Inventor · disambiguated record
Max Siebert
Also filed as: SIEBERT MAX
16 granted patents·7 pending applications·16 citations·filing 2013–2022
87Inventor score
Files withBASF SE17OERLIKON SURFACE SOLUTIONS AG PFAEFFIKON4OERLIKON SURFACE SOLUTIONS AG TRUEBBACH1REPLIQUE GMBH1
Top patents by PatentIndex Score
23 records- 0186US10385236B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 20, 2019·5 cites·14 claims
- 0282US10899945B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substratesBASF SE·Filed 2016·Granted Jan 26, 2021·3 cites·20 claims
- 0377US9138381B2Production of inorganic-organic composite materials by reactive spray-dryingBASF SE·Filed 2014·Granted Sep 22, 2015·2 cites·21 claims
- 0475US11264250B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2016·Granted Mar 1, 2022·2 cites·21 claims
- 0567US12241154B2Holding system for holding substrates during a processing of the surfaces of the substratesOERLIKON SURFACE SOLUTIONS AG PFAEFFIKON·Filed 2020·Granted Mar 4, 2025·0 cites·19 claims
- 0661US10072326B2Versatile holder for treating the surface of rod-shaped substratesOERLIKON SURFACE SOLUTIONS AG TRUEBBACH·Filed 2014·Granted Sep 11, 2018·2 cites·13 claims
- 0760US11590528B2Tool fixture for multiple process stepsOERLIKON SURFACE SOLUTIONS AG PFAEFFIKON·Filed 2018·Granted Feb 28, 2023·1 cites·15 claims
- 0859US2021102093A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substratesBASF SE·Filed 2020·Application pending·0 cites
- 0954US2024181710A1Method, apparatus and system for quality assessment of an object produced by at least one 3d printerREPLIQUE GMBH·Filed 2022·Application pending·0 cites
- 1054US2023042478A1Holding Device for Holding a Magnetizable Substrate during Processing of a Substrate Surface of the SubstrateOERLIKON SURFACE SOLUTIONS AG PFAEFFIKON·Filed 2020·Application pending·0 cites
- 1147US10570316B2Chemical mechanical polishing (CMP) compositionBASF SE·Filed 2015·Granted Feb 25, 2020·0 cites·20 claims
- 1245US11993729B2Chemical mechanical polishing compositionBASF SE·Filed 2018·Granted May 28, 2024·0 cites·21 claims
- 1345US2015342887A1Production Of Inorganic-Organic Composite Materials By Reactive Spray-DryingBASF SE·Filed 2015·Application pending·0 cites
- 1443US2014031463A1Composition of microcapsules with a silica shell and a method for their preparationBASF SE·Filed 2013·Application pending·0 cites
- 1541US10865361B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2017·Granted Dec 15, 2020·0 cites·20 claims
- 1640US11286402B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Mar 29, 2022·0 cites·12 claims
- 1740US10738219B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 11, 2020·0 cites·14 claims
- 1839US10844325B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·13 claims
- 1935US10844333B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·12 claims
- 2034US2017022107A1SYNTHESIS AND APPLICATION OF CaSO4-BASED HARDENING ACCELERATORSBASF SE·Filed 2015·Application pending·0 cites
- 2132US2017166778A1Chemical mechanical polishing (cmp) composition comprising a poly(aminoacid)BASF SE·Filed 2015·Application pending·0 cites
- 2230US10227506B2Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germaniumBASF SE·Filed 2015·Granted Mar 12, 2019·0 cites·16 claims
- 2326USD881242STool holderOERLIKON SURFACE SOLUTIONS AG PFAEFFIKON·Filed 2018·Granted Apr 14, 2020·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →