Separation of contributions to metrology data

Abstract

A method including: computing a value of a first variable of a pattern of, or for, a substrate processed by a patterning process by combining a fingerprint of the first variable on the substrate and a certain value of the first variable; and determining a value of a second variable of the pattern based at least in part on the computed value of the first variable.

1 .- 15 . (canceled) 
     
     
         16 . A method comprising:
 obtaining an across substrate fingerprint of a variable associated with a pattern created by a patterning process; and   predicting, by a hardware computer system, a contour of a feature of the pattern based on value of the variable selected from a substrate location within the fingerprint.   
     
     
         17 . The method of  claim 16 , wherein the predicting comprises using the value of the variable to select a nominal contour of a certain shape for the feature. 
     
     
         18 . The method of  claim 17 , wherein the nominal contour is obtained by calculation using a simulation or mathematical model. 
     
     
         19 . The method of  claim 17 , wherein the nominal contour is a contour as expected in resist. 
     
     
         20 . The method of  claim 16 , wherein the predicting comprises changing a size of a nominal contour for the feature. 
     
     
         21 . The method of  claim 20 , wherein the changing the size is based on a value of a further variable associated with the pattern, the value selected at the same substrate location from an across substrate fingerprint of the further variable. 
     
     
         22 . The method of  claim 21 , wherein the across substrate fingerprint of the further variable corresponds to a situation post-etch. 
     
     
         23 . The method of  claim 21 , wherein the further variable comprises critical dimension. 
     
     
         24 . The method of  claim 16 , wherein the variable comprises focus. 
     
     
         25 . The method of  claim 16 , wherein the feature is a determined hot spot. 
     
     
         26 . The method of  claim 16 , further comprising using the predicted contour to determine an edge placement position or error. 
     
     
         27 . The method of  claim 16 , further comprising using a check against the predicted contour to determine whether the feature or another feature is likely to be defective. 
     
     
         28 . The method of  claim 16 , further comprising using the predicted contour to calibrate a mathematical model. 
     
     
         29 . The method of  claim 28 , wherein the mathematical model comprises an optical proximity correction model. 
     
     
         30 . A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
 obtain an across substrate fingerprint of a variable associated with a pattern created by a patterning process; and   predict a contour of a feature of the pattern based on value of the variable selected from a substrate location within the fingerprint.   
     
     
         31 . The computer program product of  claim 30 , wherein the instructions configured to cause the computer system to predict a contour are further configured to cause the computer system to use the value of the variable to select a nominal contour of a certain shape for the feature. 
     
     
         32 . The computer program product of  claim 31 , wherein the nominal contour is obtained by calculation using a simulation or mathematical model. 
     
     
         33 . The computer program product of  claim 30 , wherein the instructions configured to cause the computer system to predict a contour are further configured to cause the computer system to change a size of a nominal contour for the feature. 
     
     
         34 . The computer program product of  claim 30 , wherein the variable comprises focus. 
     
     
         35 . The computer program product of  claim 30 , wherein the instructions are further configured to cause the computer system to use the predicted contour to determine an edge placement position or error.