Inventor · disambiguated record
Matthew Ross
Also filed as: ROSS MATTHEW · ROSS MATTHEW F
21 granted patents·5 pending applications·1,020 citations·filing 1997–2017
96Inventor score
Files withELECTRON VISION CORP11APPLIED MATERIALS INC6ALLIED SIGNAL INC2CHALMERS SCOTT A2FILMETRICS INC1
Top patents by PatentIndex Score
26 records- 0193US6582777B1Electron beam modification of CVD deposited low dielectric constant materialsAPPLIED MATERIALS INC·Filed 2000·Granted Jun 24, 2003·115 cites·31 claims
- 0293US6548899B2Method of processing films prior to chemical vapor deposition using electron beam processingELECTRON VISION CORP·Filed 2000·Granted Apr 15, 2003·132 cites·25 claims
- 0391US6753129B2Method and apparatus for modification of chemically amplified photoresist by electron beam exposureAPPLIED MATERIALS INC·Filed 2002·Granted Jun 22, 2004·39 cites·21 claims
- 0489US6358670B1Enhancement of photoresist plasma etch resistance via electron beam surface cureELECTRON VISION CORP·Filed 1999·Granted Mar 19, 2002·105 cites·28 claims
- 0589US6132814AMethod for curing spin-on-glass film utilizing electron beam radiationELECTRON VISION CORP·Filed 1997·Granted Oct 17, 2000·119 cites·30 claims
- 0687US6900001B2Method for modifying resist images by electron beam exposureAPPLIED MATERIALS INC·Filed 2003·Granted May 31, 2005·28 cites·16 claims
- 0786US6207555B1Electron beam process during dual damascene processingELECTRON VISION CORP·Filed 1999·Granted Mar 27, 2001·70 cites·38 claims
- 0886US6204201B1Method of processing films prior to chemical vapor deposition using electron beam processingELECTRON VISION CORP·Filed 1999·Granted Mar 20, 2001·75 cites·23 claims
- 0982US6271146B1Electron beam treatment of fluorinated silicate glassELECTRON VISION CORP·Filed 1999·Granted Aug 7, 2001·61 cites·23 claims
- 1078US6607991B1Method for curing spin-on dielectric films utilizing electron beam radiationELECTRON VISION CORP·Filed 1999·Granted Aug 19, 2003·63 cites·16 claims
- 1178US6489225B1Method for controlling dopant profiles and dopant activation by electron beam processingELECTRON VISION CORP·Filed 2000·Granted Dec 3, 2002·20 cites·23 claims
- 1277US6319655B1Modification of 193 nm sensitive photoresist materials by electron beam exposureELECTRON VISION CORP·Filed 1999·Granted Nov 20, 2001·67 cites·28 claims
- 1377US6177143B1Electron beam treatment of siloxane resinsALLIED SIGNAL INC·Filed 1999·Granted Jan 23, 2001·60 cites·24 claims
- 1476US6426127B1Electron beam modification of perhydrosilazane spin-on glassELECTRON VISION CORP·Filed 1999·Granted Jul 30, 2002·37 cites·36 claims
- 1563US6989227B2E-beam curable resist and process for e-beam curing the resistAPPLIED MATERIALS INC·Filed 2003·Granted Jan 24, 2006·6 cites·11 claims
- 1662US6831005B1Electron beam process during damascene processingALLIED SIGNAL INC·Filed 2000·Granted Dec 14, 2004·9 cites·38 claims
- 1759US6890825B2Method for controlling dopant profiles and dopant activation by electron beam processingAPPLIED MATERIALS INC·Filed 2002·Granted May 10, 2005·6 cites·19 claims
- 1856US6551926B1Electron beam annealing of metals, alloys, nitrides and silicidesELECTRON VISION CORP·Filed 2000·Granted Apr 22, 2003·7 cites·16 claims
- 1949US2008095951A1Electron beam modification of cvd deposited low dielectric constant materialsROSS MATTHEW·Filed 2007·Application pending·0 cites
- 2046US10240981B2Optical spectrometer configuration including spatially variable filter (SVF)ROSS MATTHEW F·Filed 2016·Granted Mar 26, 2019·0 cites·63 claims
- 2145US7309514B2Electron beam modification of CVD deposited films, forming low dielectric constant materialsAPPLIED MATERIALS INC·Filed 2003·Granted Dec 18, 2007·1 cites·33 claims
- 2240US11099068B2Optical instrumentation including a spatially variable filterFILMETRICS INC·Filed 2017·Granted Aug 24, 2021·0 cites·45 claims
- 2337US2003141573A1Electron beam annealing of metals, alloys, nitrides and silicidesFiled 2003·Application pending·0 cites
- 2437US2018252518A1Optical profilometerCHALMERS SCOTT A·Filed 2017·Application pending·0 cites
- 2535US2003102084A1Cluster tool for wafer processing having an electron beam exposure moduleFiled 2003·Application pending·0 cites
- 2635US2017314914A1Optical profilometerCHALMERS SCOTT A·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →