Inventor · disambiguated record
Mark Josef Schuster
Also filed as: SCHUSTER MARK JOSEF
11 granted patents·12 citations·filing 2013–2017
84Inventor score
Technology areasG03F
Top patents by PatentIndex Score
11 records- 0188US9632434B2Reticle cooling system in a lithographic apparatusASML HOLDING NV·Filed 2015·Granted Apr 25, 2017·3 cites·20 claims
- 0281US9632433B2Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureASML HOLDING NV·Filed 2013·Granted Apr 25, 2017·2 cites·9 claims
- 0378US9766557B2Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureASML HOLDING NV·Filed 2017·Granted Sep 19, 2017·1 cites·13 claims
- 0477US9513568B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Dec 6, 2016·2 cites·20 claims
- 0572US9740112B2Patterning device support and lithographic apparatusASML HOLDING NV·Filed 2013·Granted Aug 22, 2017·2 cites·27 claims
- 0666US9632429B2Real-time reticle curvature sensingASML HOLDING NV·Filed 2013·Granted Apr 25, 2017·1 cites·29 claims
- 0765US9377700B2Determining position and curvature information directly from a surface of a patterning deviceASML HOLDING NV·Filed 2013·Granted Jun 28, 2016·1 cites·21 claims
- 0861US9977351B2Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureASML HOLDING NV·Filed 2017·Granted May 22, 2018·0 cites·14 claims
- 0954US10788763B2Lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Sep 29, 2020·0 cites·20 claims
- 1048US9910368B2Patterning device manipulating system and lithographic apparatusesASML NETHERLANDS BV·Filed 2013·Granted Mar 6, 2018·0 cites·47 claims
- 1143US10031428B2Gas flow optimization in reticle stage environmentASML NETHERLANDS BV·Filed 2014·Granted Jul 24, 2018·0 cites·38 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →