Inventor · disambiguated record
Matthew D. Scotney-Castle
Also filed as: SCOTNEY-CASTLE MATTHEW · SCOTNEY-CASTLE MATTHEW D
22 granted patents·17 pending applications·35 citations·filing 2007–2020
92Inventor score
Files withAPPLIED MATERIALS INC24SANTHANAM KARTIK5HILKENE MARTIN A2BENCHER CHRISTOPHER D1GODET LUDOVIC1
Top patents by PatentIndex Score
39 records- 0196US11348769B2Plasma-enhanced anneal chamber for wafer outgassingAPPLIED MATERIALS INC·Filed 2020·Granted May 31, 2022·5 cites·12 claims
- 0288US10770272B2Plasma-enhanced anneal chamber for wafer outgassingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 8, 2020·5 cites·12 claims
- 0385US8354035B2Method for removing implanted photo resist from hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Granted Jan 15, 2013·4 cites·19 claims
- 0480US8586952B2Temperature control of a substrate during a plasma ion implantation process for patterned disc media applicationsHILKENE MARTIN A·Filed 2010·Granted Nov 19, 2013·5 cites·17 claims
- 0579US9852902B2Material deposition for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2014·Granted Dec 26, 2017·3 cites·14 claims
- 0675US7659184B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2008·Granted Feb 9, 2010·3 cites·13 claims
- 0771US8673162B2Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantationGOUK ROMAN·Filed 2010·Granted Mar 18, 2014·3 cites·10 claims
- 0869US8658242B2Resist fortification for magnetic media patterningBENCHER CHRISTOPHER D·Filed 2011·Granted Feb 25, 2014·2 cites·16 claims
- 0967US8003500B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2009·Granted Aug 23, 2011·1 cites·7 claims
- 1066US10233538B2Demagnetization of magnetic media by C doping for HDD patterned media applicationAPPLIED MATERIALS INC·Filed 2016·Granted Mar 19, 2019·0 cites·20 claims
- 1165US8129261B2Conformal doping in P3I chamberPORSHNEV PETER I·Filed 2009·Granted Mar 6, 2012·2 cites·11 claims
- 1264US9376746B2Demagnetization of magnetic media by C doping for HDD patterned media applicationHILKENE MARTIN A·Filed 2012·Granted Jun 28, 2016·0 cites·9 claims
- 1364US7989329B2Removal of surface dopants from a substrateAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·1 cites·12 claims
- 1459US9646642B2Resist fortification for magnetic media patterningAPPLIED MATERIALS INC·Filed 2014·Granted May 9, 2017·0 cites·9 claims
- 1556US10276369B2Material deposition for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2017·Granted Apr 30, 2019·0 cites·8 claims
- 1656US8288257B2Doping profile modification in P3I processSCOTNEY-CASTLE MATTHEW D·Filed 2009·Granted Oct 16, 2012·1 cites·20 claims
- 1754US12230521B2Method for non-contact low substrate temperature measurementAPPLIED MATERIALS INC·Filed 2020·Granted Feb 18, 2025·0 cites·20 claims
- 1852US10500614B2Temperature controlled remote plasma clean for exhaust deposit removalAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·0 cites·9 claims
- 1949US2017206922A1Resist fortification for magnetic media patterningAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2049US2013017315A1Methods and apparatus for controlling power distribution in substrate processing systemsAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 2148US2013014894A1Methods and apparatus for controlling power distribution in substrate processing systemsAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 2246US9520267B2Bias voltage frequency controlled angular ion distribution in plasma processingGODET LUDOVIC·Filed 2014·Granted Dec 13, 2016·0 cites·17 claims
- 2346US2011256691A1Removal of surface dopants from a substrateRAMASWAMY KARTIK·Filed 2011·Application pending·0 cites
- 2444US2014273461A1Carbon film hardmask stress reduction by hydrogen ion implantationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 2543US2014273524A1Plasma Doping Of Silicon-Containing FilmsNGUYEN VICTOR·Filed 2014·Application pending·0 cites
- 2642US9553174B2Conversion process utilized for manufacturing advanced 3D features for semiconductor device applicationsAPPLIED MATERIALS INC·Filed 2015·Granted Jan 24, 2017·0 cites·20 claims
- 2741US8492177B2Methods for quantitative measurement of a plasma immersion processYAO DAPING·Filed 2011·Granted Jul 23, 2013·0 cites·18 claims
- 2840US2013288469A1Methods and apparatus for implanting a dopant materialAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2939US2011104393A1Plasma ion implantation process for patterned disc media applicationsAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3039US2011127156A1Chamber for processing hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3137US8501605B2Methods and apparatus for conformal dopingSANTHANAM KARTIK·Filed 2011·Granted Aug 6, 2013·0 cites·18 claims
- 3235US2011061810A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3335US2011061812A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3435US2010297854A1High throughput selective oxidation of silicon and polysilicon using plasma at room temperatureAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3535US2011065276A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3632US2012302048A1Pre or post-implant plasma treatment for plasma immersed ion implantation processSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 3732US2012088356A1Integrated platform for in-situ doping and activation of substratesSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
- 3831US2012289036A1Surface dose retention of dopants by pre-amorphization and post implant passivation treatmentsSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 3931US2013095643A1Methods for implanting dopant species in a substrateSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →