Inventor · disambiguated record
Masaru Hori
Also filed as: HORI MASARU
55 granted patents·33 pending applications·2,134 citations·filing 1990–2025
98Inventor score
Files withHORI MASARU16ASM IP HOLDING BV11TOKYO ELECTRON LTD11NU ECO ENGINEERING CO LTD7UNIV NAGOYA NAT UNIV CORP6
Top patents by PatentIndex Score
88 records- 0199US5188706AMethod of manufacturing an x-ray exposure mask and device for controlling the internal stress of thin filmsTOSHIBA KK·Filed 1990·Granted Feb 23, 1993·298 cites·17 claims
- 0298US10283353B2Method of reforming insulating film deposited on substrate with recess patternASM IP HOLDING BV·Filed 2017·Granted May 7, 2019·416 cites·21 claims
- 0398US9793135B1Method of cyclic dry etching using etchant filmASM IP HOLDING BV·Filed 2016·Granted Oct 17, 2017·475 cites·18 claims
- 0496US8551657B2Negative electrode for lithium secondary battery, method for preparing the negative electrode, lithium secondary battery having the negative electrode, and vehicle having the lithium secondary batteryYOSHIDA SATOSHI·Filed 2010·Granted Oct 8, 2013·30 cites·21 claims
- 0596US8119530B2Pattern forming method and semiconductor device manufacturing methodHORI MASARU·Filed 2007·Granted Feb 21, 2012·184 cites·20 claims
- 0695US5302240AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1993·Granted Apr 12, 1994·200 cites·22 claims
- 0794US10504742B2Method of atomic layer etching using hydrogen plasmaASM IP HOLDING BV·Filed 2018·Granted Dec 10, 2019·9 cites·19 claims
- 0890US10720334B2Selective cyclic dry etching process of dielectric materials using plasma modificationASM IP HOLDING BV·Filed 2018·Granted Jul 21, 2020·6 cites·31 claims
- 0990US8610353B2Plasma generating apparatus, plasma processing apparatus and plasma processing methodITOH HITOSHI·Filed 2011·Granted Dec 17, 2013·7 cites·18 claims
- 1087US8558169B2Sample substrate for laser desorption ionization-mass spectrometry, and method and device both using the same for laser desorption ionization-mass spectrometryHORI MASARU·Filed 2010·Granted Oct 15, 2013·11 cites·18 claims
- 1187US5445710AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1994·Granted Aug 29, 1995·86 cites·18 claims
- 1284US7632379B2Plasma source and plasma processing apparatusGOTO TOSHIO·Filed 2004·Granted Dec 15, 2009·35 cites·12 claims
- 1383US10325781B2Etching method and etching apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 18, 2019·3 cites·12 claims
- 1481US5707487AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1994·Granted Jan 13, 1998·73 cites·20 claims
- 1579US7556970B2Method of repairing damaged film having low dielectric constant, semiconductor device fabricating system and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Jul 7, 2009·6 cites·13 claims
- 1679US5980999AMethod of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methodsUNIV NAGOYA·Filed 1996·Granted Nov 9, 1999·68 cites·8 claims
- 1778US5411631ADry etching methodTOKYO ELECTRON LTD·Filed 1993·Granted May 2, 1995·66 cites·22 claims
- 1877US7393460B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jul 1, 2008·5 cites·22 claims
- 1977US6501082B1Plasma deposition apparatus and method with controllerTOKYO ELECTRON LTD·Filed 2000·Granted Dec 31, 2002·13 cites·16 claims
- 2076US8349142B2Method for producing grapheneNU ECO ENGINEERING CO LTD·Filed 2009·Granted Jan 8, 2013·3 cites·10 claims
- 2176US5240554AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1992·Granted Aug 31, 1993·59 cites·23 claims
- 2275US11261091B2Carbon nanosheet and manufacturing method thereforNATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM·Filed 2018·Granted Mar 1, 2022·1 cites·12 claims
- 2375US5259923ADry etching methodTOKYO ELECTRON LTD·Filed 1992·Granted Nov 9, 1993·61 cites·12 claims
- 2474US12322575B2Etching processes and processing assembliesASM IP HOLDING BV·Filed 2023·Granted Jun 3, 2025·0 cites·22 claims
- 2574US2024240324A1Carbon hard mask, film forming apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2672US10720337B2Pre-cleaning for etching of dielectric materialsASM IP HOLDING BV·Filed 2018·Granted Jul 21, 2020·1 cites·27 claims
- 2771US2025273435A1Etching processes and processing assembliesASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 2868US7923170B2Fuel cell separator with a vapor-phase grown carbon-based porous material of nanosize structureTOYOTA MOTOR CO LTD·Filed 2005·Granted Apr 12, 2011·1 cites·4 claims
- 2965US8961888B2Plasma generatorHORI MASARU·Filed 2008·Granted Feb 24, 2015·3 cites·20 claims
- 3065US7989364B2Plasma oxidation processing methodUNIV NAGOYA NAT UNIV CORP·Filed 2007·Granted Aug 2, 2011·2 cites·14 claims
- 3165US7710562B2Atomic analyzerNU ECO ENGINEERING CO LTD·Filed 2008·Granted May 4, 2010·1 cites·3 claims
- 3265US2025036020A1Reflective mask blank, reflective mask blank manufacturing method, reflective mask, and reflective mask manufacturing methodAGC INC·Filed 2024·Application pending·0 cites
- 3365US2024231215A9Reflection type mask blank and method for manufacturing sameAGC INC·Filed 2024·Application pending·0 cites
- 3464US7855788B2Spectroscopy method and spectroscopeNU ECO ENGINEERING CO LTD·Filed 2006·Granted Dec 21, 2010·3 cites·6 claims
- 3563US9447518B2Radical generator and molecular beam epitaxy apparatusHORI MASARU·Filed 2011·Granted Sep 20, 2016·1 cites·10 claims
- 3663US9252000B2Microwave waveguide apparatus, plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Feb 2, 2016·1 cites·20 claims
- 3763US7517771B2Method for manufacturing semiconductor device having trenchDENSO CORP·Filed 2006·Granted Apr 14, 2009·1 cites·21 claims
- 3863US2025015144A1SUBSTRATE WITH ß-GALLIUM OXIDE FILM AND PRODUCTION METHOD THEREFORNATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM·Filed 2024·Application pending·0 cites
- 3963US2025034752A1Gallium oxide film, and manufacturing device and manufacturing method for sameNATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM·Filed 2024·Application pending·0 cites
- 4062US9452481B2Reactive-species supply device and surface treatment apparatusHORI MASARU·Filed 2011·Granted Sep 27, 2016·2 cites·4 claims
- 4161US12444618B2Etching method and etching apparatusHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 14, 2025·0 cites·9 claims
- 4261US11993849B2Carbon hard mask, film forming apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2019·Granted May 28, 2024·0 cites·3 claims
- 4360US9713241B2Reactive-species supply device and surface treatment apparatusHORI MASARU·Filed 2011·Granted Jul 18, 2017·2 cites·10 claims
- 4460US9420697B2Method for manufacturing printed wiring boardIWATA YOSHIYUKI·Filed 2012·Granted Aug 16, 2016·1 cites·20 claims
- 4559US12347675B2Methods and systems for topography-selective depositionsASM IP HOLDING BV·Filed 2022·Granted Jul 1, 2025·0 cites·20 claims
- 4659US12237174B2Etching methodHITACHI HIGH TECH CORP·Filed 2021·Granted Feb 25, 2025·0 cites·5 claims
- 4757US2023098969A1Sim, communication device, and writing method for applicationNTT COMM CORP·Filed 2022·Application pending·0 cites
- 4856US2025006489A1Methods and assemblies for depositing material in a gapASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 4954US8351039B2Spectroscopy method and spectroscopeNU ECO ENGINEERING CO LTD·Filed 2010·Granted Jan 8, 2013·0 cites·4 claims
- 5051US2024266168A1Method of manufacturing group iii-nitride semiconductorSCREEN HOLDINGS CO LTD·Filed 2022·Application pending·0 cites
Showing the top 50 of 88 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →