Inventor · disambiguated record
Masahiro Hatakeyama
Also filed as: HATAKEYAMA MASAHIRO
97 granted patents·13 pending applications·2,170 citations·filing 1992–2023
99Inventor score
Top patents by PatentIndex Score
110 records- 0199US11583973B2Polishing apparatusEBARA CORP·Filed 2020·Granted Feb 21, 2023·4 cites·14 claims
- 0299US7109483B2Method for inspecting substrate, substrate inspecting system and electron beam apparatusEBARA CORP·Filed 2001·Granted Sep 19, 2006·159 cites·9 claims
- 0398US9368314B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2014·Granted Jun 14, 2016·38 cites·10 claims
- 0498US7138629B2Testing apparatus using charged particles and device manufacturing method using the testing apparatusEBARA CORP·Filed 2004·Granted Nov 21, 2006·151 cites·22 claims
- 0598US6992290B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jan 31, 2006·97 cites·5 claims
- 0697US8497476B2Inspection deviceHATAKEYAMA MASAHIRO·Filed 2012·Granted Jul 30, 2013·42 cites·10 claims
- 0797US7928382B2Detector and inspecting apparatusEBARA CORP·Filed 2006·Granted Apr 19, 2011·51 cites·22 claims
- 0897US7741601B2Testing apparatus using charged particles and device manufacturing method using the testing apparatusEBARA CORP·Filed 2008·Granted Jun 22, 2010·36 cites·13 claims
- 0997US7365324B2Testing apparatus using charged particles and device manufacturing method using the testing apparatusEBARA CORP·Filed 2006·Granted Apr 29, 2008·49 cites·7 claims
- 1097US7351969B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Apr 1, 2008·37 cites·5 claims
- 1197US7223973B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2005·Granted May 29, 2007·38 cites·10 claims
- 1297US7220604B2Method and apparatus for repairing shape, and method for manufacturing semiconductor device using thoseEBARA CORP·Filed 2005·Granted May 22, 2007·59 cites·11 claims
- 1397US6909092B2Electron beam apparatus and device manufacturing method using sameTOSHIBA KK·Filed 2003·Granted Jun 21, 2005·77 cites·17 claims
- 1497US6855929B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2001·Granted Feb 15, 2005·106 cites·55 claims
- 1596US7569838B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Aug 4, 2009·23 cites·5 claims
- 1695US8822919B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerKIMBA TOSHIFUMI·Filed 2011·Granted Sep 2, 2014·15 cites·10 claims
- 1795US7411191B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2007·Granted Aug 12, 2008·20 cites·4 claims
- 1895US5852298AMicro-processing apparatus and method thereforEBARA CORP·Filed 1996·Granted Dec 22, 1998·115 cites·32 claims
- 1994US8946631B2Testing apparatus using charged particles and device manufacturing method using the testing apparatusEBARA CORP·Filed 2014·Granted Feb 3, 2015·11 cites·14 claims
- 2094US7241993B2Inspection system by charged particle beam and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jul 10, 2007·54 cites·12 claims
- 2194US7095022B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusNIKON CORP·Filed 2001·Granted Aug 22, 2006·48 cites·13 claims
- 2293US7928378B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2008·Granted Apr 19, 2011·17 cites·11 claims
- 2393US7408175B2Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using formerEBARA CORP·Filed 2007·Granted Aug 5, 2008·19 cites·9 claims
- 2492US8742344B2Inspection apparatusEBARA CORP·Filed 2013·Granted Jun 3, 2014·10 cites·9 claims
- 2591US8053726B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Nov 8, 2011·11 cites·11 claims
- 2691US7129485B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2004·Granted Oct 31, 2006·30 cites·8 claims
- 2790US9601302B2Inspection apparatusEBARA CORP·Filed 2015·Granted Mar 21, 2017·5 cites·8 claims
- 2890US8803103B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2013·Granted Aug 12, 2014·6 cites·7 claims
- 2989US10688620B2Polishing apparatusEBARA CORP·Filed 2017·Granted Jun 23, 2020·2 cites·34 claims
- 3088US8368018B2Method and apparatus for charged particle beam inspectionEBARA CORP·Filed 2009·Granted Feb 5, 2013·11 cites·21 claims
- 3188US7888642B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2008·Granted Feb 15, 2011·9 cites·9 claims
- 3287US8624182B2Electro-optical inspection apparatus and method with dust or particle collection functionWATANABE KENJI·Filed 2011·Granted Jan 7, 2014·7 cites·12 claims
- 3387US7423267B2Electron beam apparatus and method of manufacturing semiconductor device using the apparatusEBARA CORP·Filed 2006·Granted Sep 9, 2008·8 cites·5 claims
- 3486US10157722B2Inspection deviceEBARA CORP·Filed 2016·Granted Dec 18, 2018·3 cites·15 claims
- 3586US9966227B2Specimen observation method and device using secondary emission electron and mirror electron detectionEBARA CORP·Filed 2014·Granted May 8, 2018·5 cites·16 claims
- 3686US9406480B2Testing apparatus using charged particles and device manufacturing method using the testing apparatusEBARA CORP·Filed 2015·Granted Aug 2, 2016·3 cites·14 claims
- 3786US5868952AFabrication method with energy beamEBARA CORP·Filed 1996·Granted Feb 9, 1999·73 cites·27 claims
- 3885US6671034B1Microfabrication of pattern imprintingEBARA CORP·Filed 1999·Granted Dec 30, 2003·47 cites·10 claims
- 3985US5770123AMethod and apparatus for energy beam machiningEBARA CORP·Filed 1995·Granted Jun 23, 1998·51 cites·34 claims
- 4084US7098457B2Electron beam apparatus and device manufacturing method using sameTOSHIBA KK·Filed 2005·Granted Aug 29, 2006·6 cites·16 claims
- 4184US2023158632A1Polishing apparatusEBARA CORP·Filed 2023·Application pending·0 cites
- 4283US9134261B2Inspection apparatusEBARA CORP·Filed 2014·Granted Sep 15, 2015·4 cites·2 claims
- 4383US8742341B2Testing apparatus using charged particles and device manufacturing method using the testing apparatusNOJI NOBUHARU·Filed 2010·Granted Jun 3, 2014·4 cites·13 claims
- 4483US8368031B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2011·Granted Feb 5, 2013·3 cites·7 claims
- 4583US8076654B2Sample surface inspection apparatus and methodHATAKEYAMA MASAHIRO·Filed 2008·Granted Dec 13, 2011·5 cites·15 claims
- 4683US6949735B1Beam sourceEBARA CORP·Filed 2000·Granted Sep 27, 2005·20 cites·7 claims
- 4782US7863580B2Electron beam apparatus and an aberration correction optical apparatusEBARA CORP·Filed 2007·Granted Jan 4, 2011·7 cites·8 claims
- 4882US7285010B2TDI detecting device, a feed-through equipment and electron beam apparatus using these devicesEBARA CORP·Filed 2002·Granted Oct 23, 2007·19 cites·7 claims
- 4981US8937283B2Specimen observation method and device using secondary emission electron and mirror electron detectionHATAKEYAMA MASAHIRO·Filed 2009·Granted Jan 20, 2015·6 cites·6 claims
- 5080US6015976AFabrication apparatus employing energy beamEBARA CORP·Filed 1998·Granted Jan 18, 2000·51 cites·17 claims
Showing the top 50 of 110 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →