Inventor · disambiguated record
Martin Schriever
Also filed as: SCHRIEVER MARTIN
20 granted patents·7 pending applications·310 citations·filing 2001–2014
96Inventor score
Top patents by PatentIndex Score
27 records- 0194US7233386B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2005·Granted Jun 19, 2007·16 cites·33 claims
- 0292US7336371B1Apparatus and method for measuring the wavefront of an optical systemZEISS CARL SMT AG·Filed 2004·Granted Feb 26, 2008·49 cites·14 claims
- 0392US7333216B2Apparatus for wavefront detectionZEISS CARL SMT AG·Filed 2001·Granted Feb 19, 2008·46 cites·47 claims
- 0492US7113260B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS CARL SMT AG·Filed 2005·Granted Sep 26, 2006·13 cites·3 claims
- 0590US8169595B2Optical apparatus and method for modifying the imaging behavior of such apparatusSCHRIEVER MARTIN·Filed 2009·Granted May 1, 2012·23 cites·52 claims
- 0690US7408652B2Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT AG·Filed 2005·Granted Aug 5, 2008·12 cites·30 claims
- 0790US6930758B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS CARL SMT AG·Filed 2001·Granted Aug 16, 2005·36 cites·45 claims
- 0888US7570345B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2007·Granted Aug 4, 2009·7 cites·4 claims
- 0987US7286245B2Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyserZEISS CARL SMT AG·Filed 2003·Granted Oct 23, 2007·28 cites·21 claims
- 1086US7436521B2Optical measuring apparatus and operating method for imaging error correction in an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Oct 14, 2008·9 cites·17 claims
- 1184US9494483B2Measuring system for measuring an imaging quality of an EUV lensZEISS CARL SMT GMBH·Filed 2014·Granted Nov 15, 2016·5 cites·24 claims
- 1284US7158237B2Interferometric measuring device and projection exposure installation comprising such measuring deviceZEISS CARL SMT AG·Filed 2004·Granted Jan 2, 2007·19 cites·40 claims
- 1379US7417745B2Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometryZEISS CARL SMT AG·Filed 2004·Granted Aug 26, 2008·21 cites·4 claims
- 1477US7230220B2Method of determining optical properties and projection exposure system comprising a wavefront detection systemZEISS CARL SMT AG·Filed 2006·Granted Jun 12, 2007·6 cites·26 claims
- 1566US8120763B2Device and method for the optical measurement of an optical system by using an immersion fluidWEGMANN ULRICH·Filed 2009·Granted Feb 21, 2012·1 cites·14 claims
- 1665US6950174B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS STIFTUNG·Filed 2004·Granted Sep 27, 2005·5 cites·15 claims
- 1764US7388696B2Diffuser, wavefront source, wavefront sensor and projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jun 17, 2008·3 cites·25 claims
- 1863US6936825B2Process for the decontamination of microlithographic projection exposure devicesZEISS CARL SMT AG·Filed 2001·Granted Aug 30, 2005·8 cites·21 claims
- 1959US8836929B2Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT GMBH·Filed 2012·Granted Sep 16, 2014·0 cites·15 claims
- 2057US2009021726A1Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2156US6972831B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS STIFTUNG·Filed 2004·Granted Dec 6, 2005·3 cites·6 claims
- 2255US2012113429A1Device and method for the optical measurement of an optical system by using an immersion fluidWEGMANN ULRICH·Filed 2012·Application pending·0 cites
- 2354US2008144043A1Apparatus for wavefront detectionZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2452US2008037905A1Method and apparatus for determining the influencing of the state of polarization by an optical system, and an analyserZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2547US2007046912A1Interferometric measuring device and projection exposure installation comprising such measuring deviceZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 2640US2008302025A1Roof TilesSCHRIEVER MARTIN·Filed 2006·Application pending·0 cites
- 2740US2008036982A1Method For Structuring A Substrate Using Multiple ExposureZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →