Inventor · disambiguated record
Masaya Odagiri
Also filed as: ODAGIRI MASAYA
6 granted patents·2 pending applications·361 citations·filing 2003–2021
80Inventor score
Technology areasH10P
Files withODAGIRI MASAYA3TOKYO ELECTRON LTD3BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD1TOMOYASU MASAYUKI1
Top patents by PatentIndex Score
8 records- 0194US8741065B2Substrate processing apparatusODAGIRI MASAYA·Filed 2011·Granted Jun 3, 2014·343 cites·9 claims
- 0270US7877161B2Method and system for performing a chemical oxide removal processTOKYO ELECTRON LTD·Filed 2003·Granted Jan 25, 2011·13 cites·49 claims
- 0368US8175736B2Method and system for performing a chemical oxide removal processTOMOYASU MASAYUKI·Filed 2010·Granted May 8, 2012·3 cites·52 claims
- 0465US8968475B2Substrate processing apparatusODAGIRI MASAYA·Filed 2012·Granted Mar 3, 2015·2 cites·7 claims
- 0550US12191114B2Semiconductor reaction chamber and atomic layer plasma etching apparatusBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 0638US2015113826A1Substrate placing table and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 0735US9153465B2Substrate stage, substrate processing apparatus and substrate processing systemODAGIRI MASAYA·Filed 2011·Granted Oct 6, 2015·0 cites·6 claims
- 0834US2018112312A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →