Inventor · disambiguated record
Marinus Jochemsen
Also filed as: JOCHEMSEN MARINUS
26 granted patents·3 pending applications·49 citations·filing 2010–2025
94Inventor score
Top patents by PatentIndex Score
29 records- 0197US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0295US10712672B2Method of predicting patterning defects caused by overlay errorASML NETHERLANDS BV·Filed 2017·Granted Jul 14, 2020·7 cites·21 claims
- 0391US11768442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2022·Granted Sep 26, 2023·1 cites·20 claims
- 0487US11681229B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2021·Granted Jun 20, 2023·1 cites·20 claims
- 0586US11443083B2Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2017·Granted Sep 13, 2022·2 cites·20 claims
- 0686US9329491B2Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatusGROUWSTRA CÉDRIC DÉSIRÉ·Filed 2011·Granted May 3, 2016·7 cites·21 claims
- 0785US2025341785A1Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0884US10859926B2Methods for defect validationASML NETHERLANDS BV·Filed 2016·Granted Dec 8, 2020·7 cites·24 claims
- 0982US12228862B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2023·Granted Feb 18, 2025·0 cites·20 claims
- 1082US11513442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Nov 29, 2022·2 cites·20 claims
- 1182US10394136B2Metrology method for process window definitionASML NETHERLANDS BV·Filed 2016·Granted Aug 27, 2019·2 cites·23 claims
- 1281US10852646B2Displacement based overlay or alignmentASML NETHERLANDS BV·Filed 2017·Granted Dec 1, 2020·2 cites·21 claims
- 1380US12197136B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 14, 2025·0 cites·20 claims
- 1478US8405817B2Lithographic apparatus, a method of controlling the apparatus and a device manufacturing methodSTAVENGA MARCO KOERT·Filed 2010·Granted Mar 26, 2013·4 cites·20 claims
- 1575US12360461B2Identification of hot spots or defects by machine learningASML NETHERLANDS BV·Filed 2022·Granted Jul 15, 2025·0 cites·20 claims
- 1675US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 1775US11106141B2Optimizing a sequence of processes for manufacturing of product unitsASML NETHERLANDS BV·Filed 2018·Granted Aug 31, 2021·1 cites·21 claims
- 1874US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 1974US10962886B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2016·Granted Mar 30, 2021·1 cites·20 claims
- 2074US2023042759A1Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2172US11314174B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·12 claims
- 2271US11442367B2Optimizing a sequence of processes for manufacturing of product unitsASML NETHERLANDS BV·Filed 2021·Granted Sep 13, 2022·0 cites·20 claims
- 2369US11048174B2Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer programASML NETHERLANDS BV·Filed 2017·Granted Jun 29, 2021·1 cites·21 claims
- 2459US2024410827A1Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structureASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2555US9964865B2Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted May 8, 2018·0 cites·20 claims
- 2654US12468234B2Method of controlling a patterning process, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Nov 11, 2025·0 cites·18 claims
- 2746US10725372B2Method and apparatus for reticle optimizationASML NETHERLANDS BV·Filed 2016·Granted Jul 28, 2020·0 cites·20 claims
- 2842US11300887B2Method to change an etch parameterASML NETHERLANDS BV·Filed 2017·Granted Apr 12, 2022·0 cites·20 claims
- 2936US10459345B2Focus-dose co-optimization based on overlapping process windowASML NETHERLANDS BV·Filed 2016·Granted Oct 29, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →