM·Filed 2015·Granted May 10, 2016·9 cites·15 claims
- 0694US8803129B2Patterning contacts in carbon nanotube devicesCHANG JOSEPHINE B·Filed 2011·Granted Aug 12, 2014·12 cites·16 claims
- 0792US8999625B2Silicon-containing antireflective coatings including non-polymeric silsesquioxanesIBM·Filed 2013·Granted Apr 7, 2015·8 cites·17 claims
- 0892US8652712B2Photoacid generators for extreme ultraviolet lithographyGLODDE MARTIN·Filed 2011·Granted Feb 18, 2014·7 cites·35 claims
- 0991US8039194B2Photoacid generators for extreme ultraviolet lithographyIBM·Filed 2008·Granted Oct 18, 2011·9 cites·30 claims
- 1087US10345702B2Polymer brushes for extreme ultraviolet photolithographyIBM·Filed 2017·Granted Jul 9, 2019·4 cites·9 claims
- 1187US9281212B1Dielectric tone inversion materialsIBM·Filed 2014·Granted Mar 8, 2016·6 cites·15 claims
- 1287US8293451B2Near-infrared absorbing film compositionsGLODDE MARTIN·Filed 2009·Granted Oct 23, 2012·8 cites·17 claims
- 1386US7655379B2Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anionsIBM·Filed 2008·Granted Feb 2, 2010·9 cites·24 claims
- 1485US10553432B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2018·Granted Feb 4, 2020·2 cites·20 claims
- 1584US10312087B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2017·Granted Jun 4, 2019·2 cites·5 claims
- 1681US8658050B2Method to transfer lithographic patterns into inorganic substratesENGELMANN SEBASTIAN ULRICH·Filed 2011·Granted Feb 25, 2014·6 cites·19 claims
- 1779US9465290B2Near-infrared absorbing film compositionsGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 11, 2016·2 cites·8 claims
- 1878US9425053B2Block mask litho on high aspect ratio topography with minimal semiconductor material damageIBM·Filed 2014·Granted Aug 23, 2016·4 cites·19 claims
- 1975US8772376B2Near-infrared absorbing film compositionsHUANG WU-SONG·Filed 2009·Granted Jul 8, 2014·3 cites·13 claims
- 2070US9348228B2Acid-strippable silicon-containing antireflective coatingGLOBALFOUNDRIES INC·Filed 2013·Granted May 24, 2016·1 cites·12 claims
- 2168US10964541B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2019·Granted Mar 30, 2021·0 cites·20 claims
- 2265US10656523B2Polymer brushes for extreme ultraviolet photolithographyIBM·Filed 2019·Granted May 19, 2020·0 cites·9 claims
- 2363US9580623B2Patterning process using a boron phosphorus silicon glass filmSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 28, 2017·1 cites·12 claims
- 2457US10388521B2Method to increase the lithographic process window of extreme ultra violet negative tone development resistsIBM·Filed 2017·Granted Aug 20, 2019·0 cites·5 claims
- 2555US8586283B2Near-infrared absorbing film compositionsGLODDE MARTIN·Filed 2012·Granted Nov 19, 2013·0 cites·17 claims
- 2654US10727055B2Method to increase the lithographic process window of extreme ultra violet negative tone development resistsIBM·Filed 2017·Granted Jul 28, 2020·0 cites·11 claims
- 2749US10170301B2Adhesion of polymers on silicon substratesIBM·Filed 2017·Granted Jan 1, 2019·0 cites·16 claims
- 2847US9551696B2Cleanability assessment of sublimate from lithography materialsGLOBALFOUNDRIES INC·Filed 2014·Granted Jan 24, 2017·0 cites·20 claims
- 2947US9460934B2Wet strip process for an antireflective coating layerGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 4, 2016·0 cites·20 claims
- 3046US8395228B2Integration process to improve focus leveling within a lot process variationLI WAI-KIN·Filed 2010·Granted Mar 12, 2013·0 cites·31 claims
- 3145US9431250B2Deep well implant using blocking maskIBM·Filed 2014·Granted Aug 30, 2016·0 cites·19 claims
- 3242US9069245B2Near-infrared absorptive layer-forming composition and multilayer filmOHASHI MASAKI·Filed 2011·Granted Jun 30, 2015·0 cites·15 claims
- 3341US2013157463A1Near-infrared absorbing film composition for lithographic applicationGOLDFARB DARIO L·Filed 2011·Application pending·0 cites
- 3436US8722307B2Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layerTACHIBANA SEIICHIRO·Filed 2011·Granted May 13, 2014·0 cites·23 claims
- 3534US2011262863A1Near-infrared absorptive layer-forming composition and multilayer filmTACHIBANA SEIICHIRO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →