Inventor · disambiguated record
Thomas Theeuwes
Also filed as: THEEUWES THOMAS
34 granted patents·3 pending applications·75 citations·filing 2011–2024
96Inventor score
Top patents by PatentIndex Score
37 records- 0198US11784098B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Oct 10, 2023·3 cites·21 claims
- 0298US11145557B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·5 cites·23 claims
- 0397US12007697B2Method for process metrologyASML NETHERLANDS BV·Filed 2022·Granted Jun 11, 2024·4 cites·20 claims
- 0496US10615084B2Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic valuesASML NETHERLANDS BV·Filed 2017·Granted Apr 7, 2020·9 cites·34 claims
- 0596US10453758B2Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portionASML NETHERLANDS BV·Filed 2017·Granted Oct 22, 2019·9 cites·29 claims
- 0695US11947269B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Apr 2, 2024·2 cites·20 claims
- 0795US10546790B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·7 cites·36 claims
- 0890US10811323B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Oct 20, 2020·4 cites·21 claims
- 0989US11101184B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 1088US12322660B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2023·Granted Jun 3, 2025·0 cites·20 claims
- 1187US12142535B2Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetryASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2024·2 cites·22 claims
- 1286US12468235B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2024·Granted Nov 11, 2025·0 cites·20 claims
- 1384US11385551B2Method for process metrologyASML NETHERLANDS BV·Filed 2017·Granted Jul 12, 2022·2 cites·21 claims
- 1483US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 1582US11378891B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·1 cites·20 claims
- 1682US11143972B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2018·Granted Oct 12, 2021·1 cites·21 claims
- 1782US10845713B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Nov 24, 2020·2 cites·20 claims
- 1880US11728224B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
- 1979US10816904B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·2 cites·26 claims
- 2077US9177219B2Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productTEL WIM TJIBBO·Filed 2011·Granted Nov 3, 2015·9 cites·16 claims
- 2175US11710668B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 2275US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 2374US11101185B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 2474US9360769B2Method of determining focus corrections, lithographic processing cell and device manufacturing methodKISTEMAN AREND JOHANNES·Filed 2012·Granted Jun 7, 2016·3 cites·9 claims
- 2574US2023042759A1Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2672US11733606B2Method for performing a manufacturing process and associated apparatusesASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·1 cites·20 claims
- 2772US11314174B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·12 claims
- 2872US10677589B2Substrate, metrology apparatus and associated methods for a lithographic processASML NETHERLANDS BV·Filed 2018·Granted Jun 9, 2020·1 cites·20 claims
- 2967US11137695B2Method of determining a height profile, a measurement system and a computer readable mediumASML NETHERLANDS BV·Filed 2017·Granted Oct 5, 2021·1 cites·14 claims
- 3067US2022342319A1Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3166US9927717B2Inspection method and apparatus, and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Mar 27, 2018·1 cites·20 claims
- 3265US11092900B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2019·Granted Aug 17, 2021·0 cites·20 claims
- 3364US10871367B2Substrate, metrology apparatus and associated methods for a lithographic processASML NETHERLANDS BV·Filed 2020·Granted Dec 22, 2020·0 cites·20 claims
- 3459US12510828B2Method for controlling a manufacturing process and associated apparatusesASML NETHERLANDS BV·Filed 2023·Granted Dec 30, 2025·0 cites·17 claims
- 3557US9360770B2Method of determining focus corrections, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jun 7, 2016·0 cites·9 claims
- 3655US2024402618A1Method of determining a performance parameter distributionASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3744US10429746B2Estimation of data in metrologyASML NETHERLANDS BV·Filed 2018·Granted Oct 1, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →