Inventor · disambiguated record
Manabu Iwata
Also filed as: IWATA MANABU
29 granted patents·10 pending applications·834 citations·filing 2003–2021
97Inventor score
Top patents by PatentIndex Score
39 records- 0199US8343306B2Plasma processing apparatus and method of plasma distribution correctionTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·81 cites·5 claims
- 0298US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0397US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0497US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0595US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 0693US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 0789US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 0889US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 0987US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 1086US10264662B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Apr 16, 2019·8 cites·6 claims
- 1183US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 1281US8303834B2Plasma processing apparatus and plasma etching methodHONDA MASANOBU·Filed 2009·Granted Nov 6, 2012·6 cites·12 claims
- 1380US9099503B2Plasma processing apparatusIWATA MANABU·Filed 2008·Granted Aug 4, 2015·7 cites·19 claims
- 1480US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 1580US7527016B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 5, 2009·16 cites·11 claims
- 1679US8431035B2Plasma processing apparatus and methodIWATA MANABU·Filed 2009·Granted Apr 30, 2013·4 cites·5 claims
- 1779US8138445B2Plasma processing apparatus and plasma processing methodMATSUMOTO NAOKI·Filed 2007·Granted Mar 20, 2012·4 cites·15 claims
- 1877US8317969B2Plasma processing apparatusIWATA MANABU·Filed 2009·Granted Nov 27, 2012·4 cites·14 claims
- 1977US8034213B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 11, 2011·4 cites·16 claims
- 2074US7829463B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Nov 9, 2010·4 cites·18 claims
- 2174US2021082669A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2273US8999068B2Chamber cleaning methodHONDA MASANOBU·Filed 2010·Granted Apr 7, 2015·3 cites·8 claims
- 2371US8425791B2In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including sameKOSHIMIZU CHISHIO·Filed 2009·Granted Apr 23, 2013·2 cites·4 claims
- 2470US8377255B2Plasma processing apparatus and method of controlling distribution of a plasma thereinTOKYO ELECTRON LTD·Filed 2010·Granted Feb 19, 2013·2 cites·9 claims
- 2568US8440050B2Plasma processing apparatus and method, and storage mediumIWATA MANABU·Filed 2009·Granted May 14, 2013·3 cites·14 claims
- 2666US8513563B2Plasma processing apparatus and plasma processing methodMATSUMOTO NAOKI·Filed 2012·Granted Aug 20, 2013·1 cites·7 claims
- 2759US2014326409A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2858US2016358753A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2956US10529539B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 7, 2020·0 cites·8 claims
- 3054US11908665B2Plasma processing apparatus and measurement methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 20, 2024·0 cites·19 claims
- 3153US2006037704A1Plasma Processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3252US2009242133A1Electrode structure and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3351US9484180B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Nov 1, 2016·0 cites·8 claims
- 3449US10141164B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Nov 27, 2018·0 cites·4 claims
- 3549US2009242127A1Plasma etching apparatus and method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3649US2011214815A1Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Application pending·0 cites
- 3745US2007227666A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3845US2021233775A1High-throughput dry etching of silicon oxide and silicon nitride materials by in-situ autocatalyst formationTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3944US2015162170A1Plasma processing apparatus and focus ringTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →