Inventor · disambiguated record
Mark John Maslow
Also filed as: MASLOW MARK JOHN
11 granted patents·6 pending applications·22 citations·filing 2016–2025
86Inventor score
Files withASML NETHERLANDS BV17
Top patents by PatentIndex Score
17 records- 0191US11768442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2022·Granted Sep 26, 2023·1 cites·20 claims
- 0291US10571806B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·5 cites·22 claims
- 0389US12332573B2Method for determining defectiveness of pattern based on after development imageASML NETHERLANDS BV·Filed 2020·Granted Jun 17, 2025·3 cites·15 claims
- 0489US11379970B2Deep learning for semantic segmentation of patternASML NETHERLANDS BV·Filed 2019·Granted Jul 5, 2022·8 cites·20 claims
- 0587US11847570B2Deep learning for semantic segmentation of patternASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·20 claims
- 0682US11513442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Nov 29, 2022·2 cites·20 claims
- 0780US12197136B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 14, 2025·0 cites·20 claims
- 0878US11860548B2Method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2020·Granted Jan 2, 2024·1 cites·21 claims
- 0978US2025391010A1System and method for generating predictive images for wafer inspection using machine learningASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1076US2024111218A1A method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1175US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 1275US2024004299A1Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1374US2023042759A1Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1466US11733610B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·0 cites·20 claims
- 1565US2025237967A1Method for determining defectiveness of pattern based on after development imageASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1641US10866523B2Process window trackerASML NETHERLANDS BV·Filed 2016·Granted Dec 15, 2020·0 cites·21 claims
- 1734US2019214318A1Method and apparatus to monitor a process apparatusASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →