Inventor · disambiguated record
Wim Tjibbo Tel
Also filed as: TEL WIM · TEL WIM T · TEL WIM TJIBBO
70 granted patents·13 pending applications·453 citations·filing 2003–2025
98Inventor score
Top patents by PatentIndex Score
83 records- 0198US7511799B2Lithographic projection apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 31, 2009·179 cites·11 claims
- 0297US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0396US11079687B2Process window based on defect probabilityASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·11 cites·20 claims
- 0495US10712672B2Method of predicting patterning defects caused by overlay errorASML NETHERLANDS BV·Filed 2017·Granted Jul 14, 2020·7 cites·21 claims
- 0595US10133191B2Method for determining a process window for a lithographic process, associated apparatuses and a computer programASML NETHERLANDS BV·Filed 2015·Granted Nov 20, 2018·8 cites·20 claims
- 0694US10990018B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Apr 27, 2021·10 cites·20 claims
- 0793US9977344B2Metrology target, method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted May 22, 2018·5 cites·18 claims
- 0892US12044979B2Computational metrology based sampling schemeASML NETHERLANDS BV·Filed 2023·Granted Jul 23, 2024·2 cites·20 claims
- 0992US11422476B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Aug 23, 2022·2 cites·20 claims
- 1092US6873938B1Adaptive lithographic critical dimension enhancementASML NETHERLANDS BV·Filed 2003·Granted Mar 29, 2005·61 cites·30 claims
- 1191US11768442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2022·Granted Sep 26, 2023·1 cites·20 claims
- 1291US11347150B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted May 31, 2022·2 cites·22 claims
- 1391US10571806B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·5 cites·22 claims
- 1490US7626684B2Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatusASML NETHERLANDS BV·Filed 2008·Granted Dec 1, 2009·14 cites·23 claims
- 1589US12332573B2Method for determining defectiveness of pattern based on after development imageASML NETHERLANDS BV·Filed 2020·Granted Jun 17, 2025·3 cites·15 claims
- 1688US7262831B2Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Aug 28, 2007·38 cites·20 claims
- 1787US12044980B2Method of manufacturing devicesASML NETHERLANDS BV·Filed 2019·Granted Jul 23, 2024·3 cites·20 claims
- 1887US11681229B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2021·Granted Jun 20, 2023·1 cites·20 claims
- 1986US11635698B2Computational metrology based sampling schemeASML NETHERLANDS BV·Filed 2018·Granted Apr 25, 2023·2 cites·20 claims
- 2086US11143971B2Control based on probability density function of parameterASML NETHERLANDS BV·Filed 2019·Granted Oct 12, 2021·3 cites·20 claims
- 2184US7580113B2Method of reducing a wave front aberration, and computer program productASML NETHERLANDS BV·Filed 2006·Granted Aug 25, 2009·12 cites·21 claims
- 2284US7403264B2Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Jul 22, 2008·24 cites·12 claims
- 2382US12228862B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2023·Granted Feb 18, 2025·0 cites·20 claims
- 2482US11513442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Nov 29, 2022·2 cites·20 claims
- 2582US10394136B2Metrology method for process window definitionASML NETHERLANDS BV·Filed 2016·Granted Aug 27, 2019·2 cites·23 claims
- 2681US11448973B2Computational metrology based correction and controlASML NETHERLANDS BV·Filed 2018·Granted Sep 20, 2022·2 cites·21 claims
- 2781US10025193B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2014·Granted Jul 17, 2018·3 cites·20 claims
- 2881US2024126181A1Process window based on defect probabilityASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2980US12197136B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 14, 2025·0 cites·20 claims
- 3080US11249404B2System and method for measurement of alignmentASML NETHERLANDS BV·Filed 2018·Granted Feb 15, 2022·2 cites·17 claims
- 3179US11029614B2Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Jun 8, 2021·2 cites·20 claims
- 3278US11860548B2Method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2020·Granted Jan 2, 2024·1 cites·21 claims
- 3378US7679715B2Lithographic processing cell, lithographic apparatus, track and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Mar 16, 2010·4 cites·22 claims
- 3477US9177219B2Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productTEL WIM TJIBBO·Filed 2011·Granted Nov 3, 2015·9 cites·16 claims
- 3576US2024377756A1Computational metrology based sampling schemeASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 3676US2024111218A1A method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3775US11822255B2Process window based on defect probabilityASML NETHERLANDS BV·Filed 2021·Granted Nov 21, 2023·0 cites·20 claims
- 3875US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 3975US2024004299A1Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4074US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 4174US10962886B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2016·Granted Mar 30, 2021·1 cites·20 claims
- 4274US9360769B2Method of determining focus corrections, lithographic processing cell and device manufacturing methodKISTEMAN AREND JOHANNES·Filed 2012·Granted Jun 7, 2016·3 cites·9 claims
- 4374US2023042759A1Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 4472US11646174B2Method for calibrating a scanning charged particle microscopeASML NETHERLANDS BV·Filed 2019·Granted May 9, 2023·1 cites·11 claims
- 4572US11599027B2Lithographic process and apparatus and inspection process and apparatusASML NETHERLANDS BV·Filed 2021·Granted Mar 7, 2023·0 cites·20 claims
- 4671US12189302B2Computational metrologyASML NETHERLANDS BV·Filed 2022·Granted Jan 7, 2025·0 cites·22 claims
- 4771US11972922B2Method for calibrating a scanning charged particle microscopeASML NETHERLANDS BV·Filed 2023·Granted Apr 30, 2024·0 cites·11 claims
- 4870US10627722B2Etch-assist featuresASML NETHERLANDS BV·Filed 2016·Granted Apr 21, 2020·1 cites·21 claims
- 4969US2022365446A1Computational metrology based correction and controlASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 5066US11733610B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·0 cites·20 claims
Showing the top 50 of 83 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →