Inventor · disambiguated record
Paul Christiaan Hinnen
Also filed as: HINNEN PAUL C · HINNEN PAUL CHRISTIAAN
53 granted patents·7 pending applications·248 citations·filing 2003–2024
98Inventor score
Files withASML NETHERLANDS BV54HINNEN PAUL CHRISTIAAN2CRAMER HUGO AUGUSTINUS JOSEPH1DEN BOEF ARIE JEFFREY1QUAEDACKERS JOHANNES ANNA1
Top patents by PatentIndex Score
60 records- 0198US11784098B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Oct 10, 2023·3 cites·21 claims
- 0298US11145557B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·5 cites·23 claims
- 0396US10615084B2Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic valuesASML NETHERLANDS BV·Filed 2017·Granted Apr 7, 2020·9 cites·34 claims
- 0496US10488768B2Beat patterns for alignment on small metrology targetsASML NETHERLANDS BV·Filed 2018·Granted Nov 26, 2019·10 cites·20 claims
- 0596US10453758B2Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portionASML NETHERLANDS BV·Filed 2017·Granted Oct 22, 2019·9 cites·29 claims
- 0696US7880880B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 1, 2011·24 cites·15 claims
- 0795US11947269B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Apr 2, 2024·2 cites·20 claims
- 0895US10546790B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·7 cites·36 claims
- 0995US10133191B2Method for determining a process window for a lithographic process, associated apparatuses and a computer programASML NETHERLANDS BV·Filed 2015·Granted Nov 20, 2018·8 cites·20 claims
- 1095US7329888B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 12, 2008·18 cites·28 claims
- 1194US11385553B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jul 12, 2022·2 cites·20 claims
- 1294US8830447B2Inspection method for lithographyDEN BOEF ARIE JEFFREY·Filed 2010·Granted Sep 9, 2014·10 cites·20 claims
- 1393US7297971B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Nov 20, 2007·12 cites·3 claims
- 1492US9594299B2Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Mar 14, 2017·13 cites·33 claims
- 1592US8139217B2Alignment systems and methods for lithographic systemsVAN BILSEN FRANCISCUS BERNARDUS MARIA·Filed 2010·Granted Mar 20, 2012·12 cites·18 claims
- 1691US10571806B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·5 cites·22 claims
- 1790US10811323B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Oct 20, 2020·4 cites·21 claims
- 1890US7439531B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2006·Granted Oct 21, 2008·7 cites·32 claims
- 1990US7332732B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2003·Granted Feb 19, 2008·22 cites·143 claims
- 2089US11101184B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 2188US12322660B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2023·Granted Jun 3, 2025·0 cites·20 claims
- 2288US10054862B2Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Aug 21, 2018·3 cites·19 claims
- 2388US7330261B2Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2003·Granted Feb 12, 2008·19 cites·37 claims
- 2487US12142535B2Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetryASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2024·2 cites·22 claims
- 2587US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 2686US12468235B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2024·Granted Nov 11, 2025·0 cites·20 claims
- 2786US10996570B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2019·Granted May 4, 2021·2 cites·25 claims
- 2886US9964853B2Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted May 8, 2018·6 cites·27 claims
- 2984US7619738B2Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 17, 2009·4 cites·25 claims
- 3083US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 3182US11143972B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2018·Granted Oct 12, 2021·1 cites·21 claims
- 3282US10001711B2Inspection method, lithographic apparatus, mask and substrateASML NETHERLANDS BV·Filed 2014·Granted Jun 19, 2018·3 cites·23 claims
- 3381US10474039B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·2 cites·17 claims
- 3480US11728224B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
- 3579US9182682B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2009·Granted Nov 10, 2015·9 cites·13 claims
- 3676US10394137B2Inspection method, lithographic apparatus, mask and substrateASML NETHERLANDS BV·Filed 2018·Granted Aug 27, 2019·1 cites·24 claims
- 3775US11710668B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 3875US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 3975US2024004299A1Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4074US11101185B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 4174US2023042759A1Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 4273US9939735B2Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 10, 2018·1 cites·20 claims
- 4372US11314174B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·12 claims
- 4467US10901323B2Metrology method and apparatus with increased bandwidthASML NETHERLANDS BV·Filed 2020·Granted Jan 26, 2021·0 cites·20 claims
- 4566US11733610B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·0 cites·20 claims
- 4666US11604419B2Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targetsASML NETHERLANDS BV·Filed 2021·Granted Mar 14, 2023·0 cites·20 claims
- 4765US11092900B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2019·Granted Aug 17, 2021·0 cites·20 claims
- 4863US8263296B2Lithographic apparatus and device manufacturing methodHINNEN PAUL CHRISTIAAN·Filed 2010·Granted Sep 11, 2012·1 cites·9 claims
- 4962US10732514B2Metrology method and apparatus with increased bandwidthASML NETHERLANDS BV·Filed 2019·Granted Aug 4, 2020·0 cites·15 claims
- 5056US11022897B2Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targetsASML NETHERLANDS BV·Filed 2018·Granted Jun 1, 2021·0 cites·20 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →